Interferometric apparatus and methods for measuring surface topography of a test surface
    1.
    发明授权
    Interferometric apparatus and methods for measuring surface topography of a test surface 有权
    用于测量测试表面的表面形貌的干涉仪和方法

    公开(公告)号:US06344898B1

    公开(公告)日:2002-02-05

    申请号:US09396491

    申请日:1999-09-14

    IPC分类号: G01B902

    摘要: Apparatus and methods are disclosed for measuring the surface topography of a test surface, such as a spherical or aspherical surface of a refractive or reflective optical element. The test surface is measured by detecting the state of interference fringes generated by interference of a reference light beam and a measurement light beam that interacts (e.g., reflects from) the test surface. The reference and measurement beams are produced by a point light source having a reflective surface. The point light source is disposed between a source of input light and the test surface. The measurement beam (after interacting with the test surface) and the reference beam are caused to interfere with each other to produce a first interference-fringe state. The distance between the point light source and the test surface can be changed between production of the first interference-fringe state and production of a second interference-fringe state. The profile of the test surface is determined by analyzing the resulting interference fringes. A null element can be used to convert a spherical wavefront of the measurement beam into an aspherical wavefront corresponding to the aspherical test surface, or to convert an aspherical wavefront generated by reflection of a spherical wavefront from an aspherical test surface into a spherical or planar wavefront.

    摘要翻译: 公开了用于测量测试表面(例如折射或反射光学元件的球面或非球面)的表面形貌的装置和方法。 通过检测由参考光束和与测试表面相互作用(例如反射)的测量光束产生的干涉条纹的状态来测量测试表面。 参考和测量光束由具有反射表面的点光源产生。 点光源设置在输入光源和测试表面之间。 使测量光束(与测试表面相互作用)和参考光束相互干涉以产生第一干涉条纹状态。 可以在产生第一干涉条纹状态和产生第二干涉条纹状态之间改变点光源与测试表面之间的距离。 通过分析所得到的干涉条纹来确定测试表面的轮廓。 可以使用空元素将测量光束的球面波前转换成对应于非球面测试表面的非球面波前,或者将通过球面波阵面的反射产生的非球面波阵面从非球面测试表面转换成球面或平面波阵面 。