公开(公告)号：US20070006904A1

公开(公告)日：2007-01-11

申请号：US11474486

申请日：2006-06-26

申请人： Takehiro Hagiwara ,  Tatsuo Kataoka ,  Seiji Noda ,  Takafumi Nakai

发明人： Takehiro Hagiwara ,  Tatsuo Kataoka ,  Seiji Noda ,  Takafumi Nakai

IPC分类号： B08B3/00 ,  B08B3/12

CPC分类号： H01L21/67051 ,  B08B3/02 ,  B08B2203/007 ,  B08B2230/01

摘要： A substrate cleaning system that cleans a glass substrate by supplying liquid and gas to spray nozzles and by spraying fluid, where the liquid and the gas are mixed in the spray nozzles, onto the substrate in order to effectively remove foreign objects attached on the end surface of substrate after performing mechanical cut-off or polishing treatment, the system has: liquid heating means for heating the liquid to be supplied to the spray nozzles to control the temperature of the liquid, in which the temperature of the liquid at the inlet of the spray nozzles is controlled at 40° C. to 100° C.

摘要翻译： 一种基板清洁系统，其通过向喷嘴供应液体和气体并且通过将液体和气体在喷嘴中混合的喷雾流体喷射到基板上来清洁玻璃基板，以便有效地去除附着在端面上的异物 在进行机械切断或抛光处理之后，该系统具有：用于加热供给喷嘴的液体以控制液体的温度的液体加热装置，其中液体的入口温度为 喷嘴控制在40°C至100°C