公开(公告)号：US06909372B2

公开(公告)日：2005-06-21

申请号：US10662471

申请日：2003-09-16

申请人： Takehiko Iwanaga ,  Kazuhito Outsuka ,  Toshiyuki Shigaraki

发明人： Takehiko Iwanaga ,  Kazuhito Outsuka ,  Toshiyuki Shigaraki

IPC分类号： G03F7/20 ,  G01R19/165 ,  G01R31/40 ,  G05B19/18 ,  H01L21/027 ,  G08B17/00

CPC分类号： G01R19/16538 ,  G01R31/40

摘要： A power monitoring apparatus monitors the voltage fluctuation range of an AC power supply and the duration of voltage fluctuations within the voltage fluctuation range. The power monitoring apparatus looks up a power failure rank table for determining the power failure rank of the power supply on the basis of the voltage fluctuation range and the duration obtained as the monitoring result to determine the power failure rank of the power supply. The power monitoring apparatus sends a power failure signal indicating the power failure rank to a power supply destination of an AC power supply.

摘要翻译： 功率监视装置监视交流电源的电压波动范围和电压波动范围内的电压波动的持续时间。 功率监视装置基于电压波动范围和作为监视结果获得的持续时间来查找用于确定电源的电源故障等级的电源故障等级表，以确定电源的电源故障等级。 电力监视装置向AC电源的供电目的地发送指示电力故障等级的停电信号。

公开(公告)号：US20060066825A1

公开(公告)日：2006-03-30

申请号：US11233034

申请日：2005-09-23

申请人： Toshiyuki Shigaraki

发明人： Toshiyuki Shigaraki

IPC分类号： G03B27/52

CPC分类号： G03F7/70008 ,  G03F7/70858

摘要： Disclosed is an apparatus for exposing a wafer to light, the apparatus including a light source unit having a light source for emitting light, a first cooling unit for cooling the light source unit, the first cooling unit having a gas flowpassage for a gas passing through the light source unit, and a second cooling unit for cooling the gas, the second cooling unit having a first fluid flowpassage for a first fluid which is to be heat-exchanged with the gas in the gas flowpassage at a position downstream of the light source unit with respect to the flow of the gas.

摘要翻译： 公开了一种用于将晶片曝光的装置，该装置包括具有用于发光的光源的光源单元，用于冷却光源单元的第一冷却单元，具有用于气体通过的气体的气体流通的第一冷却单元 所述光源单元和用于冷却所述气体的第二冷却单元，所述第二冷却单元具有用于与在所述光源的下游位置处的气体流过中的气体进行热交换的第一流体的第一流体流通 相对于气体流动的单位。

公开(公告)号：US07262830B2

公开(公告)日：2007-08-28

申请号：US11233034

申请日：2005-09-23

申请人： Toshiyuki Shigaraki

发明人： Toshiyuki Shigaraki

IPC分类号： G03B27/52 ,  G03B27/54 ,  F21V29/00

CPC分类号： G03F7/70008 ,  G03F7/70858

摘要： An apparatus for exposing a wafer to light. The apparatus includes a light source unit having a light source for emitting light, a first cooling unit for cooling the light source unit, in which the first cooling unit has a gas flowpassage for a gas passing through the light source unit, a second cooling unit for cooling the gas, in which the second cooling unit has a first fluid flowpassage for a first fluid which is to be heat-exchanged with the gas in the gas flowpassage at a position downstream of the light source unit with respect to the flow of the gas, and a first temperature adjusting unit for adjusting the temperature of the first fluid. The first temperature adjusting unit has a second fluid flowpassage for a second fluid which is to be heat-exchanged with the first fluid in the first fluid flowpassage at a position upstream of the cooling unit with respect to the flow of the first fluid.

摘要翻译： 一种用于将晶片曝光的装置。 该装置包括具有用于发光的光源的光源单元，用于冷却光源单元的第一冷却单元，其中第一冷却单元具有用于通过光源单元的气体的气体流通;第二冷却单元 用于冷却气体，其中第二冷却单元具有用于第一流体的第一流体流通，所述第一流体将在与光源单元的流动相关的光源单元的下游的位置处与气体流过中的气体进行热交换 气体和用于调节第一流体的温度的第一温度调节单元。 第一温度调节单元具有用于第二流体的第二流体流通，该第二流体将在与第一流体流动相对于冷却单元上游的位置处与第一流体流通中的第一流体进行热交换。