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    Method for production of a laminate polishing pad
    1.
    发明授权
    Method for production of a laminate polishing pad 有权
    层压抛光垫的制造方法

    公开(公告)号：US09126303B2

    公开(公告)日：2015-09-08

    申请号：US12065253

    申请日：2006-08-25

    申请人： Junji Hirose ,  Masato Doura

    发明人： Junji Hirose ,  Masato Doura

    IPC分类号： B24B37/20 ,  B24D18/00 ,  B29C44/32 ,  C08G18/12 ,  C08G18/48 ,  C08G18/72 ,  C08G18/75 ,  C08G18/76 ,  C08G101/00

    CPC分类号： B24B37/20 ,  B24D18/00 ,  B29C44/321 ,  B29C44/326 ,  B29C44/332 ,  C08G18/12 ,  C08G18/4854 ,  C08G18/724 ,  C08G18/758 ,  C08G18/7621 ,  C08G2101/0025 ,  C08G18/3814

    摘要： Disclosed is a method for production of a laminate polishing pad which comprises a reduced number of steps and is excellent in productivity rate, and which causes no detachment between a polishing layer and a cushion layer and can prevent the groove clogging caused by a slurry or the like. Also disclosed is a laminate polishing pad produced by the method. A method for production of a laminate polishing pad, comprising the steps of: preparing a cell-dispersed urethane composition by a mechanical frothing process; ejecting the cell-dispersed urethane composition onto a cushion layer continuously while feeding the cushion layer; curing the cell-dispersed urethane composition while controlling the thickness of the composition evenly to form a polishing layer made of a polyurethane foam, thereby producing a long laminate sheet; and cutting the long laminate sheet.

    摘要翻译： 公开了一种生产层压抛光垫的方法，该方法包括步骤减少并且生产率优异，并且不会在抛光层和缓冲层之间发生分离，并且可以防止由浆料引起的槽堵塞或 喜欢。 还公开了通过该方法制造的层压抛光垫。 一种层压抛光垫的制造方法，包括以下步骤：通过机械起泡法制备细胞分散的聚氨酯组合物; 在缓冲层供给的同时连续地将细胞分散的氨基甲酸酯组合物喷射到缓冲层上; 固化细胞分散的聚氨酯组合物，同时均匀地控制组合物的厚度，以形成由聚氨酯泡沫制成的抛光层，从而生产长层压片; 并切割长层压板。

    Polishing pad and a method for manufacturing the same
    3.
    发明授权
    Polishing pad and a method for manufacturing the same 有权
    抛光垫及其制造方法

    公开(公告)号：US08602846B2

    公开(公告)日：2013-12-10

    申请号：US13552346

    申请日：2012-07-18

    申请人： Takeshi Fukuda ,  Junji Hirose ,  Kenji Nakamura ,  Masato Doura ,  Akinori Sato

    发明人： Takeshi Fukuda ,  Junji Hirose ,  Kenji Nakamura ,  Masato Doura ,  Akinori Sato

    IPC分类号： B24B1/00

    CPC分类号： B24B37/24 ,  B24D3/26 ,  B24D11/001

    摘要： A polishing pad of excellent durability and adhesion between the polishing layer and the base material layer includes a polishing layer arranged on a base material layer, wherein the polishing layer includes a thermosetting polyurethane foam having roughly spherical interconnected cells having an average cell diameter of 20 to 300 μm. The polyurethane foam includes an isocyanate component and an active hydrogen-containing compound as starting material components, and the active hydrogen-containing compound includes 30 to 85% by weight of a high-molecular-weight polyol having 2 to 4 functional groups and a hydroxyl value of 20 to 100 mg KOH/g.

    摘要翻译： 抛光层和基材层之间具有优异的耐久性和粘附性的抛光垫包括布置在基材层上的抛光层，其中抛光层包括热固性聚氨酯泡沫，其具有平均泡孔直径为20至 300个妈妈 聚氨酯泡沫包括异氰酸酯组分和含活性氢的化合物作为起始原料组分，并且含活性氢的化合物包括30至85重量％的具有2-4个官能团的高分子量多元醇和羟基 值为20〜100mg KOH / g。

