公开(公告)号：US11571782B2

公开(公告)日：2023-02-07

申请号：US16672099

申请日：2019-11-01

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Tsung-Lung Lai ,  Cheng-Ping Chen ,  Shih-Chung Chen ,  Sheng-Tai Peng ,  Rong-Long Hung

IPC: B24B37/16 ,  B24B49/12 ,  B24B37/013

Abstract: The present disclosure provides a chemical mechanical polishing system having a unitary platen. The platen includes one or more recesses within the platen to house various components for the polishing/planarization process. In one embodiment, the platen includes a first recess and a second recess. The first recess is located under the second recess. An end point detector is placed in the first recess and a detector cover may be placed in the second recess. A sealing mean is provided in a space between the end point detector and the detector cover to prevent any external or foreign materials from coming in contact with the end point detector. A fastener used for fastening the detector cover to the platen also provides addition protection to prevent foreign materials from coming in contact with components received in the recesses.

公开(公告)号：US20230133331A1

公开(公告)日：2023-05-04

申请号：US18149489

申请日：2023-01-03

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Tsung-Lung Lai ,  Cheng-Ping Chen ,  Shih-Chung Chen ,  Sheng-Tai Peng ,  Rong-Long Hung

IPC: B24B37/16 ,  B24B49/12 ,  B24B37/013

Abstract: The present disclosure provides a chemical mechanical polishing system having a unitary platen. The platen includes one or more recesses within the platen to house various components for the polishing/planarization process. In one embodiment, the platen includes a first recess and a second recess. The first recess is located under the second recess. An end point detector is placed in the first recess and a detector cover may be placed in the second recess. A sealing mean is provided in a space between the end point detector and the detector cover to prevent any external or foreign materials from coming in contact with the end point detector. A fastener used for fastening the detector cover to the platen also provides addition protection to prevent foreign materials from coming in contact with components received in the recesses.

公开(公告)号：US11975421B2

公开(公告)日：2024-05-07

申请号：US18149489

申请日：2023-01-03

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Tsung-Lung Lai ,  Cheng-Ping Chen ,  Shih-Chung Chen ,  Sheng-Tai Peng ,  Rong-Long Hung

IPC: B24B37/16 ,  B24B37/013 ,  B24B49/12

CPC classification number: B24B37/16 ,  B24B37/013 ,  B24B49/12

Abstract: The present disclosure provides a chemical mechanical polishing system having a unitary platen. The platen includes one or more recesses within the platen to house various components for the polishing/planarization process. In one embodiment, the platen includes a first recess and a second recess. The first recess is located under the second recess. An end point detector is placed in the first recess and a detector cover may be placed in the second recess. A sealing mean is provided in a space between the end point detector and the detector cover to prevent any external or foreign materials from coming in contact with the end point detector. A fastener used for fastening the detector cover to the platen also provides addition protection to prevent foreign materials from coming in contact with components received in the recesses.

公开(公告)号：US20200164481A1

公开(公告)日：2020-05-28

申请号：US16672099

申请日：2019-11-01

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Tsung-Lung Lai ,  Cheng-Ping Chen ,  Shih-Chung Chen ,  Sheng-Tai Peng ,  Rong-Long Hung

IPC: B24B37/16 ,  B24B37/013 ,  B24B49/12

Abstract: The present disclosure provides a chemical mechanical polishing system having a unitary platen. The platen includes one or more recesses within the platen to house various components for the polishing/planarization process. In one embodiment, the platen includes a first recess and a second recess. The first recess is located under the second recess. An end point detector is placed in the first recess and a detector cover may be placed in the second recess. A sealing mean is provided in a space between the end point detector and the detector cover to prevent any external or foreign materials from coming in contact with the end point detector. A fastener used for fastening the detector cover to the platen also provides addition protection to prevent foreign materials from coming in contact with components received in the recesses.