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公开(公告)号:US12211955B2
公开(公告)日:2025-01-28
申请号:US17576716
申请日:2022-01-14
Applicant: The Regents of the University of California
Inventor: Kamruzzaman Khan , Elaheh Ahmadi , Stacia Keller , Christian Wurm , Umesh K. Mishra
Abstract: A substrate comprising a III-N base layer comprising a first portion and a second portion, the first portion of the III-N base layer having a first natural lattice constant and a first dislocation density; and a first III-N layer having a second natural lattice constant and a second dislocation density on the III-N base layer, the first III-N layer having a thickness greater than 10 nm. An indium fractional composition of the first III-N layer is greater than 0.1; the second natural lattice constant is at least 1% greater than the first natural lattice constant; a strain-induced lattice constant of the first III-N layer is greater than 1.0055 times the first natural lattice constant; and the second dislocation density is less than 1.5 times the first dislocation density.
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公开(公告)号:US20220399475A1
公开(公告)日:2022-12-15
申请号:US17576716
申请日:2022-01-14
Applicant: The Regents of the University of California
Inventor: Kamruzzaman Khan , Elaheh Ahmadi , Stacia Keller , Christian Wurm , Umesh K. Mishra
Abstract: A substrate comprising a III-N base layer comprising a first portion and a second portion, the first portion of the III-N base layer having a first natural lattice constant and a first dislocation density; and a first III-N layer having a second natural lattice constant and a second dislocation density on the III-N base layer, the first III-N layer having a thickness greater than 10 nm. An indium fractional composition of the first III-N layer is greater than 0.1; the second natural lattice constant is at least 1% greater than the first natural lattice constant; a strain-induced lattice constant of the first III-N layer is greater than 1.0055 times the first natural lattice constant; and the second dislocation density is less than 1.5 times the first dislocation density.
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