公开(公告)号：US20170229332A1

公开(公告)日：2017-08-10

申请号：US15501235

申请日：2015-07-07

Applicant: TOKYO ELECTRON LIMITED

Inventor： Ryo MIYAMA ,  Naoto WATANABE ,  Koichiro NAKAMURA

IPC: H01L21/67 ,  H05H1/46 ,  H05H1/00 ,  H01L21/66 ,  H01L21/3065

CPC classification number: H01J37/32972 ,  H01J37/32935

Abstract: A method and apparatus for determining a stability of plasma in a plasma processing apparatus for performing a plasma processing by converting into plasma a processing gas supplied into a processing container. The method includes: detecting a light emission intensity of the plasma in the processing container while the plasma is generated in the processing container; generating a first function representing a relationship between time and the light emission intensity from a detection result of the light emission intensity; differentiating the first function with time to calculate a differential value, and generating a second function from a relationship between an absolute value of the differential value and time; and integrating the second function with time to calculate an integral value, and determining a stability of the plasma based on the calculated integral value. A related apparatus is also provided.