公开(公告)号：US20220100082A1

公开(公告)日：2022-03-31

申请号：US17546227

申请日：2021-12-09

Applicant: TOPPAN INC.

Inventor： Akihito OKUMURA ,  Hiroaki MIYAJI ,  Takehiro YAMADA

IPC: G03F1/70 ,  G03F7/20 ,  G03F1/00 ,  G02F1/1335 ,  G03F1/76 ,  G03F7/00

Abstract: A photomask is used for scanning type projection exposure provided with a projection lens assembly composed of a lens assembly. A line width in a plurality of patterns of the photomask in a region to be transferred by performing scanning exposure including connecting portions of the lens assembly are corrected with respect to a line width of patterns which are the same as the patterns of the photomask present in a region to be transferred by performing scanning exposure but do not include the connecting portions.

公开(公告)号：US20220121047A1

公开(公告)日：2022-04-21

申请号：US17563154

申请日：2021-12-28

Applicant: TOPPAN Inc..

Inventor： Toshiji YASUHARA ,  Takehiro YAMADA

IPC: G02F1/1334 ,  G02F1/137 ,  G02F1/1343 ,  G02F1/133

Abstract: A light control sheet including a light control layer switchable between a transparent state and an opaque state, and transparent electrode layers sandwiching the light control layer. The light control layer includes a transparent polymer layer that has domains whose average size is 1.0 μm-1.55 μm, and the light control layer includes a liquid crystal composition at a concentration of 37%-55% such that the liquid crystal composition fills the domains.