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公开(公告)号:US20240309513A1
公开(公告)日:2024-09-19
申请号:US18279600
申请日:2022-03-04
Applicant: Sumitomo Electric Industries, Ltd.
Inventor: Satoshi ONO , Anongsack PASEUTH , Katsumi OKAMURA
CPC classification number: C23C28/044 , B23B27/14 , C23C28/042
Abstract: A cutting tool comprising a base material and a coating disposed on the base material, wherein the coating comprises a hard particle layer, the hard particle layer is formed from a plurality of hard particles including titanium, silicon, carbon, and nitrogen; in the hard particles, a concentration of the silicon periodically changes along a first direction set in the hard particles; and an orientation of the hard particle layer is a (422) orientation.
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公开(公告)号:US12018382B2
公开(公告)日:2024-06-25
申请号:US16123149
申请日:2018-09-06
Applicant: Entegris, Inc.
Inventor: Bryan C. Hendrix , David W. Peters , Weimin Li , Carlo Waldfried , Richard A. Cooke , Nilesh Gunda , I-Kuan Lin
IPC: C23C16/44 , B01D39/20 , B01D67/00 , C23C14/24 , C23C14/50 , C23C16/04 , C23C16/40 , C23C16/455 , C23C16/56 , C23C28/04
CPC classification number: C23C28/044 , B01D39/2027 , B01D67/00 , C23C14/243 , C23C14/50 , C23C16/042 , C23C16/403 , C23C16/404 , C23C16/405 , C23C16/4404 , C23C16/4412 , C23C16/45525 , C23C16/45555 , C23C16/56 , C23C28/042 , B01D2239/0478 , B01D2239/1216
Abstract: Coatings applicable to a variety of substrate articles, structures, materials, and equipment are described. In various applications, the substrate includes metal surface susceptible to formation of oxide, nitride, fluoride, or chloride of such metal thereon, wherein the metal surface is configured to be contacted in use with gas, solid, or liquid that is reactive therewith to form a reaction product that deleterious to the substrate article, structure material, or equipment. The metal surface is coated with a protective coating preventing reaction of the coated surface with the reactive gas, and/or otherwise improving the electrical, chemical, thermal, or structural properties of the substrate article or equipment. Various methods of coating the metal surface are described, and for selecting the coating material that is utilized.
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公开(公告)号:US20240102173A1
公开(公告)日:2024-03-28
申请号:US18033361
申请日:2022-09-22
Applicant: Sumitomo Electric Industries, Ltd.
Inventor: Haruyo FUKUI , Nozomi TSUKIHARA , Anongsack PASEUTH , Toshihiro TABATA
CPC classification number: C23C28/044 , B23B27/146 , B23B27/148 , C23C28/042 , B23B2224/24 , B23B2224/36
Abstract: A cutting tool is a cutting tool comprising a substrate and a coating film disposed on the substrate, in which the coating film includes a first layer, the first layer is composed of an alternate layer where a first unit layer and a second unit layer are alternately stacked, the first unit layer is composed of Ti1-a-bAlaCebN, a is 0.350 or more and 0.650 or less, b is 0.001 or more and 0.100 or less, the second unit layer is composed of AlcCr1-cN, c is 0.40 or more and 0.75 or less, and a and c satisfy a relationship of c>a.
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公开(公告)号:US20240076776A1
公开(公告)日:2024-03-07
申请号:US17767392
申请日:2020-07-17
Applicant: Applied Materials, Inc.
Inventor: Sukti CHATTERJEE , David Alexander BRITZ
IPC: C23C16/455 , C23C16/02 , C23C16/40 , C23C28/04
CPC classification number: C23C16/45555 , C23C16/0272 , C23C16/403 , C23C16/45527 , C23C28/042
Abstract: Embodiments of the present disclosure generally relate to protective coatings on an aerospace component and methods for depositing the protective coatings. The protective coating can be anti-coking coatings to reduce or suppress coke formation when the aerospace component is heated in the presence of a fuel. In one or more embodiments, a method for depositing a protective coating on an aerospace component includes depositing an optional barrier layer on a surface of the aerospace component and depositing a catalytic oxidation layer on the barrier layer and/or directly on the aerospace component. The barrier layer can be or include aluminum oxide, magnesium-doped aluminum oxide, dopants thereof, or any combination thereof. The catalytic oxidation layer can be or include cerium oxide or one or more oxygen storage materials.
