公开(公告)号：US10071399B2

公开(公告)日：2018-09-11

申请号：US14876700

申请日：2015-10-06

申请人： THE CLOROX COMPANY

发明人： Kristina Perlas ,  Jared Heymann ,  Steven J. Tomkins ,  Rashda Khan ,  Aidee Duarte ,  Kerry D. Azelton ,  Abhishek Shetty ,  Arun Agarwal ,  Sacha Connor ,  Miranda Helmer ,  Selina Wang ,  Hyunjoo Lee ,  Courtney Lytle ,  John Jamieson ,  Janiece Hope

IPC分类号： B43K5/02 ,  B08B3/10 ,  A47L13/17 ,  C11D17/04

CPC分类号： B08B3/10 ,  A47L13/17 ,  C11D17/041 ,  C11D17/049

摘要： An all-in-one cleaning device, e.g., such as may be used in cleaning the inside of a shower. The device may provide the ability to dispense the composition carried within the device itself, and scrub the composition into or against the surfaces to be cleaned (e.g., shower walls, floors, corners, etc.). Activation of the dispensing mechanism of the cleaning device may dispense a metered dose of composition, in a generally horizontal direction, onto and/or into a nonwoven or other substrate. The dispensing mechanism may not rely on gravity for dispensing, and may be sealed to prevent unwanted backflow of shower water or other material, preventing contamination.

公开(公告)号：US09487742B2

公开(公告)日：2016-11-08

申请号：US13950140

申请日：2013-07-24

申请人： The Clorox Company

发明人： Rashda Khan ,  Daniela Fritter ,  Lorinda Alcantara ,  Wenyu Zhang ,  Miranda Helmer

IPC分类号： C11D1/75 ,  C11D3/04 ,  C11D3/395 ,  C11D17/00 ,  C11D3/30 ,  C11D3/20

CPC分类号： C11D17/0026 ,  C11D1/75 ,  C11D3/044 ,  C11D3/2079 ,  C11D3/30 ,  C11D3/3951 ,  C11D3/3953 ,  C11D3/3956

摘要： The invention relates to drain cleaning compositions including relatively high concentrations of a hypochlorite oxidizing agent and a hydroxide (e.g., 4 to 12% and 2.5 to 10%, respectively. The composition further includes a surfactant (e.g., a surfactant blend, water, and exhibits a very high pH (e.g., at least 13). The composition is monophasic, even at high oxidizing and hydroxide concentrations. The surfactant may include a blend of an uncharged surfactant (e.g., an amphoteric surfactant or nonionic surfactant) and a charged surfactant (e.g., anionic, cationic, or a surfactant that becomes so under the high pH conditions of the composition). The ratio of charged to uncharged surfactant may be at least 1:10, e.g., from 1:10 to about 1:50.

摘要翻译： 本发明涉及排水清洗组合物，其包括相对高浓度的次氯酸盐氧化剂和氢氧化物（例如，分别为4至12％和2.5至10％。该组合物还包括表面活性剂（例如表面活性剂共混物，水和 表现出非常高的pH（例如至少13），甚至在高氧化性和氢氧化物浓度下，组合物是单相的，表面活性剂可以包括不带电表面活性剂（例如两性表面活性剂或非离子表面活性剂）和带电表面活性剂 （例如，在组合物的高pH条件下变成阴离子，阳离子或表面活性剂）。带电量与不带电表面活性剂的比例可以至少为1:10，例如从1:10至约1:50。

公开(公告)号：US20180354002A1

公开(公告)日：2018-12-13

申请号：US16108415

申请日：2018-08-22

申请人： THE CLOROX COMPANY

发明人： Kristina Perlas ,  Jared Heymann ,  Steven J. Tomkins ,  Rashda Khan ,  Aidee Duarte ,  Kerry D. Azelton ,  Abhishek Shetty ,  Arun Agarwal ,  Sacha Connor ,  Miranda Helmer ,  Selina Wang ,  HyunJoo Lee ,  Courtney Lytle ,  John Jamieson ,  Janiece Hope

IPC分类号： B08B3/10 ,  A47L13/17 ,  C11D17/04

CPC分类号： B08B3/10 ,  A47L13/17 ,  C11D17/041 ,  C11D17/049

摘要： An all-in-one cleaning device, e.g., such as may be used in cleaning the inside of a shower. The device may provide the ability to dispense the composition carried within the device itself, and scrub the composition into or against the surfaces to be cleaned (e.g., shower walls, floors, corners, etc.). Activation of the dispensing mechanism of the cleaning device may dispense a metered dose of composition, in a generally horizontal direction, onto and/or into a nonwoven or other substrate. The dispensing mechanism may not rely on gravity for dispensing, and may be sealed to prevent unwanted backflow of shower water or other material, preventing contamination.

