-
1.发明授权公开(公告)号：US08559583B1
公开(公告)日：2013-10-15
申请号：US12394576
申请日：2009-02-27
申请人： Takashi Sato , Masanori Ino , Yasunobu Fujiki , Kazunori Hashimoto , Junichiro Otonari , Hisaki Sato , Naoko Matsunaga
发明人： Takashi Sato , Masanori Ino , Yasunobu Fujiki , Kazunori Hashimoto , Junichiro Otonari , Hisaki Sato , Naoko Matsunaga
IPC分类号： G21C9/00
CPC分类号： G21C9/004 , G21C1/086 , G21C15/18 , G21Y2002/304 , G21Y2004/30 , Y02E30/32
摘要： A passive cooling and depressurization system for a pressurized water nuclear plant is provided with a cooling water pool, a steam supply piping, a heat exchanger, a steam supply valve, a coolant return pipe and an outlet valve. The steam supply piping extends from the gas phase of the pressurizer. The heat exchanger exchanges heat between water stored in the cooling water pool and steam flowing through the steam supply piping. The steam supply valve is equipped on the steam supply piping. The coolant return pipe extends from the heat exchanger to a liquid phase of the reactor pressure boundary. The outlet valve is equipped on the coolant return pipe.
摘要翻译： 用于加压水核电厂的被动冷却和减压系统设置有冷却水池，蒸汽供应管道，热交换器，蒸汽供应阀，冷却剂回流管和出口阀。 蒸汽供应管道从加压器的气相延伸。 热交换器在存储在冷却水池中的水和通过蒸汽供应管道的蒸汽之间交换热量。 蒸汽供应阀配备在蒸汽供应管道上。 冷却剂回流管从热交换器延伸到反应堆压力边界的液相。 排气阀装在冷却液回流管上。
-
2.发明申请公开(公告)号：US20130259183A1
公开(公告)日：2013-10-03
申请号：US12394576
申请日：2009-02-27
申请人： Takashi Sato , Masanori Ino , Yasunobu Fujiki , Kazunori Hashimoto , Junichiro Otonari , Hisaki Sato , Naoko Matsunaga
发明人： Takashi Sato , Masanori Ino , Yasunobu Fujiki , Kazunori Hashimoto , Junichiro Otonari , Hisaki Sato , Naoko Matsunaga
IPC分类号： G21C9/004
CPC分类号： G21C9/004 , G21C1/086 , G21C15/18 , G21Y2002/304 , G21Y2004/30 , Y02E30/32
摘要： A passive cooling and depressurization system for a pressurized water nuclear plant is provided with a cooling water pool, a steam supply piping, a heat exchanger, a steam supply valve, a coolant return pipe and an outlet valve. The steam supply piping extends from the gas phase of the pressurizer. The heat exchanger exchanges heat between water stored in the cooling water pool and steam flowing through the steam supply piping. The steam supply valve is equipped on the steam supply piping. The coolant return pipe extends from the heat exchanger to a liquid phase of the reactor pressure boundary. The outlet valve is equipped on the coolant return pipe.
摘要翻译： 用于加压水核电厂的被动冷却和减压系统设置有冷却水池，蒸汽供应管道，热交换器，蒸汽供应阀，冷却剂回流管和出口阀。 蒸汽供应管道从加压器的气相延伸。 热交换器在存储在冷却水池中的水和通过蒸汽供应管道的蒸汽之间交换热量。 蒸汽供应阀配备在蒸汽供应管道上。 冷却剂回流管从热交换器延伸到反应堆压力边界的液相。 排气阀装在冷却液回流管上。
-
公开(公告)号：US09793015B2
公开(公告)日：2017-10-17
申请号：US12338559
申请日：2008-12-18
CPC分类号： G21C15/18 , G21C9/004 , G21C13/00 , G21Y2002/304 , G21Y2004/30 , Y02E30/32
摘要： A containment vessel for containing a reactor pressure vessel, a reactor core, and a steam generator of a pressurized water reactor includes a main body equipped with a polar crane, a diaphragm set above the polar crane that partitions the main body, before and after a loss-of-coolant accident (LOCA), into an upper vessel including a dome part having an open space and a lower vessel isolated from the upper vessel, a pressure suppression chamber including a suppression pool that stores water and a gas phase in communication with the open space, a LOCA vent pipe connecting the suppression pool to the lower vessel, and a vacuum breaker that equalizes pressure by allowing gas flow from the upper to the lower vessel when a pressure difference between the upper and lower vessels exceeds a preset value. The lower vessel contains all equipment and piping constituting a reactor pressure boundary.
