公开(公告)号：US10155297B2

公开(公告)日：2018-12-18

申请号：US15205367

申请日：2016-07-08

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Jerry Chen ,  Chunhung Chen

IPC: B24B37/20

Abstract: To provide improved planarization, techniques in accordance with this disclosure include a CMP station that includes a support plate having a plurality of apertures. An aperture of the plurality of apertures has a first opening and a second opening connected by a slot. Other systems and methods are also disclosed.

公开(公告)号：US20180009077A1

公开(公告)日：2018-01-11

申请号：US15205367

申请日：2016-07-08

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Jerry Chen ,  Chunhung Chen

IPC: B24B37/20

CPC classification number: B24B37/20 ,  B24B37/32

Abstract: To provide improved planarization, techniques in accordance with this disclosure include a CMP station that includes a support plate having a plurality of apertures. An aperture of the plurality of apertures has a first opening and a second opening connected by a slot. Other systems and methods are also disclosed.