Scanning probe microscopy-based metrology tool with a vacuum partition
    1.
    发明申请
    Scanning probe microscopy-based metrology tool with a vacuum partition 审中-公开
    用真空分隔扫描探针显微镜计量工具

    公开(公告)号:US20130097740A1

    公开(公告)日:2013-04-18

    申请号:US13705701

    申请日:2012-12-05

    IPC分类号: G01Q60/10

    摘要: A method of monitoring of semiconductor processes is provided that includes monitoring the processes using a scanning probe microscope (SPM), where a first partition is located below a second partition, where the second partition is hermetically isolated from the first partition, where a SPM probe tip of the SPM is disposed in the first partition, where a remaining portion of the SPM is disposed in the second partition that is hermetically isolated from the first partition, and where the semiconductor processes may occur in either the first partition or a third partition.

    摘要翻译: 提供了一种监测半导体工艺的方法,其包括使用扫描探针显微镜(SPM)来监测过程,其中第一分区位于第二分区下方,其中第二分区与第一分区气密隔离,其中SPM探针 SPM的尖端设置在第一分区中,其中SPM的剩余部分设置在与第一分区气密隔离的第二分区中,并且半导体处理可以在第一分区或第三分区中发生。