公开(公告)号：US20230287560A1

公开(公告)日：2023-09-14

申请号：US18180132

申请日：2023-03-08

Applicant: TOSOH CORPORATION ,  TOSOH SPECIALITY MATERIALS CORPORATION

Inventor： Masami MESUDA ,  Daiki SHONO ,  Kenichi ITOH ,  Koichi HANAWA

IPC: C23C14/34 ,  C23C14/14

CPC classification number: C23C14/3414 ,  C23C14/14

Abstract: A method for producing a chromium sintered body includes a heat treatment step of heat-treating electrolytic chromium flakes at 1,200° C. or higher and 1,400° C. or lower, and a firing step of, after the heat treatment step, filling a container with the electrolytic chromium flakes and firing a resulting filling product by hot isostatic pressing.

公开(公告)号：US20240410049A1

公开(公告)日：2024-12-12

申请号：US18698353

申请日：2022-10-05

Applicant: TOSOH CORPORATION ,  TOSOH SPECIALITY MATERIALS CORPORATION

Inventor： Daiki SHONO ,  Taiga KONDO ,  Masami MESUDA ,  Kenichi ITOH ,  Koichi HANAWA

IPC: C23C14/34

Abstract: A sputtering target includes crystal grains, has a content of an amorphous phase of 3% by volume or less, and contains at least one metal selected from the group consisting of chromium, molybdenum, and chromium-molybdenum alloys.