公开(公告)号：US20190155178A1

公开(公告)日：2019-05-23

申请号：US15902528

申请日：2018-02-22

Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.

Inventor： Yu-Fu LIN ,  Tung-Jung CHANG ,  Chia-Chen CHEN

IPC: G03F7/20 ,  B08B3/12

Abstract: An apparatus for cleaning an electrostatic reticle holder used in a lithography system includes a chamber for providing a low pressure environment for the electrostatic reticle holder and an ultrasound transducer configured to apply ultrasound waves to the electrostatic reticle holder. The apparatus further includes a controller configured to control the ultrasound transducer and a gas flow controller. The gas flow controller is configured to enable pressurizing or depressurizing the chamber.

公开(公告)号：US20200310258A1

公开(公告)日：2020-10-01

申请号：US16902087

申请日：2020-06-15

Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.

Inventor： Yu-Fu LIN ,  Tung-Jung CHANG ,  Chia-Chen CHEN

IPC: G03F7/20 ,  B08B3/12 ,  B08B7/02

Abstract: An apparatus for cleaning an electrostatic reticle holder used in a lithography system includes a chamber for providing a low pressure environment for the electrostatic reticle holder and an ultrasound transducer configured to apply ultrasound waves to the electrostatic reticle holder. The apparatus further includes a controller configured to control the ultrasound transducer and a gas flow controller. The gas flow controller is configured to enable pressurizing or depressurizing the chamber.

公开(公告)号：US20180364596A1

公开(公告)日：2018-12-20

申请号：US15622483

申请日：2017-06-14

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Tung-Jung CHANG ,  Yu-Fu LIN ,  Sheng-Kang YU

IPC: G03F7/20 ,  H01L21/67

Abstract: A method for creating a vacuum in a load lock chamber is provided. The method includes building an air-tight environment in the load lock chamber. The method further includes reducing the pressure in a gas tank to a predetermined vacuum pressure. The method also includes enabling an exchange of gas between the load lock chamber and the gas tank when the pressure in the gas tank is at the predetermined vacuum pressure so as to reduce the pressure in the load lock chamber to an adjusted vacuum pressure.