公开(公告)号：US06909372B2

公开(公告)日：2005-06-21

申请号：US10662471

申请日：2003-09-16

申请人： Takehiko Iwanaga ,  Kazuhito Outsuka ,  Toshiyuki Shigaraki

发明人： Takehiko Iwanaga ,  Kazuhito Outsuka ,  Toshiyuki Shigaraki

IPC分类号： G03F7/20 ,  G01R19/165 ,  G01R31/40 ,  G05B19/18 ,  H01L21/027 ,  G08B17/00

CPC分类号： G01R19/16538 ,  G01R31/40

摘要： A power monitoring apparatus monitors the voltage fluctuation range of an AC power supply and the duration of voltage fluctuations within the voltage fluctuation range. The power monitoring apparatus looks up a power failure rank table for determining the power failure rank of the power supply on the basis of the voltage fluctuation range and the duration obtained as the monitoring result to determine the power failure rank of the power supply. The power monitoring apparatus sends a power failure signal indicating the power failure rank to a power supply destination of an AC power supply.

摘要翻译： 功率监视装置监视交流电源的电压波动范围和电压波动范围内的电压波动的持续时间。 功率监视装置基于电压波动范围和作为监视结果获得的持续时间来查找用于确定电源的电源故障等级的电源故障等级表，以确定电源的电源故障等级。 电力监视装置向AC电源的供电目的地发送指示电力故障等级的停电信号。

公开(公告)号：US07072027B2

公开(公告)日：2006-07-04

申请号：US10961205

申请日：2004-10-12

申请人： Takehiko Iwanaga

发明人： Takehiko Iwanaga

IPC分类号： G03B27/58 ,  G03B27/62

CPC分类号： G03B21/26 ,  G03F7/70641 ,  G03F7/70725

摘要： A scanning exposure apparatus includes a projection optical system which projects a pattern formed on a mask onto an object, a stage which holds an object and moves in a direction perpendicular to an optical axis of the projection optical system, a measurement system which measures a position of a surface of the object in a direction of the optical axis in response to a reset signal, and a generation system which generates the reset signal when the stage arrives at each predetermined position in the direction perpendicular to the optical axis.

摘要翻译： 扫描曝光装置包括将形成在掩模上的图案投射到物体上的投影光学系统，保持物体并沿与投影光学系统的光轴垂直的方向移动的台，测量位置的测量系统 响应于复位信号在光轴的方向上的物体的表面;以及当台在垂直于光轴的方向到达每个预定位置时产生复位信号的生成系统。

公开(公告)号：US07046336B2

公开(公告)日：2006-05-16

申请号：US11180548

申请日：2005-07-14

申请人： Takehiko Iwanaga

发明人： Takehiko Iwanaga

IPC分类号： G03B27/42 ,  G03B27/58 ,  G05B19/18

CPC分类号： G03B27/58 ,  G03F7/70725

摘要： A scanning exposure apparatus includes a stage unit which supports and moves a substrate, and a control unit which starts exposing the substrate after a start of a second section in an acceleration section of the stage unit sequentially including a first section in which a jerk is positive, the second section in which a jerk is 0, and a third section in which a jerk is negative.

摘要翻译： 扫描曝光装置包括支撑和移动基板的台单元，以及控制单元，其在平台单元的加速部分中的第二部分开始之后开始曝光基板，该第一部分依次包括突跳为正的第一部分 ，混合物为0的第二部分，以及其中加加速度为负的第三部分。

公开(公告)号：US5581348A

公开(公告)日：1996-12-03

申请号：US591916

申请日：1996-01-25

申请人： Seiya Miura ,  Michio Kohno ,  Takehiko Iwanaga

发明人： Seiya Miura ,  Michio Kohno ,  Takehiko Iwanaga

IPC分类号： G01N21/94 ,  G01N21/95 ,  G01N21/00 ,  G02B27/10

CPC分类号： G01N21/94

摘要： A surface state inspecting device includes an illumination system for illuminating a surface to be inspected, with a beam having non-uniform sectional intensity distribution, a uniforming system for substantially uniforming the sectional intensity distribution of the beam, and an inspecting portion for detecting scattered light from the surface to determine the state of the surface.

摘要翻译： 表面状态检查装置包括用于照射具有不均匀分布强度分布的光束的被检查表面的照明系统，用于使束的截面强度分布基本均匀化的均匀系统，以及用于检测散射光的检查部 从表面来确定表面的状态。

公开(公告)号：US20050248745A1

公开(公告)日：2005-11-10

申请号：US11180548

申请日：2005-07-14

申请人： Takehiko Iwanaga

发明人： Takehiko Iwanaga

IPC分类号： G03F7/20 ,  G03B27/58 ,  H01L21/027

CPC分类号： G03B27/58 ,  G03F7/70725

摘要： A scanning exposure apparatus includes a stage unit which supports and moves a substrate, and a control unit which starts exposing the substrate after a start of a second section in an acceleration section of the stage unit sequentially including a first section in which a jerk is positive, the second section in which a jerk is 0, and a third section in which a jerk is negative.

