公开(公告)号：US20090242082A1

公开(公告)日：2009-10-01

申请号：US11887705

申请日：2006-04-05

申请人： Takeshi Imai ,  Shigekatsu Ozaki ,  Yuuji Hiramoto ,  Yuichi Sato ,  Hiroaki Sakamoto

发明人： Takeshi Imai ,  Shigekatsu Ozaki ,  Yuuji Hiramoto ,  Yuichi Sato ,  Hiroaki Sakamoto

IPC分类号： C22C45/02

CPC分类号： H01F1/15308 ,  C22C45/02

摘要： The present invention provides a Fe—B—Si system amorphous alloy thin strip excellent in high magnetic flux density, thermal stability, amorphous formability improved workability and low core loss. The present invention further provides a Fe—B—Si system amorphous alloy thin strip which has the reduced cost without using high purity iron resources such as an electrolytic iron as iron resources used in an amorphous alloy thin strip, and also has core loss less than 0.10 W/kg at W13/50 in soft magnetic property in alternating-current field. The Fe—B—Si system amorphous alloy thin strip according to the present invention contains an appropriate amounts of N, C, P to improve thermal stability, amorphous formability, workability (brittleness), and core loss without deteriolating magnetic flux density, and contains, in atomic %, B: 5-25%, Si: 1-30%, N: 0.001-0.2%, C: 0.003-10%, P: 0.001-0.2% and the balance being Fe and unavoidable impurities, and optionally contains Co or Ni substituted to less than 15% of the Fe amount, or Cr at less than 5% substituted to the Fe amount. Further, Mn: 0.15-0.5 mass %, S: 0.004-0.05 mass % can be included.

摘要翻译： 本发明提供了高磁通密度，热稳定性，非晶态成形性提高加工性和低铁损的Fe-B-Si系非晶态合金薄带。 本发明还提供了一种Fe-B-Si系非晶合金薄带，其在不使用高纯度铁资源的情况下降低了成本，例如在非晶合金薄带中使用的电解铁作为铁资源，并且还具有小于 W13 / 50，交流电场软磁特性为0.10 W / kg。 根据本发明的Fe-B-Si系非晶态合金薄带含有适量的N，C，P以提高热稳定性，非晶形成性，可加工性（脆性）和铁芯损耗，而不影响磁通密度，并含有 ，原子％，B：5-25％，Si：1-30％，N：0.001-0.2％，C：0.003-10％，P：0.001-0.2％，余量为Fe和不可避免的杂质， 含有少于Fe量的15％以下的Co或Ni，或者小于5％的Fe代替Fe量。 另外，Mn：0.15〜0.5质量％，S：0.004〜0.05质量％。

公开(公告)号：US07744703B2

公开(公告)日：2010-06-29

申请号：US11887705

申请日：2006-04-05

申请人： Takeshi Imai ,  Shigekatsu Ozaki ,  Yuuji Hiramoto ,  Yuichi Sato ,  Hiroaki Sakamoto

发明人： Takeshi Imai ,  Shigekatsu Ozaki ,  Yuuji Hiramoto ,  Yuichi Sato ,  Hiroaki Sakamoto

IPC分类号： C22C45/02

CPC分类号： H01F1/15308 ,  C22C45/02

摘要： The present invention provides a Fe—B—Si system amorphous alloy thin strip excellent in high magnetic flux density, thermal stability, amorphous formability improved workability and low core loss. The present invention further provides a Fe—B—Si system amorphous alloy thin strip which has the reduced cost without using high purity iron resources such as an electrolytic iron as iron resources used in an amorphous alloy thin strip, and also has core loss less than 0.10 W/kg at W13/50 in soft magnetic property in alternating-current field. The Fe—B—Si system amorphous alloy thin strip according to the present invention contains an appropriate amounts of N, C, P to improve thermal stability, amorphous formability, workability (brittleness), and core loss without deteriolating magnetic flux density, and contains, in atomic %, B: 5-25%, Si: 1-30%, N: 0.001-0.2%, C: 0.003-10%, P: 0.001-0.2% and the balance being Fe and unavoidable impurities, and optionally contains Co or Ni substituted to less than 15% of the Fe amount, or Cr at less than 5% substituted to the Fe amount. Further, Mn: 0.15-0.5 mass %, S: 0.004-0.05 mass % can be included.

摘要翻译： 本发明提供了高磁通密度，热稳定性，非晶态成形性提高加工性和低铁损的Fe-B-Si系非晶态合金薄带。 本发明还提供了一种Fe-B-Si系非晶合金薄带，其在不使用高纯度铁资源的情况下降低了成本，例如在非晶合金薄带中使用的电解铁作为铁资源，并且还具有小于 W13 / 50，交流电场软磁特性为0.10 W / kg。 根据本发明的Fe-B-Si系非晶态合金薄带含有适量的N，C，P以提高热稳定性，非晶形成性，可加工性（脆性）和铁芯损耗，而不影响磁通密度，并含有 ，原子％，B：5-25％，Si：1-30％，N：0.001-0.2％，C：0.003-10％，P：0.001-0.2％，余量为Fe和不可避免的杂质， 含有少于Fe量的15％以下的Co或Ni，或者小于5％的Fe代替Fe量。 另外，Mn：0.15〜0.5质量％，S：0.004〜0.05质量％。