    POLISHING PAD
    5.
    发明申请
    POLISHING PAD 有权
    抛光垫

    公开(公告)号：US20100317263A1

    公开(公告)日：2010-12-16

    申请号：US12864819

    申请日：2009-02-26

    申请人： Junji Hirose ,  Takeshi Fukuda

    发明人： Junji Hirose ,  Takeshi Fukuda

    IPC分类号： B24B1/00 ,  B24B7/20

    CPC分类号： B24B37/24 ,  C08G18/3206 ,  C08G18/4018 ,  C08G18/4277 ,  C08G18/4854 ,  C08G18/6607 ,  C08G18/6611 ,  C08G18/664 ,  C08G18/6644 ,  C08G18/6677 ,  C08G18/797 ,  C08G2101/00 ,  C08L83/00 ,  Y10T428/24273 ,  Y10T428/249975 ,  Y10T428/249978 ,  Y10T428/249979 ,  Y10T428/31551

    摘要： A method for manufacturing a polishing pad that has high level of optical detection accuracy and is prevented from causing slurry leak from between the polishing region and the light-transmitting region includes preparing a cell-dispersed urethane composition by a mechanical foaming method; placing a light-transmitting region at a predetermined position on a face material or a belt conveyor, continuously discharging the cell-dispersed urethane composition onto part of the face material or the belt conveyor where the light-transmitting region is not placed; placing another face material or belt conveyor on the discharged cell-dispersed urethane composition; curing the cell-dispersed urethane composition to form a polishing region including a polyurethane foam, so that a polishing sheet is prepared; applying a coating composition containing an aliphatic and/or alicyclic polyisocyanate to one side of the polishing sheet and curing the coating composition to form water-impermeable film; and cutting the polishing sheet.

    摘要翻译： 制造具有高水平的光学检测精度并且防止在抛光区域和透光区域之间引起浆料泄漏的抛光垫的方法包括通过机械发泡法制备细胞分散的聚氨酯组合物; 将光透射区域放置在面材或带式输送机上的预定位置处，将细胞分散的聚氨酯组合物连续排出到未放置透光区域的面材或带式输送机的一部分上; 将另一种面材或带式输送机放置在排出的细胞分散的聚氨酯组合物上; 固化细胞分散的聚氨酯组合物以形成包括聚氨酯泡沫的抛光区域，从而制备抛光片; 将包含脂族和/或脂环族多异氰酸酯的涂料组合物施加到抛光片的一侧并固化涂料组合物以形成不透水膜; 并切割抛光片。

    PROCESS FOR MANUFACTURING POLISHING PAD
    6.
    发明申请
    PROCESS FOR MANUFACTURING POLISHING PAD 有权
    制造抛光垫的工艺

    公开(公告)号：US20100162631A1

    公开(公告)日：2010-07-01

    申请号：US12601725

    申请日：2008-05-15

    申请人： Akinori Sato ,  Junji Hirose ,  Kenji Nakamura ,  Takeshi Fukuda ,  Masato Doura

    发明人： Akinori Sato ,  Junji Hirose ,  Kenji Nakamura ,  Takeshi Fukuda ,  Masato Doura

    IPC分类号： B24D3/32 ,  B24D11/00

    CPC分类号： B24D18/00 ,  B24B37/205 ,  Y10T428/24322 ,  Y10T428/24331 ,  Y10T428/24364

    摘要： A method for manufacturing a polishing pad that has a high level of optical detection accuracy and is prevented from causing slurry leak from between the polishing region and the light-transmitting region includes preparing a cell-dispersed urethane composition by a mechanical foaming method; placing a light-transmitting region at a predetermined position on a face material or a belt conveyor, continuously discharging the cell-dispersed urethane composition onto a part of the face material or the belt conveyor where the light-transmitting region is not placed; placing another face material or belt conveyor on the discharged cell-dispersed urethane composition; curing the cell-dispersed urethane composition to form a polishing region including a polyurethane foam, so that a polishing sheet is prepared; applying a coating composition containing an aliphatic and/or alicyclic polyisocyanate to one side of the polishing sheet and curing the coating composition to form a water-impermeable film; and cutting the polishing sheet.

