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1.发明申请Photomask substrate, photomask substrate forming member, photomask substrate fabrication method, photomask, and exposing method that uses the photomask 有权光掩模基板，光掩模基板形成部件，光掩模基板的制造方法，光掩模和使用光掩模的曝光方法公开(公告)号：US20100062350A1
公开(公告)日：2010-03-11
申请号：US12591121
申请日：2009-11-09
申请人： Tetsuya Abe , Yuhei Nitta , Yukiyasu Kimura
发明人： Tetsuya Abe , Yuhei Nitta , Yukiyasu Kimura
IPC分类号： G03F1/00
CPC分类号： G03F7/70783 , C03B23/0252 , G03F1/60 , Y02P40/57
摘要： A photomask substrate with a substantially uniform thickness comprises: a first surface, which is a continuous curved surface whereon a mask pattern is to be formed; and a second surface. The first surface exhibits a square shape that comprises an opposing pair of first set sides and an opposing pair of second set sides and has support parts at end parts along the first set sides. When the photomask substrate is held such that the first surface is in a substantially vertical state, a reference plane that is parallel to a tangential plane of the first surface at the center point of the first surface is defined on the photomask substrate side that is closer to the first surface than to the second surface. At this time, a first distance in the thickness direction between the reference plane and the center point of the first surface is shorter than second distances in the thickness direction between the reference plane and the midpoints of the second set sides.
摘要翻译： 具有基本均匀厚度的光掩模基板包括：第一表面，其是要形成掩模图案的连续弯曲表面; 和第二表面。 第一表面呈现正方形，其包括相对的一对第一组侧面和相对的第二组侧面，并且在沿着第一组侧面的端部处具有支撑部分。 当光掩模基板被保持使得第一表面处于基本垂直状态时，在第一表面的中心点处的平行于第一表面的切向平面的参考平面被限定在更接近的光掩模基板侧 到第一表面而不是第二表面。 此时，基准面和第一面的中心点之间的厚度方向上的第一距离比基准面与第二侧面的中点之间的厚度方向上的第二距离短。
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2.发明授权Photomask substrate, photomask substrate forming member, photomask substrate fabricating method, photomask, and exposing method that uses the photomask 有权光掩模基板，光掩模基板形成部件，光掩模基板的制造方法，光掩模和使用光掩模的曝光方法公开(公告)号：US08153336B2
公开(公告)日：2012-04-10
申请号：US12591121
申请日：2009-11-09
申请人： Tetsuya Abe , Yuhei Nitta , Yukiyasu Kimura
发明人： Tetsuya Abe , Yuhei Nitta , Yukiyasu Kimura
IPC分类号： G03F1/00
CPC分类号： G03F7/70783 , C03B23/0252 , G03F1/60 , Y02P40/57
摘要： A photomask substrate with a substantially uniform thickness comprises: a first surface, which is a continuous curved surface whereon a mask pattern is to be formed; and a second surface. The first surface exhibits a square shape that comprises an opposing pair of first set sides and an opposing pair of second set sides and has support parts at end parts along the first set sides. When the photomask substrate is held such that the first surface is in a substantially vertical state, a reference plane that is parallel to a tangential plane of the first surface at the center point of the first surface is defined on the photomask substrate side that is closer to the first surface than to the second surface. At this time, a first distance in the thickness direction between the reference plane and the center point of the first surface is shorter than second distances in the thickness direction between the reference plane and the midpoints of the second set sides.
摘要翻译： 具有基本均匀厚度的光掩模基板包括：第一表面，其是要形成掩模图案的连续弯曲表面; 和第二表面。 第一表面呈现正方形，其包括相对的一对第一组侧面和相对的第二组侧面，并且在沿着第一组侧面的端部处具有支撑部分。 当光掩模基板被保持使得第一表面处于基本垂直状态时，在第一表面的中心点处的平行于第一表面的切向平面的参考平面被限定在更接近的光掩模基板侧 到第一表面而不是第二表面。 此时，基准面和第一面的中心点之间的厚度方向上的第一距离比基准面与第二侧面的中点之间的厚度方向上的第二距离短。
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公开(公告)号：US08245538B2
公开(公告)日：2012-08-21
申请号：US12461505
申请日：2009-08-13
申请人： Yukiyasu Kimura , Yuhei Nitta
发明人： Yukiyasu Kimura , Yuhei Nitta
CPC分类号： C03B17/064 , C03B17/065 , C03B17/068
摘要： A method for manufacturing a glass substrate by a fusion process includes flowing fused glass into a fusion pipe, and gradually cooling and solidifying the fused glass by allowing the glass to flow downward from the fusion pipe. An asperity is formed on a surface of the glass substrate by fastening and pressing the glass toward a direction of thickness of the glass with a pair of transfer rollers while the glass is flowing down from the fusion pipe.
摘要翻译： 通过熔融法制造玻璃基板的方法包括将熔融玻璃流入熔融管，并且通过允许玻璃从熔融管向下流动来逐渐冷却和固化熔融玻璃。 在玻璃从熔融管向下流动的同时，通过用一对转印辊将玻璃朝向玻璃的厚度方向进行紧固和压制，在玻璃基板的表面上形成凹凸。
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公开(公告)号：US20090305020A1
公开(公告)日：2009-12-10
申请号：US12461505
申请日：2009-08-13
申请人： Yukiyasu Kimura , Yuhei Nitta
发明人： Yukiyasu Kimura , Yuhei Nitta
CPC分类号： C03B17/064 , C03B17/065 , C03B17/068
摘要： A method for manufacturing a glass substrate by a fusion process includes flowing fused glass into a fusion pipe, and gradually cooling and solidifying the fused glass by allowing the glass to flow downward from the fusion pipe. An asperity is formed on a surface of the glass substrate by fastening and pressing the glass toward a direction of thickness of the glass with a pair of transfer rollers while the glass is flowing down from the fusion pipe.
摘要翻译： 通过熔融法制造玻璃基板的方法包括将熔融玻璃流入熔融管，并且通过允许玻璃从熔融管向下流动来逐渐冷却和固化熔融玻璃。 在玻璃从熔融管向下流动的同时，通过用一对转印辊将玻璃朝向玻璃的厚度方向进行紧固和压制，在玻璃基板的表面上形成凹凸。
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公开(公告)号：US20070116913A1
公开(公告)日：2007-05-24
申请号：US11598803
申请日：2006-11-14
申请人： Yukiyasu Kimura , Yuhei Nitta
发明人： Yukiyasu Kimura , Yuhei Nitta
CPC分类号： C03B17/064 , C03B17/065 , C03B17/068
摘要： A method for manufacturing a glass substrate by fusion process comprising the following steps; flowing fused glass into a fusion pipe, and gradually cooling and solidifying the fused glass by flowing downward from the fusion pipe, wherein forming an asperity on a surface of the glass substrate by fastening and pressing the glass toward a direction of thickness of the glass with a pair of transfer rollers during the glass is flowing down from the fusion pipe.
摘要翻译： 一种通过熔融法制造玻璃基板的方法，包括以下步骤： 将熔融玻璃流入熔融管中，并从融合管向下流动使熔融玻璃逐渐冷却和固化，其中通过将玻璃朝向玻璃的厚度方向紧固并按压而在玻璃基板的表面上形成凹凸， 玻璃中的一对转印辊从熔融管向下流动。
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