公开(公告)号：US20030018153A1

公开(公告)日：2003-01-23

申请号：US10224994

申请日：2002-08-21

申请人： The B.F.Goodrich Company

发明人： Saikumar Jayaraman ,  George Martin Benedikt ,  Larry Funderburk Rhodes ,  Richard Vicari ,  Robert David Allen ,  Richard Anthony DiPetro ,  Ratnam Sooriyakumaran ,  Thomas Wallow

IPC分类号： C08F010/00

CPC分类号： G03F7/039 ,  C08G61/02 ,  C08G61/08 ,  G03F7/0045 ,  G03F7/0395 ,  G03F7/0397

摘要： The present invention relates to cyclic polymers and their use in photolithographic applications. The cyclic polymers contain a pendant acid labile functional group and a functional group containing a protected hydroxyl moiety. The polymers are post modified by deprotecting the pendant hydroxyl moiety and reacting the deprotected hydroxyl containing moiety with a coreactant. The post-functionalized polymers find application in chemically amplified photoresist compositions.