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公开(公告)号：US20090133713A1
公开(公告)日：2009-05-28
申请号：US11988648
申请日：2006-07-12
申请人： Tadahiro Ohmi , Akinobu Teramoto , Hitoshi Morinaga , Yukio Kishi , Hiromichi Ohtaki , Yoshihumi Tsutai
发明人： Tadahiro Ohmi , Akinobu Teramoto , Hitoshi Morinaga , Yukio Kishi , Hiromichi Ohtaki , Yoshihumi Tsutai
CPC分类号： C23C4/00 , B08B3/02 , B08B3/12 , B08B2203/0288 , C23C4/02 , C23C4/11 , C23C16/405 , C23C16/545 , C23C26/00 , C23C28/04 , Y10T428/25 , Y10T428/252
摘要： It has been difficult to provide a large-sized ceramic member quickly and economically. A multilayer structure is produced by forming a ceramic film on a base which is made of a material that can be shaped comparatively easily. The ceramic film is formed by a plasma spraying method, CVD method, PVD method, sol-gel method or the like. Alternatively, the ceramic film may be formed by a method combined with a spray deposit film.
摘要翻译： 很难快速，经济地提供大型陶瓷件。 通过在可以相对容易地成形的材料制成的基底上形成陶瓷膜来制造多层结构体。 陶瓷膜通过等离子喷涂法，CVD法，PVD法，溶胶 - 凝胶法等形成。 或者，陶瓷膜可以通过与喷雾沉积膜结合的方法形成。
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2.发明申请Member for a Plasma Processing Apparatus and Method of Manufacturing the Same 审中-公开等离子体处理装置的成员及其制造方法公开(公告)号：US20090101070A1
公开(公告)日：2009-04-23
申请号：US12224784
申请日：2007-02-20
IPC分类号： C23C28/04
CPC分类号： C04B41/87 , C03C17/25 , C03C2217/228 , C03C2218/113 , C04B41/009 , C04B41/5031 , C04B41/5045 , C23C4/10 , C23C18/1208 , C23C18/1254 , C23C18/1279 , C23C28/042 , C04B41/4531 , C04B41/4537 , C04B35/10 , C04B35/00
摘要： A member for a plasma processing apparatus, which is excellent in film-formability, durability, and reliability, is provided.On a substrate, a ceramic film having a purity not less than 98% is provided. In the ceramic film, grains constituting the film have a grain diameter not greater than 50 nm and the amount of moisture released from the film is not more than 1019 molecules/cm2.
摘要翻译： 提供了一种等离子体处理装置的成膜性，耐久性和可靠性优异的构件。 在基材上提供纯度不低于98％的陶瓷膜。 在陶瓷膜中，构成膜的晶粒的粒径不大于50nm，从膜释放的水分量不大于1019分子/ cm 2。
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