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公开(公告)号：US20240344001A1
公开(公告)日：2024-10-17
申请号：US18617223
申请日：2024-03-26
Applicant: Henkel AG & Co. KGaA
Inventor： Daniel Thomas Piorkowski , Peter Schmiedel
CPC classification number: C11D17/042 , C11D1/29 , C11D1/722 , C11D3/044 , C11D3/30 , C11D3/33 , C11D3/42 , C11D3/43 , C11D2111/12
Abstract: The present disclosure provides a unit dose product comprising a pouch formed from a water-soluble film material; and a detergent composition comprising about 5 to about 20 wt % water, about 35 to about 65 wt % of at least one surfactant, at least one amino acid or a salt thereof, a base, and a non-aqueous solvent, wherein the detergent composition is disposed within the pouch. The composition can further comprise additional components, such as an anti-redeposition agent, an enzyme, a bleaching agent, a bleach activator, a chelating agent, an additional chlorine scavenger, a biocide, an optical brightener, a bitterant, a corrosion inhibitor, or a combination thereof. The detergent composition in the unit dose product can scavenge chlorine to a concentration of 0 ppm in less than about 60 sec after contact with a 1 L water sample comprising up to 4 ppm chlorine.
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公开(公告)号：US20240337948A1
公开(公告)日：2024-10-10
申请号：US18744751
申请日：2024-06-17
Applicant: Samsung Electronics Co., Ltd.
Inventor： HYOJIN YUN , SEUNGWON KIM , TAEYOUNG KIM , WOOJUNG PARK , JINHYE BAE , HYUNSEOP SHIN , MINTAE LEE , HOON HAN , MOONYOUNG KIM , MOONCHANG KIM , CHEOLMO YANG , YUNSEOK CHOI
CPC classification number: G03F7/425 , B08B3/04 , C11D3/044 , H01L21/0206
Abstract: A photoresist-removing composition includes a polar organic solvent, an alkyl ammonium hydroxide, an aliphatic amine not including a hydroxy group, and a monovalent alcohol. To manufacture a semiconductor device, a photoresist pattern may be formed on a substrate, and the photoresist-removing composition may then be applied to the photoresist pattern. To manufacture a semiconductor package, a photoresist pattern including a plurality of via holes may be formed on a substrate. A plurality of conductive posts including a metal may be formed inside the plurality of via holes, and the photoresist pattern may be removed by applying a photoresist-removing composition of the inventive concept to the photoresist pattern. A semiconductor chip may be adhered to the substrate between the respective conductive posts.
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公开(公告)号：US12110477B2
公开(公告)日：2024-10-08
申请号：US17278013
申请日：2019-09-20
Applicant: MIX 14 LTD.
Inventor： Gary Townley
IPC: C11D1/00 , C11D1/72 , C11D3/04 , C11D3/18 , C11D3/20 , C11D3/26 , C11D3/30 , C11D3/382 , C11D3/43 , C11D3/50 , C11D17/04
CPC classification number: C11D3/044 , C11D1/721 , C11D3/185 , C11D3/2079 , C11D3/30 , C11D3/382 , C11D3/43 , C11D17/046 , C11D2111/12
Abstract: A water-based stain removal formulation, comprising: a lye solution comprising an inorganic hydroxide base; an oil mixture comprising one or more surfactants, an orange extract and an organic base; and an acid mixture comprising acetic acid and a thickener. Methods of manufacture of a water-based stain removal formulation, use of a water-based stain removal formulation, and an applicator for a water-based stain removal formulation are also described.
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公开(公告)号：US12102095B2
公开(公告)日：2024-10-01
申请号：US18308295
申请日：2023-04-27
Inventor： Majher I. Sarker , Wilbert Long, III , Cheng Kung Liu
CPC classification number: A22B5/0082 , A01N43/66 , C11D1/04 , C11D3/044 , C11D3/323 , C11D3/48 , C11D2111/10
Abstract: Compositions and methods for cleaning and decontaminating animal carcasses are disclosed. The compositions comprise a mud ball remover having a thioglycolate salt and a base and an antimicrobial agent effective to remove mud balls and reduce microbial contamination of a hide surface at ambient temperatures. The methods comprise cleaning and decontaminating an animal carcass by applying the disclosed compositions onto the surface of the animal carcass to soften and loosen foreign debris attached to the carcass followed by mechanically removing the foreign debris while preserving the integrity and quality of the hide byproduct and resulting leather articles.
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公开(公告)号：US20240309576A1
公开(公告)日：2024-09-19
申请号：US18677435
申请日：2024-05-29
Applicant: Omni Solutions LLC
Inventor： Andrew Rupnow
CPC classification number: D06F35/001 , C11D3/04 , C11D3/044 , C11D17/00 , D06F39/022 , C11D2111/12 , D06F33/37 , D06F2103/22
Abstract: An ozone and/or hydroxyl laundry system that injects ozone and/or hydroxyls into the chemical injection system in order to allow the system to inject ozone and/or hydroxyls as other cleaning chemicals are injected into the washer. This allows ozone and/or hydroxyls to be injected through the wash cycle rather than just during the initial fill phase and additional avoids the expense and maintenance of adding ozone and/or hydroxyls recirculation plumping to an ozone and/or hydroxyls laundry system. Accordingly, ozone and/or hydroxyl levels may be maintained at superior levels throughout the wash cycle.