-
公开(公告)号：US08817941B2
公开(公告)日：2014-08-26
申请号：US13044909
申请日：2011-03-10
申请人： Takashi Sato , Kazunori Hashimoto , Hirohide Oikawa , Yasunobu Fujiki , Makoto Akinaga , Hisaki Sato
发明人： Takashi Sato , Kazunori Hashimoto , Hirohide Oikawa , Yasunobu Fujiki , Makoto Akinaga , Hisaki Sato
摘要： According to an embodiment, a pressurized water reactor plant has a primary system which includes: a reactor vessel for housing a reactor core which is cooled by a primary coolant, a single steam generator, a hot leg pipe for connecting the reactor vessel and the steam generator, cold leg pipes, at least two primary coolant pumps, and a pressurizer for pressurizing the primary coolant pressure boundary in which the primary coolant flows. The plant also has: a passive cooling and depressurization system which is a primary depressurization means for equalizing the primary system pressure to the secondary system pressure at the time of a tube rupture accident of the steam generator, and a reactor containment vessel containing the primary system and cooling the primary system by air cooling. Thus, a compact pressurized water rector with high economic efficiency, safety, and reliability can be provided.
摘要翻译： 根据实施例，压水反应堆设备具有主要系统，其包括：用于容纳由主冷却剂冷却的反应堆堆芯的反应堆容器，单个蒸汽发生器，用于连接反应堆容器的热腿管和蒸汽 发电机，冷腿管，至少两个一次冷却剂泵，以及用于对初级冷却剂流动的主冷却剂压力边界加压的加压器。 该设备还具有：被动冷却和减压系统，其是在蒸汽发生器的管道破裂事故发生时使初级系统压力与二次系统压力相等的主要减压装置，以及包含主系统的反应堆安全壳 并通过空气冷却冷却主系统。 因此，可以提供具有高经济性，安全性和可靠性的紧凑型压水机。
-
公开(公告)号：US20090215247A1
公开(公告)日：2009-08-27
申请号：US12434637
申请日：2009-05-02
申请人： Takashi Sato , Junichi Takano , Takashi Sato , Tokuo Naitou
发明人： Takashi Sato , Junichi Takano , Takashi Sato , Tokuo Naitou
IPC分类号： H01L21/304
CPC分类号： H01L21/67092 , H01L21/78 , H01L2224/06181 , H01L2224/32245 , H01L2224/45144 , H01L2224/48091 , H01L2224/48247 , H01L2224/73265 , H01L2924/181 , H01L2924/00012 , H01L2924/00
摘要： Illumination devices (7a) and (7b) which irradiate light having a wavelength of 1.1 μm or less are arranged on a front surface and a rear surface of a cover (8) of a dicing device (1). After a wafer is placed on a dicing stage (3), when the wafer is diced by a blade (4a) attached to a spindle (5), light is irradiated on an entire surface of an upper surface (element forming surface) of the wafer by the illumination devices (7a) and (7b). At this time, an illuminance of light on the wafer is set at 70 lux or more and 2000 lux or less. By this means, during a dicing operation, an area to be a light-shielded area by the spindle (5) or the like is not present on the wafer.
摘要翻译： 在扫描装置（1）的盖（8）的前表面和后表面上布置照射波长为1.1μm以下的光的照明装置（7a）和（7b）。 在将晶片放置在切割台（3）上之后，当通过安装在主轴（5）上的刀片（4a）切割晶片时，将光照射在上表面（元件形成表面）的整个表面上 晶片通过照明装置（7a）和（7b）。 此时，晶片上的光的照度设定为70勒克司以上且2000lux以下。 通过这种方式，在切割操作期间，晶片上不存在由主轴（5）等构成遮光区域的区域。
-
公开(公告)号：US07998793B2
公开(公告)日：2011-08-16
申请号：US12434637
申请日：2009-05-02
申请人： Takashi Sato , Junichi Takano , Takashi Sato , Tokuo Naitou
发明人： Takashi Sato , Junichi Takano , Takashi Sato , Tokuo Naitou
IPC分类号： H01L21/00
CPC分类号： H01L21/67092 , H01L21/78 , H01L2224/06181 , H01L2224/32245 , H01L2224/45144 , H01L2224/48091 , H01L2224/48247 , H01L2224/73265 , H01L2924/181 , H01L2924/00012 , H01L2924/00
摘要： Illumination devices (7a) and (7b) which irradiate light having a wavelength of 1.1 μm or less are arranged on a front surface and a rear surface of a cover (8) of a dicing device (1). After a wafer is placed on a dicing stage (3), when the wafer is diced by a blade (4a) attached to a spindle (5), light is irradiated on an entire surface of an upper surface (element forming surface) of the wafer by the illumination devices (7a) and (7b). At this time, an illuminance of light on the wafer is set at 70 lux or more and 2000 lux or less. By this means, during a dicing operation, an area to be a light-shielded area by the spindle (5) or the like is not present on the wafer.