公开(公告)号：US20160096204A1

公开(公告)日：2016-04-07

申请号：US14876700

申请日：2015-10-06

申请人： THE CLOROX COMPANY

发明人： Kristina Perlas ,  Jared Heymann ,  Steven J. Tomkins ,  Rashda Khan ,  Aidee Duarte ,  Kerry D. Azelton ,  Abhishek Shetty ,  Arun Agarwal ,  Sacha Connor ,  Miranda Helmer ,  Selina Wang ,  Hyunjoo Lee ,  Courtney Lytle ,  John Jamieson ,  Janiece Hope

IPC分类号： B08B3/10 ,  B08B1/00

CPC分类号： B08B3/10 ,  A47L13/17 ,  C11D17/041 ,  C11D17/049

摘要： An all-in-one cleaning device, e.g., such as may be used in cleaning the inside of a shower. The device may provide the ability to dispense the composition carried within the device itself, and scrub the composition into or against the surfaces to be cleaned (e.g., shower walls, floors, corners, etc.). Activation of the dispensing mechanism of the cleaning device may dispense a metered dose of composition, in a generally horizontal direction, onto and/or into a nonwoven or other substrate. The dispensing mechanism may not rely on gravity for dispensing, and may be sealed to prevent unwanted backflow of shower water or other material, preventing contamination.

摘要翻译： 一体式清洁装置，例如可用于清洁淋浴器的内部。 该装置可以提供分配装置本身携带的组合物的能力，并且将组合物洗涤或抵靠待清洁的表面（例如，淋浴壁，地板，角落等）。 清洁装置的分配机构的激活可以在大致水平的方向上将计量剂量的组合物分配到非织造材料或其它基材上和/或其上。 分配机构可能不依赖于重力用于分配，并且可以被密封以防止淋浴水或其它材料的不期望的回流，从而防止污染。

公开(公告)号：US10576509B2

公开(公告)日：2020-03-03

申请号：US16108415

申请日：2018-08-22

申请人： THE CLOROX COMPANY

发明人： Kristina Perlas ,  Jared Heymann ,  Steven J. Tomkins ,  Rashda Khan ,  Aidee Duarte ,  Kerry D. Azelton ,  Abhishek Shetty ,  Arun Agarwal ,  Sacha Connor ,  Miranda Helmer ,  Selina Wang ,  HyunJoo Lee ,  Courtney Lytle ,  John Jamieson ,  Janiece Hope

IPC分类号： B43K5/02 ,  B08B3/10 ,  A47L13/17 ,  C11D17/04

摘要： An all-in-one cleaning device, e.g., such as may be used in cleaning the inside of a shower. The device may provide the ability to dispense the composition carried within the device itself, and scrub the composition into or against the surfaces to be cleaned (e.g., shower walls, floors, corners, etc.). Activation of the dispensing mechanism of the cleaning device may dispense a metered dose of composition, in a generally horizontal direction, onto and/or into a nonwoven or other substrate. The dispensing mechanism may not rely on gravity for dispensing, and may be sealed to prevent unwanted backflow of shower water or other material, preventing contamination.

公开(公告)号：US10208273B2

公开(公告)日：2019-02-19

申请号：US15289490

申请日：2016-10-10

申请人： THE CLOROX COMPANY

发明人： Rashda Khan ,  Daniela Fritter ,  Lorinda Alcantara ,  Wenyu Zhang ,  Miranda Helmer

IPC分类号： C11D1/14 ,  C11D1/22 ,  C11D1/75 ,  C11D3/395 ,  C11D3/30 ,  C11D3/20 ,  C11D3/04 ,  C11D1/83 ,  C11D10/04 ,  C11D1/29

摘要： The invention relates to drain cleaning compositions including relatively high concentrations of a hypochlorite oxidizing agent and a hydroxide (e.g., 4 to 12% and 2.5 to 10%, respectively. The composition further includes a surfactant (e.g., a surfactant blend, water, and exhibits a very high pH (e.g., at least 13). The composition is monophasic, even at high oxidizing and hydroxide concentrations. The surfactant may include a blend of an uncharged surfactant (e.g., an amphoteric surfactant or nonionic surfactant) and a charged surfactant (e.g., anionic, cationic, or a surfactant that becomes so under the high pH conditions of the composition). The ratio of charged to uncharged surfactant may be at least 1:10, e.g., from 1:10 to about 1:50.