    摘要翻译： 一种制造具有高水平的光学检测精度并且防止从抛光区域和透光区域之间的浆料泄漏的抛光垫的方法包括通过机械发泡法制备细胞分散的聚氨酯组合物; 在面材料或带式输送机上的预定位置放置透光区域，将细胞分散的聚氨酯组合物连续排出到未放置透光区域的面材或带式输送机的一部分上; 将另一种面材或带式输送机放置在排出的细胞分散的聚氨酯组合物上; 固化细胞分散的聚氨酯组合物以形成包括聚氨酯泡沫的抛光区域，从而制备抛光片; 将包含脂族和/或脂环族多异氰酸酯的涂料组合物施用到抛光片的一侧并固化涂料组合物以形成不透水膜; 并切割抛光片。

    POLISHING PAD
    7.
    发明申请
    POLISHING PAD 有权
    抛光垫

    公开(公告)号：US20090137188A1

    公开(公告)日：2009-05-28

    申请号：US12294391

    申请日：2007-05-15

    申请人： Takeshi Fukuda ,  Junji Hirose ,  Yoshiyuki Nakai ,  Tsuyoshi Kimura

    发明人： Takeshi Fukuda ,  Junji Hirose ,  Yoshiyuki Nakai ,  Tsuyoshi Kimura

    IPC分类号： B24B49/04 ,  B24B49/12 ,  B24D11/00

    CPC分类号： B24B37/205

    摘要： A polishing pad provides excellent optical detection accuracy properties over a broad wavelength range (particularly at the short-wavelength side). A method for manufacturing a semiconductor device includes a process of polishing the surface of a semiconductor wafer with this polishing pad. The polishing pad has a polishing layer containing a polishing region and a light-transmitting region, wherein the light-transmitting region includes a polyurethane resin having an aromatic ring density of 2 wt % or less, and the light transmittance of the light-transmitting region is 30% or more in the overall range of wavelengths of 300 to 400 nm.

    摘要翻译： 抛光垫在宽波长范围（特别是在短波长侧）提供优异的光学检测精度特性。 半导体器件的制造方法包括利用该研磨垫对半导体晶片的表面进行研磨的工序。 抛光垫具有包含抛光区域和透光区域的抛光层，其中透光区域包括芳族环密度为2重量％以下的聚氨酯树脂，透光区域的透光率 在波长为300〜400nm的整个范围内为30％以上。

    Method for Production of a Laminate Polishing Pad
    8.
    发明申请
    Method for Production of a Laminate Polishing Pad 有权
    层压抛光垫的生产方法

    公开(公告)号：US20080305720A1

    公开(公告)日：2008-12-11

    申请号：US12065253

    申请日：2006-08-25

    申请人： Junji Hirose ,  Masato Doura

    发明人： Junji Hirose ,  Masato Doura

    IPC分类号： B24B1/00 ,  B24D11/00

    CPC分类号： B24B37/20 ,  B24D18/00 ,  B29C44/321 ,  B29C44/326 ,  B29C44/332 ,  C08G18/12 ,  C08G18/4854 ,  C08G18/724 ,  C08G18/758 ,  C08G18/7621 ,  C08G2101/0025 ,  C08G18/3814

    摘要： Disclosed is a method for production of a laminate polishing pad which comprises a reduced number of steps and is excellent in productivity rate, and which causes no detachment between a polishing layer and a cushion layer and can prevent the groove clogging caused by a slurry or the like. Also disclosed is a laminate polishing pad produced by the method. A method for production of a laminate polishing pad, comprising the steps of: preparing a cell-dispersed urethane composition by a mechanical frothing process; ejecting the cell-dispersed urethane composition onto a cushion layer continuously while feeding the cushion layer; curing the cell-dispersed urethane composition while controlling the thickness of the composition evenly to form a polishing layer made of a polyurethane foam, thereby producing a long laminate sheet; and cutting the long laminate sheet.

    摘要翻译： 公开了一种生产层压抛光垫的方法，该方法包括步骤减少并且生产率优异，并且不会在抛光层和缓冲层之间发生分离，并且可以防止由浆料引起的槽堵塞或 喜欢。 还公开了通过该方法制造的层压抛光垫。 一种层压抛光垫的制造方法，包括以下步骤：通过机械起泡法制备细胞分散的聚氨酯组合物; 在缓冲层供给的同时连续地将细胞分散的氨基甲酸酯组合物喷射到缓冲层上; 固化细胞分散的聚氨酯组合物，同时均匀地控制组合物的厚度，以形成由聚氨酯泡沫制成的抛光层，从而生产长层压片; 并切割长层压板。