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公开(公告)号:US20240075534A1
公开(公告)日:2024-03-07
申请号:US18450225
申请日:2023-08-15
Applicant: YG-1 Co., Ltd
Inventor: SOO HYUN CHA , GEUN WOO PARK , SANG YOUNG JO , TAE YANG HAN
CPC classification number: B23B27/148 , C23C28/042 , C23C28/044 , B23B2224/24
Abstract: A coated cutting tool having excellent wear resistance and controlled brittleness is provided. An embodiment of the present disclosure provides a coated cutting tool including: a substrate; and a cutting layer disposed on the substrate, wherein: the cutting layer includes a brittleness suppressing layer and a wear-resistant layer disposed on the brittleness suppressing layer; the substrate includes a hard alloy body such as cemented carbide, cermet, ceramic, cubic boron nitride-based materials, or high-speed steel; the brittleness suppressing layer includes a first layer and a second layer disposed on the first layer; the first layer and the second layer each independently includes any one of (AlbTi1-b)X (where 0.6
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公开(公告)号:US11870106B2
公开(公告)日:2024-01-09
申请号:US17177605
申请日:2021-02-17
Applicant: Schaeffler Technologies AG & Co. KG
Inventor: Ladislaus Dobrenizki , Tim Hosenfeldt , Yashar Musayev , Detlev Repenning
IPC: H01M8/0228 , C23C28/04 , C23C28/00 , H01M8/021 , H01M8/0208 , H01M8/0215 , C25B9/65 , C25B9/70 , C25B9/73
CPC classification number: H01M8/0228 , C23C28/042 , C23C28/321 , C23C28/34 , C23C28/341 , C25B9/65 , C25B9/70 , C25B9/73 , H01M8/021 , H01M8/0208 , H01M8/0215
Abstract: Layers for a bipolar plates are disclosed, as well as bipolar plates including the layers and fuel cells and/or electrolyzers including the bipolar plates. The layer may include a homogeneous or heterogeneous solid metallic solution or compound which either contains a first chemical element from the group of the noble metals in the form of iridium; or contains a first chemical element from the group of the noble metals in the form of iridium and a second chemical element from the group of the noble metals in the form of ruthenium. The layer may also include at least one further nonmetallic chemical element from the group consisting of nitrogen, carbon, boron, fluorine, and hydrogen.
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7.
公开(公告)号:US20230383396A1
公开(公告)日:2023-11-30
申请号:US18248894
申请日:2021-10-19
Applicant: Oerlikon Surface Solutions AG, Pfäffikon
Inventor: Siegfried KRASSNITZER , Sebastien GUIMOND , Julien KERAUDY , John CONIFF , Matthew Paul KIRK
IPC: C23C14/08 , C23C16/40 , C23C16/455 , C23C28/04 , C23C16/02
CPC classification number: C23C14/083 , C23C16/405 , C23C16/45595 , C23C28/042 , C23C16/0272
Abstract: An article including: a substrate; and a protective film overlaying at least part of the substrate, the film including a fluorinated metal oxide, containing one or more elements of the Group III and/or Group IV elements of the periodical system of elements, characterized in that the protective film includes the fluorinated metal oxide with a carbon doping with a carbon concentration not lower than 0.1 at % and not higher than 10 at %, preferably not lower than 0.5 at % and more preferably not higher than 2.5 at %, wherein the article is a plasma etch chamber component and/or part and preferably an article of the group formed by electrostatic chuck, a ring, a process kit ring, a single ring, a chamber wall, a shower head, a nozzle, a lid, a liner, a window, a baffle or a fastener.
