公开(公告)号：US20150239001A1

公开(公告)日：2015-08-27

申请号：US14186002

申请日：2014-02-21

Applicant: TSMC Solar Ltd.

Inventor： Pei-Chen TSAI

IPC: B05C11/10 ,  B05C3/00 ,  H01L31/18 ,  B05C3/02

CPC classification number: B05C11/1002 ,  B05C3/005 ,  B05C3/02 ,  H01L31/1828 ,  Y02E10/50 ,  Y02E10/543 ,  Y02P70/521

Abstract: An apparatus for chemical bath deposition includes a housing defining a chemical tank, a circulation pipe, and at least one flow adjustment device disposed inside the chemical tank. The chemical tank has an opening on a top surface and is configured to accept and hold at least one substrate inside the chemical tank. The circulation pipe has at least one portion inside the chemical tank, and is configured to supply at least one chemical to the chemical tank. The at least one flowing adjustment device includes any one of a turbine, a diffuser and a bubbler, or a combination thereof.

Abstract translation: 一种用于化学浴沉积的设备包括限定化学罐，循环管和设置在化学罐内部的至少一个流量调节装置的壳体。 化学罐在顶表面上具有开口，并且构造成在化学罐内容纳和保持至少一个基底。 所述循环管具有至少一部分在所述化学罐内部，并且构造成向所述化学罐供应至少一种化学品。 至少一个流动调节装置包括涡轮机，扩散器和起泡器中的任何一个或其组合。