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Patent Agency Ranking
公开(公告)号：US11992574B2
公开(公告)日：2024-05-28
申请号：US17380468
申请日：2021-07-20
Applicant: Kinnos Inc.
Inventor： Jason Kang , Kevin Tyan , Katherine Jin
IPC: A61L2/28 , A01N25/00 , A01N33/12 , A01N37/16 , A01N59/00 , A61L2/22 , C11D1/12 , C11D1/62 , C11D3/04 , C11D3/24 , C11D3/34 , C11D3/39 , C11D3/395 , C11D3/40 , C11D3/48 , C11D17/00 , C11D17/04
CPC classification number: A61L2/28 , A01N25/00 , A01N33/12 , A01N37/16 , A01N59/00 , A61L2/22 , C11D1/12 , C11D1/62 , C11D3/044 , C11D3/24 , C11D3/3418 , C11D3/3947 , C11D3/3951 , C11D3/3956 , C11D3/40 , C11D3/48 , C11D17/0043 , C11D17/045 , C11D2111/44
Abstract: The invention provides to a powdered composition of additives and a method of use thereof for increasing the visibility, potency and coverage of disinfectant solutions, such as bleach.
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公开(公告)号：US20240132805A1
公开(公告)日：2024-04-25
申请号：US18278877
申请日：2022-03-04
Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
Inventor： Hiroaki TAKAKUWA , Akinobu HORITA , Takahiro KIKUNAGA
CPC classification number: C11D3/28 , C11D3/0073 , C11D3/044 , C11D3/2065 , C11D3/30 , C11D3/43 , C11D2111/22
Abstract: A cleaning composition for semiconductor substrates, containing an alkaline compound (A), a corrosion inhibitor (B), and water, wherein the alkaline compound (A) is at least one selected from the group consisting of a quaternary ammonium hydroxide (A1) and potassium hydroxide (A2), and the corrosion inhibitor (B) is at least one selected from the group consisting of 4-substituted pyrazoles, potassium tris(1-pyrazolyl)borohydride, 2-(4-thiazolyl)benzimidazole, and halogenated-8-hydroxyquinolines.
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公开(公告)号：US20240124798A1
公开(公告)日：2024-04-18
申请号：US17968122
申请日：2022-10-18
Applicant: Beaumont Products, Inc.
Inventor： Jeffrey M. Picken
CPC classification number: C11D1/662 , A23L5/57 , C11D3/0084 , C11D3/044 , C11D3/2065 , C11D3/2079 , C11D3/382 , C11D11/0011 , C11D17/0043 , A23V2002/00
Abstract: The disclosure relates to produce wash products including a dispenser with a liquid retaining container and a foam dispenser head and a liquid produce wash present in the liquid retaining container, wherein the foam dispenser head is fluidly connected to the liquid produce wash, and wherein the liquid produce wash includes a natural oil or a component thereof, a fatty acid, an antioxidant, a surfactant, an alkali metal hydroxide, glycerin, water, and, optionally, a preservative. In some aspects, the foam dispenser head includes an air chamber and a liquid chamber fluidly connected to the liquid retaining container; when the foam dispenser head is activated by pumping or another means, air and the liquid produce wash are dispensed simultaneously as a foam. Also disclosed are methods of dispensing a produce wash, methods of using the disclosed produce washes to wash a piece of firm produce, and liquid produce washes.
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9.发明公开公开(公告)号：US20240101928A1
公开(公告)日：2024-03-28
申请号：US18532494
申请日：2023-12-07
Applicant: ECOLAB USA INC.
Inventor： Stephan M. Hubig , Susan Maloney Viall
IPC: C11D1/75 , C11D1/72 , C11D1/722 , C11D3/04 , C11D3/33 , C11D3/36 , C11D3/37 , C11D3/39 , C11D11/00 , C11D17/04
CPC classification number: C11D1/75 , C11D1/72 , C11D1/722 , C11D3/044 , C11D3/33 , C11D3/361 , C11D3/3757 , C11D3/3765 , C11D3/3902 , C11D11/0029 , C11D11/0041 , C11D17/043 , C11D17/044 , C11D17/045
Abstract: Cleaning systems employing detergent compositions in combination with builders comprising alkalinity and chelants are provided. The detergent compositions include amine oxide surfactant and alcohol ethoxylate surfactant blends having a mixture of chain lengths and branching provided. The detergent compositions are particularly efficacious for flexible cleaning systems for cosmetic and other soils as they provide the benefit of separate dosing of surfactants in the detergent from alkalinity sources in a builder composition. Methods of using the detergent compositions and/or the cleaning systems are provided.
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公开(公告)号：US20240060003A1
公开(公告)日：2024-02-22
申请号：US18366715
申请日：2023-08-08
Applicant: The Procter & Gamble Company
Inventor： Matthew Lawrence Lynch , Brandon Philip Illie , Kristin Rhedrick Williams , Jocelyn Michelle McCullough , Pierre Daniel Verstraete , Andre Martim Barros , Mariana B. T. Cardoso , Johan SMETS , Vighter Iberi , Karen Diana Hufford
CPC classification number: C11D1/04 , C11D3/044 , C11D3/2068 , C11D3/505 , C11D11/0017
Abstract: A low-water composition comprising a solid dissolvable composition domain having a crystallizing agent and a PEGC domain.
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