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公开(公告)号:US11795548B2
公开(公告)日:2023-10-24
申请号:US17241469
申请日:2021-04-27
Applicant: Raytheon Technologies Corporation
Inventor: Brian T. Hazel , Xuan Liu , Kaylan M. Wessels , Elisa M. Zaleski , Kimberly Marilurene Adams , Richard W. Jackson
IPC: C22C19/03 , C23C4/134 , C23C4/11 , C04B35/50 , F01D5/28 , C23C28/00 , C23C28/04 , C23C4/06 , C23C4/02 , C04B35/486 , C23C4/10 , F01D25/00 , C23C30/00 , C23C4/04 , C22C19/05 , B32B18/00 , B32B15/04 , B32B15/18
CPC classification number: C23C28/3455 , B32B15/04 , B32B15/043 , B32B15/18 , B32B18/00 , C04B35/486 , C04B35/50 , C22C19/03 , C22C19/05 , C23C4/02 , C23C4/04 , C23C4/06 , C23C4/10 , C23C4/11 , C23C4/134 , C23C28/04 , C23C28/042 , C23C28/044 , C23C28/30 , C23C28/32 , C23C28/321 , C23C28/3215 , C23C28/34 , C23C28/345 , C23C28/347 , C23C28/36 , C23C30/00 , C23C30/005 , F01D5/28 , F01D5/284 , F01D5/288 , F01D25/005 , C04B2235/3224 , C04B2235/3225 , C04B2235/3246 , F05D2230/312 , F05D2230/90 , F05D2260/95 , F05D2300/15 , F05D2300/20 , F05D2300/21 , F05D2300/608 , Y10T428/12389 , Y10T428/12396 , Y10T428/12451 , Y10T428/12458 , Y10T428/12479 , Y10T428/12486 , Y10T428/12597 , Y10T428/12604 , Y10T428/12611 , Y10T428/12618 , Y10T428/12931 , Y10T428/12937 , Y10T428/12944 , Y10T428/12951 , Y10T428/12979 , Y10T428/12993 , Y10T428/2495 , Y10T428/24967 , Y10T428/24992 , Y10T428/263 , Y10T428/264 , Y10T428/265
Abstract: A coated substrate has a substrate and a coating system having one or more ceramic layers. At least a first layer of one of the one or more ceramic layers is a columnar layer having as-deposited columns and intercolumn gaps. The intercolumn gaps have a mean width at least one of: at least 4.0 micrometers; and at least 1.5% of a thickness of said first layer.
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公开(公告)号:US20230304162A1
公开(公告)日:2023-09-28
申请号:US18040549
申请日:2021-08-05
Applicant: SGL CARBON SE
Inventor: Christian MILITZER , Charles WIJAYAWARDHANA , Urban FORSBERG , Henrik PEDERSEN
CPC classification number: C23C28/042 , C23C16/325
Abstract: A refractory carbide multilayer including a first layer, a second layer and a third layer. The first layer has an average thickness of at least 25 nm and contains at least one refractory carbide, the second layer has an average thickness of at least 25 nm and contains at least one refractory carbide, the third layer has an average thickness of at least 25 nm and contains at least one refractory carbide, and the first layer has a larger mean linear intercept section grain size than the second layer.
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公开(公告)号:US20230201930A1
公开(公告)日:2023-06-29
申请号:US17799266
申请日:2021-02-17
Applicant: Sumitomo Electric Hardmetal Corp.
Inventor: Yuta SUZUKI , Kosuke FUKAE
CPC classification number: B23B27/148 , C23C28/044 , C23C28/042 , B23B2224/24 , B23B2228/105
Abstract: A cutting tool including a base material and a hard layer provided on the base material, in which the hard layer is composed of a compound represented by TiaAlbBcN, an atomic ratio a is 0.25 or more and less than 0.55, an atomic ratio b of is 0.45 or more and less than 0.75, an atomic ratio c of is more than 0 and 0.1 or less, a sum of the atomic ratio a, the atomic ratio b and the atomic ratio c is 1, a ratio I(200)/I(002) of an intensity I(200) of an X-ray diffraction peak of a (200) plane to an intensity I(002) of an X-ray diffraction peak of a (002) plane in the hard layer is 2 to 10, and a full width at half maximum of the X-ray diffraction peak of the (002) plane is 2 degrees to 8 degrees.
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