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公开(公告)号:US20170199512A1
公开(公告)日:2017-07-13
申请号:US15469132
申请日:2017-03-24
IPC分类号: G05B19/4093
CPC分类号: G05B19/40937 , A61F2/30771 , A61F2002/3097 , G05B15/02 , G05B2219/36032 , G05B2219/37415
摘要: A system includes a computing device that generates at least one process script for the modification to a material substrate and at least one pattern script that corresponds to the process script. The computing device also merges the process script with the pattern script and generates a plurality of command signals that are based on the merged process and pattern scripts. An energy source generates a plurality of light beams based on the generated command signal(s). At least one modulating component modulates the generated light beams based on generated command signal(s). A waveform apparatus generates at least one waveform signal to customize the generated light beams based on the generated command signal(s). A motion control apparatus controls at least one parameter of the light beams based on the generated command signal(s).
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公开(公告)号:US20210348130A1
公开(公告)日:2021-11-11
申请号:US16869208
申请日:2020-05-07
IPC分类号: C12N5/0775 , B23K26/0622
摘要: A method of stimulating and controlling stem cell activity and differentiation on a modified material substrate and a device including the modified material substrate are provided. The method includes providing a material substrate configured for medical use. The material substrate includes at least one surface or interior area available for modification, and the at least one surface or interior area is treated with a plurality of pulsed light beams to obtain a modified material substrate with at least one modified surface or interior area. The at least one modified surface or interior area has a biomimetic architecture with surface and bulk (interior) features, properties, and textures configured to accelerate and control stem cell differentiation when the modified material substrate is contacted with stem cells.
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公开(公告)号:US20200179119A1
公开(公告)日:2020-06-11
申请号:US16212638
申请日:2018-12-06
摘要: A multi-layer substrate apparatus includes a first layer configured to provide at least one electrical-based property. A second layer proximate to the first layer is configured to provide at least one mechanical-based property. A third proximate to the second layer includes at least one chemical component such that the third layer is enabled to regulate the multi-layer substrate apparatus based on a system that the multi-layer substrate apparatus is being used with. A fourth layer proximate to the third layer is configured to provide at least one magnetic-based property. A fifth layer proximate to the fourth layer is configured to provide support based on the system that the multi-layer substrate apparatus is being used with. The fifth layer includes a geometric portion that is configured to facilitate at least one process therein.
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