公开(公告)号：US09165095B2

公开(公告)日：2015-10-20

申请号：US14081521

申请日：2013-11-15

Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.

Inventor： Ming-Hui Chih ,  Wen-Li Cheng ,  Yu-Po Tang ,  Ping-Chieh Wu ,  Chia-Ping Chiang ,  Yong-Cheng Lin ,  Wen-Chun Huang ,  Ru-Gun Liu

IPC: G06F17/50

CPC classification number: G06F17/5009 ,  G03F7/70441

Abstract: A method performed by a computer processing system includes receiving a design pattern for an integrated circuit, applying a function to the design pattern to generate a model contour, generating a plurality of Optical Proximity Correction (OPC) target points along the model contour, adjusting the design pattern to create an adjusted pattern, and performing a simulation on the adjusted pattern to create a simulated contour.

Abstract translation: 由计算机处理系统执行的方法包括：接收集成电路的设计模式，向设计模式应用功能以产生模型轮廓，沿着模型轮廓生成多个光学邻近校正（OPC）目标点，调整 设计图案，以创建调整图案，并对经调整的图案进行模拟以创建模拟轮廓。

公开(公告)号：US20150143304A1

公开(公告)日：2015-05-21

申请号：US14081521

申请日：2013-11-15

Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.

Inventor： Ming-Hui Chih ,  Wen-Li Cheng ,  Yu-Po Tang ,  Ping-Chieh Wu ,  Chia-Ping Chiang ,  Yong-Cheng Lin ,  Wen-Chun Huang ,  Ru-Gun Liu

IPC: G06F17/50

CPC classification number: G06F17/5009 ,  G03F7/70441

Abstract: A method performed by a computer processing system includes receiving a design pattern for an integrated circuit, applying a function to the design pattern to generate a model contour, generating a plurality of Optical Proximity Correction (OPC) target points along the model contour, adjusting the design pattern to create an adjusted pattern, and performing a simulation on the adjusted pattern to create a simulated contour.

Abstract translation: 由计算机处理系统执行的方法包括：接收集成电路的设计模式，向设计模式应用功能以产生模型轮廓，沿着模型轮廓生成多个光学邻近校正（OPC）目标点，调整 设计图案，以创建调整图案，并对经调整的图案进行模拟以创建模拟轮廓。