公开(公告)号：US12151255B2

公开(公告)日：2024-11-26

申请号：US18218457

申请日：2023-07-05

Applicant: TOKYO ELECTRON LIMITED

Inventor： Hideki Kajiwara ,  Yuya Yonemitsu ,  Shinichiro Yamanaka ,  Shinichi Mizushino ,  Naruaki Iida ,  Kohei Kawakami ,  Tohru Azuma

IPC: B05B12/04 ,  B05B7/00

Abstract: An apparatus includes substrate holders each configured to hold a substrate, a first nozzle provided for each substrate holder and for discharging a first processing liquid to the substrate at a first position, a second nozzle provided to be shared by the substrate holders and for discharging a second processing liquid to the substrate at a second position, a third nozzle provided for each substrate holder and for discharging a third processing liquid to the substrate at a third position while the first and second processing liquids are not supplied to the substrate, first to third standby parts for respectively allowing the first to third nozzles to wait outside a substrate holding region, a turning mechanism for turning the first nozzle between the first standby part and the first position, and a linear motion mechanism for linearly moving the third nozzle between the third standby part and the third position.

公开(公告)号：US11752515B2

公开(公告)日：2023-09-12

申请号：US16897922

申请日：2020-06-10

Applicant: TOKYO ELECTRON LIMITED

Inventor： Hideki Kajiwara ,  Yuya Yonemitsu ,  Shinichiro Yamanaka ,  Shinichi Mizushino ,  Naruaki Iida ,  Kohei Kawakami ,  Tohru Azuma

IPC: B05B12/04 ,  B05B7/00

CPC classification number: B05B12/04 ,  B05B7/00

Abstract: An apparatus includes substrate holders each configured to hold a substrate, a first nozzle provided for each substrate holder and for discharging a first processing liquid to the substrate at a first position, a second nozzle provided to be shared by the substrate holders and for discharging a second processing liquid to the substrate at a second position, a third nozzle provided for each substrate holder and for discharging a third processing liquid to the substrate at a third position while the first and second processing liquids are not supplied to the substrate, first to third standby parts for respectively allowing the first to third nozzles to wait outside a substrate holding region, a turning mechanism for turning the first nozzle between the first standby part and the first position, and a linear motion mechanism for linearly moving the third nozzle between the third standby part and the third position.