GAS BARRIER FILM AND METHOD FOR PRODUCING SAME
    1.
    发明申请
    GAS BARRIER FILM AND METHOD FOR PRODUCING SAME 审中-公开
    气体阻隔膜及其制造方法

    公开(公告)号:US20160076134A1

    公开(公告)日:2016-03-17

    申请号:US14781158

    申请日:2014-03-28

    Abstract: A gas barrier film is provided including a polymer film substrate and a gas barrier layer containing at least zinc oxide and silicon dioxide on at least one surface of the polymer film substrate, wherein the gas barrier layer satisfies at least one of the following [I] to [III]: [I] with regard to X-ray absorption near edge structure (XANES) spectrum at K absorption edge of zinc, the value of (spectrum intensity at 9664.0 eV)/(spectrum intensity at 9668.0 eV) is in the range of 0.910 to 1.000; [II] the value obtained by dividing atomic concentration of zinc with atomic concentration of silicon is in the range of 0.1 to 1.5, and structural density index represented by the following equation: structural density index={density of the gas barrier layer obtained by X-ray reflectometry (XRR)}/{(theoretical density calculated from compositional ratio determined by X-ray photoelectron spectroscopy (XPS)} is 1.20 to 1.40; and [III] when peak in the wave number range of 900 to 1,100 cm−1 measured in FT-IR measurement is subjected to peak separation into the wave number of 920 cm−1 and the wave number of 1,080 cm−1, the value of ratio (A/B) of integrated intensity of the spectrum having its peak at 920 cm−1 (A) to integrated intensity of the spectrum having its peak at 1,080 cm−1 (B) is at least 1.0 and up to 7.0.

    Abstract translation: 提供了一种阻气膜,其包括聚合物膜基材和在聚合物膜基材的至少一个表面上至少含有氧化锌和二氧化硅的气体阻隔层,其中阻气层满足以下[I]中的至少一个, 至[III]:[I]关于锌吸收边缘的X射线吸收近边缘结构(XANES)光谱,(9664.0eV的光谱强度)/(9668.0eV的光谱强度)的值在 范围为0.910〜1.000; [II]将原子浓度除以硅的原子浓度得到的值在0.1〜1.5的范围内,结构密度指数由下式表示:结构密度指数= {由X获得的阻气层的密度 射线反射计(XRR)} / {((由X射线光电子能谱(XPS)确定的组成比算出的理论密度)为1.20〜1.40; [III]当峰值范围为900〜1100cm -1 在FT-IR测量中测量的峰值分离为920cm -1的波数和1,080cm -1的波数,其峰值在920的峰值的积分强度的比(A / B)值 cm -1(A)与其在1080c -1(B)峰值的光谱的积分强度为1.0以上7.0以下。

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