摘要翻译： 扫描曝光装置包括支撑和移动基板的台单元，以及控制单元，其在平台单元的加速部分中的第二部分开始之后开始曝光基板，该第一部分依次包括突跳为正的第一部分 ，混合物为0的第二部分，以及其中加加速度为负的第三部分。

公开(公告)号：US20050041235A1

公开(公告)日：2005-02-24

申请号：US10961205

申请日：2004-10-12

申请人： Takehiko Iwanaga

发明人： Takehiko Iwanaga

IPC分类号： G01B11/00 ,  G01B21/00 ,  G01B21/02 ,  G03B21/26 ,  G03F7/207 ,  G03F7/22 ,  G03F9/02 ,  H01L21/027 ,  G03B27/58

CPC分类号： G03B21/26 ,  G03F7/70641 ,  G03F7/70725

摘要： A scanning exposure apparatus includes a projection optical system which projects a pattern formed on a mask onto an object, a stage which holds an object and moves in a direction perpendicular to an optical axis of the projection optical system, a measurement system which measures a position of a surface of the object in a direction of the optical axis in response to a reset signal, and a generation system which generates the reset signal when the stage arrives at each predetermined position in the direction perpendicular to the optical axis.

摘要翻译： 扫描曝光装置包括将形成在掩模上的图案投射到物体上的投影光学系统，保持物体并沿与投影光学系统的光轴垂直的方向移动的台，测量位置的测量系统 响应于复位信号在光轴的方向上的物体的表面;以及当台在垂直于光轴的方向到达每个预定位置时产生复位信号的生成系统。

公开(公告)号：US06954259B2

公开(公告)日：2005-10-11

申请号：US10775085

申请日：2004-02-11

申请人： Takehiko Iwanaga

发明人： Takehiko Iwanaga

IPC分类号： G03F7/20 ,  G03B27/58 ,  H01L21/027 ,  G03B19/18 ,  G03B27/42

CPC分类号： G03B27/58 ,  G03F7/70725

摘要： A scanning exposure apparatus includes a stage unit which supports and moves a substrate, and a control unit which starts exposing the substrate after a start of a second section in an acceleration section of the stage unit sequentially including a first section in which a jerk is positive, the second section in which a jerk is 0, and a third section in which a jerk is negative.

公开(公告)号：US5347118A

公开(公告)日：1994-09-13

申请号：US155538

申请日：1993-11-22

申请人： Takehiko Iwanaga

发明人： Takehiko Iwanaga

IPC分类号： G03F9/00 ,  G01J1/32

CPC分类号： G03F9/70

摘要： A method of aligning a substrate includes the steps of detecting misalignment of the substrate using an image signal from a charge coupled device (CCD) camera which receives light reflected by an alignment mark on the substrate illuminated by pulse light, and moving the substrate in accordance with the detected misalignment. If the amount of light received by the camera during a predetermined time period does not reach a predetermined value, the predetermined time period is increased. If the amount of light exceeds the predetermined value, the amount of light emitted by the source of the pulse light for each pulse is reduced. An aligning apparatus for carrying out the method includes a light source for generating pulse light for illuminating an alignment mark on a substrate, a camera for receiving light reflected by the alignment mark to generate an image signal, a signal processing circuit for detecting misalignment of the substrate based on the image signal, a driver for moving the substrate in accordance with the output from the signal processing circuit, a detector for monitoring the amount of light received by the camera, and a light modulating mechanism for adjusting the amount of light emitted by the light source in accordance with the output from the light amount detector.

摘要翻译： 对准衬底的方法包括以下步骤：使用来自电荷耦合器件（CCD）照相机的图像信号来检测衬底的未对准，所述电荷耦合器件（CCD）照相机接收由由脉冲光照射的衬底上的对准标记反射的光，并且按照 检测到的未对准。 如果在预定时间段期间由相机接收的光量未达到预定值，则预定时间段增加。 如果光量超过预定值，则每个脉冲的脉冲光源发射的光量减少。 用于执行该方法的对准装置包括用于产生用于照射基板上的对准标记的脉冲光的光源，用于接收由对准标记反射的光以产生图像信号的照相机，用于检测对准标记的未对准的信号处理电路 基于图像信号的基板，用于根据信号处理电路的输出移动基板的驱动器，用于监视由相机接收的光量的检测器，以及用于调节由相机发射的光量的光调制机构 根据来自光量检测器的输出的光源。

公开(公告)号：US06816239B2

公开(公告)日：2004-11-09

申请号：US10235646

申请日：2002-09-06

申请人： Takehiko Iwanaga

发明人： Takehiko Iwanaga

IPC分类号： G03B2758

CPC分类号： G03B21/26 ,  G03F7/70641 ,  G03F7/70725

摘要： An exposure apparatus includes a stage which moves with an object thereon. A surface position detector is arranged to detect a surface position of the object at a timing that is asynchronous to a reference signal, and is provided for controlling the stage.

公开(公告)号：US06788391B2

公开(公告)日：2004-09-07

申请号：US10161728

申请日：2002-06-05

申请人： Takehiko Iwanaga

发明人： Takehiko Iwanaga

IPC分类号： G03B2772

CPC分类号： G03F7/70066 ,  G03B27/48

摘要： An illumination device for scanning exposure apparatus for carrying out exposure even when a movable stage is being accelerated and decelerated. The apparatus includes an illumination-distribution varying device for temporarily varying the illumination distribution of an illumination unit that is performing the exposure, wherein the illumination-distribution varying device has a function for varying the temporary change of the illumination distribution in conformity with a pattern for driving the movable stage.

摘要翻译： 一种用于扫描曝光装置的照明装置，即使在可移动台被加速和减速时也进行曝光。 该装置包括用于临时改变正在进行曝光的照明单元的照明分布的照明分配改变装置，其中照明分布改变装置具有根据图像的模式改变照明分布的暂时变化的功能， 驾驶活动舞台。