公开(公告)号：US20130340351A1

公开(公告)日：2013-12-26

申请号：US13918341

申请日：2013-06-14

申请人： Takeshi FUKUDA ,  Tsuguo WATANABE ,  Junji HIROSE ,  Kenji NAKAMURA ,  Masato DOURA

发明人： Takeshi FUKUDA ,  Tsuguo WATANABE ,  Junji HIROSE ,  Kenji NAKAMURA ,  Masato DOURA

IPC分类号： B24D11/00

CPC分类号： B24D11/003 ,  B24B37/205 ,  B24B37/22 ,  B24B37/24 ,  B24B37/26 ,  B24D3/32 ,  B24D18/00 ,  B29C44/24 ,  B29C44/308 ,  B29C44/32 ,  B29C44/322 ,  B29C44/326 ,  B29C44/5654 ,  C08J9/30 ,  C08J2375/08 ,  Y10T156/1052 ,  Y10T156/1059

摘要： A method for manufacturing a polishing pad, which may be laminated, with a small number of manufacturing steps, high productivity and no peeling between a polishing layer and a cushion layer includes preparing a cell-dispersed urethane composition by a mechanical foaming method; continuously discharging the cell-dispersed urethane composition onto a face material, while feeding the face material; laminating another face material on the cell-dispersed urethane composition; curing the cell-dispersed urethane composition, while controlling its thickness to be uniform, so that a polishing layer including a polyurethane foam is formed; cutting the polishing layer parallel to the face into two pieces so that two long polishing layers each including the polishing layer and the face material are simultaneously formed; and cutting the long polishing layers to produce the polishing pad.