摘要翻译： 在切割装置（1）的盖（8）的前表面和后表面上布置照射波长为1.1μm以下的光的照明装置（7a）和（7b）。 在将晶片放置在切割台（3）上之后，当通过安装在主轴（5）上的刀片（4a）切割晶片时，将光照射在上表面（元件形成表面）的整个表面上 晶片通过照明装置（7a）和（7b）。 此时，晶片上的光的照度设定为70勒克司以上且2000lux以下。 通过这种方式，在切割操作期间，晶片上不存在由主轴（5）等构成遮光区域的区域。
-
公开(公告)号：US20080138962A1
公开(公告)日：2008-06-12
申请号：US11632993
申请日：2004-07-22
申请人： Takashi Sato , Junichi Takano , Takashi Sato , Tokuo Naitou
发明人： Takashi Sato , Junichi Takano , Takashi Sato , Tokuo Naitou
IPC分类号： H01L21/304
CPC分类号： H01L21/67092 , H01L21/78 , H01L2224/06181 , H01L2224/32245 , H01L2224/45144 , H01L2224/48091 , H01L2224/48247 , H01L2224/73265 , H01L2924/181 , H01L2924/00012 , H01L2924/00
摘要： Illumination devices (7a) and (7b) which irradiate light having a wavelength of 1.1 μm or less are arranged on a front surface and a rear surface of a cover (8) of a dicing device (1). After a wafer is placed on a dicing stage (3), when the wafer is diced by a blade (4a) attached to a spindle (5), light is irradiated on an entire surface of an upper surface (element forming surface) of the wafer by the illumination devices (7a) and (7b). At this time, an illuminance of light on the wafer is set at 70 lux or more and 2000 lux or less. By this means, during a dicing operation, an area to be a light-shielded area by the spindle (5) or the like is not present on the wafer.
摘要翻译： 在切割装置（1）的盖（8）的前表面和后表面上布置照射具有1.1μm或更小的波长的光的照明装置（7a）和（7b）。 在将晶片放置在切割台（3）上之后，当通过安装在主轴（5）上的刀片（4a）切割晶片时，将光照射在上表面（元件形成表面）的整个表面上 通过照明装置（7a）和（7b）的晶片。 此时，晶片上的光的照度设定为70勒克司以上且2000lux以下。 通过这种方式，在切割操作期间，晶片上不存在由主轴（5）等构成遮光区域的区域。
-
公开(公告)号：US10026968B2
公开(公告)日：2018-07-17
申请号：US14000569
申请日：2012-01-04
申请人： Masaki Horikita , Kunchan Lee , Yasuaki Wakizaka , Takashi Sato
发明人： Masaki Horikita , Kunchan Lee , Yasuaki Wakizaka , Takashi Sato
IPC分类号： H01M4/88 , H01M4/90 , H01M8/1018
CPC分类号： H01M4/8882 , H01M4/8825 , H01M4/9008 , H01M4/9016 , H01M4/9083 , H01M2008/1095
摘要： A method for producing a fuel cell electrode catalyst, including a step (I) of bringing an aqueous solution of a transition metal compound (1) into contact with ammonia and/or ammonia water to generate a precipitate (A) containing an atom of the transition metal, a step (II) of mixing at least the precipitate (A), an organic compound (B), and a liquid medium (C) to obtain a catalyst precursor liquid, and a step (IV) of subjecting the solid in the catalyst precursor liquid to heat treatment at a temperature of 500 to 1200° C. to obtain an electrode catalyst; a portion or the entirety of the transition metal compound (1) being a compound containing a transition metal element of group 4 or group 5 of the periodic table; and the organic compound (B) being at least one selected from sugars and the like.
-
公开(公告)号：US09818495B2
公开(公告)日：2017-11-14
申请号：US13988966
申请日：2011-09-14
申请人： Takashi Sato
发明人： Takashi Sato
摘要： A containment vessel has an inner shell covering a reactor pressure vessel and an outer shell forming an outer well which is a gas-tight space covering the horizontal outer periphery of the inner shell. The inner shell has a first cylindrical side wall surrounding the horizontal periphery of the reactor pressure vessel, a containment vessel head which covers the upper part of the reactor pressure vessel, and a first top slab connecting in a gas-tight manner the periphery of the containment vessel head and the upper end of the first cylindrical side wall. The outer shell has a second cylindrical side wall surrounding the outer periphery of the first cylindrical side wall, and also has a second to slab connecting in a gas-tight manner the vicinity of the upper end of the second cylindrical side wall and the first cylindrical side wall.
-
公开(公告)号：US09653994B2
公开(公告)日：2017-05-16
申请号：US13215035
申请日：2011-08-22
申请人： Katsumi Taguchi , Takashi Sato
发明人： Katsumi Taguchi , Takashi Sato
摘要： A power supply device supplying power to a device via a power line is provided, where the power supply device includes a first voltage generation unit configured to generate and supply a first direct voltage to the power line, a second voltage generation unit configured to generate and supply a second direct voltage lower than the first direct voltage to the power line, a measurement unit configured to measure a voltage of the power line, a control unit configured to control supply of the first direct voltage with the first voltage generation unit after starting supply of the second direct voltage with the second voltage generation unit, and a determination unit configured to determine a state of the power supply device based on the measured voltage and a first threshold value after starting the supply of the second direct voltage.
-
-
-
-
-
-
-
-
-
搜索结果
798 条记录 (耗时 0.037 秒)
