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公开(公告)号：US20060059708A1
公开(公告)日：2006-03-23
申请号：US11222041
申请日：2005-09-07
申请人： Tai-Gyun Kim , Jong-Kook Song , Sung-Bae Kong , Han-Mil Kim
发明人： Tai-Gyun Kim , Jong-Kook Song , Sung-Bae Kong , Han-Mil Kim
CPC分类号： H01L21/67051 , H01L21/67028 , H01L21/67034 , H01L21/673
摘要： The present invention relates to an apparatus for cleaning a semiconductor substrate. The apparatus has a chamber including a treating room and a drying room located on an upper portion of the treating room. A supply pipe and an exhaust pipe are provided in the drying room. The supply pipe supplies isopropyl alcohol. In the exhaust pipe, a fluid in the drying room is exhausted. The exhaust pipe is arranged at both sides of the drying room in parallel to an arrangement direction of wafers. A plurality of exhaust ports are formed in each of exhaust pipes.
摘要翻译： 本发明涉及一种清洗半导体衬底的装置。 该装置具有包括处理室和位于处理室上部的干燥室的室。 供水管和排气管设在干燥室内。 供应管提供异丙醇。 在排气管中，干燥室内的流体被排出。 排气管布置在干燥室的两侧，与晶片的排列方向平行。 在每个排气管中形成有多个排气口。
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公开(公告)号：US20070163627A1
公开(公告)日：2007-07-19
申请号：US11653262
申请日：2007-01-16
申请人： Pyoung-Ho Lim , Jong-Kook Song , Han-Mil Kim
发明人： Pyoung-Ho Lim , Jong-Kook Song , Han-Mil Kim
摘要： Provided are a nozzle and a related substrate treatment apparatus. The substrate treatment apparatus includes a process chamber, a supporting member disposed in the process chamber to support substrates, and a nozzle disposed in the process chamber to supply treatment fluid. The nozzle includes an outer tube along which a plurality of spraying holes are formed and which has a first end that is closed and an inner tube inserted into the outer tube through a hole formed on a second end of the outer tube.
摘要翻译： 提供喷嘴和相关的基底处理装置。 基板处理装置包括处理室，设置在处理室中以支撑基板的支撑构件以及设置在处理室中以供应处理流体的喷嘴。 喷嘴包括外管，多个喷孔形成在该外管上，该外管具有封闭的第一端和通过形成在外管的第二端上的孔插入外管的内管。
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