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1.发明授权Fabricating optical elements using a photoresist formed from contact printing of a gray level mask 失效使用由灰度级掩模的接触印刷形成的光致抗蚀剂制造光学元件
公开(公告)号：US6071652A
公开(公告)日：2000-06-06
申请号：US44864
申请日：1998-03-20
CPC分类号： G02B3/0012 , G03F1/50 , G02B3/0056
摘要： Gray scale masks used to create optical elements are formed. Desired gray scale patterns may be created by varying the thickness of a light absorbing layer. Such variations in thickness may be created using multiple binary masks. Desired gray scale patterns may also be created on a computer using available software and then imaged onto film or a glass film plate. Direct contact or proximity printing is then used to transfer the true gray scale pattern onto photoresist. The photoresist is then etched, thereby forming the desired pattern therein. All portions of the desired pattern are simultaneously formed in the photoresist. The etched photoresist is then used to photolithographically fabricate either the optical element itself or a master element to be used in injection molding or other replication techniques. The gray scale mask itself may be used repeatedly to generate photoresists. The imaging is particularly useful for forming optical elements having a plurality of arrays of refractive elements.
摘要翻译： 形成用于产生光学元件的灰度掩模。 可以通过改变光吸收层的厚度来产生期望的灰度图案。 可以使用多个二进制掩模来创建厚度的这种变化。 也可以使用可用的软件在计算机上创建所需的灰度图案，然后将其成像到薄膜或玻璃薄膜板上。 然后使用直接接触或接近印刷将真实灰度图案转印到光致抗蚀剂上。 然后蚀刻光致抗蚀剂，从而在其中形成所需的图案。 所需图案的所有部分同时形成在光致抗蚀剂中。 然后将蚀刻的光致抗蚀剂光刻地制造用于注射成型或其它复制技术的光学元件本身或主元件。 可以重复使用灰度掩模本身以产生光刻胶。 该成像对于形成具有多个折射元件阵列的光学元件特别有用。
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2.发明授权Fabricating optical elements using a photoresist formed using of a gray level mask 有权使用使用灰度掩模形成的光致抗蚀剂制造光学元件公开(公告)号：US06638667B2
公开(公告)日：2003-10-28
申请号：US10158941
申请日：2002-06-03
IPC分类号： G03F900
CPC分类号： G02B3/0056 , G02B3/0012 , G03F1/50
摘要： Gray scale masks used to create optical elements are formed. Desired gray scale patterns may be created by varying a transmission across a mask, e.g., by varying the thickness of a light absorbing layer. Such variations in thickness may be created using multiple binary masks. Desired gray scale patterns may also be created on a computer using available software and then imaged onto film or a glass film plate. Direct contact or proximity printing is then used to transfer the true gray scale pattern onto a photoresist layer. The photoresist layer is then etched, thereby forming the desired pattern therein. All portions of the desired pattern are simultaneously formed in the photoresist layer. The etched photoresist layer is then used to photolithographically fabricate either the optical element itself or a master element to be used in injection molding or other replication techniques. The gray scale mask itself may be used repeatedly to generate photoresist layers.
摘要翻译： 形成用于产生光学元件的灰度掩模。 可以通过改变穿过掩模的透射来产生期望的灰度图案，例如通过改变光吸收层的厚度。 可以使用多个二进制掩模来创建厚度的这种变化。 也可以使用可用的软件在计算机上创建所需的灰度图案，然后将其成像到薄膜或玻璃薄膜板上。 然后使用直接接触或接近印刷将真实灰度图案转印到光致抗蚀剂层上。 然后蚀刻光致抗蚀剂层，从而在其中形成所需的图案。 所需图案的所有部分同时形成在光致抗蚀剂层中。 蚀刻的光致抗蚀剂层然后用于光刻制造光学元件本身或用于注射成型或其他复制技术的主元件。 可以重复使用灰度级掩模本身以产生光致抗蚀剂层。
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3.发明授权Fabricating optical elements using a photoresist formed from proximity printing of a gray level mask 有权使用由灰度级掩模的接近印刷形成的光致抗蚀剂制造光学元件公开(公告)号：US06420073B1
公开(公告)日：2002-07-16
申请号：US09584095
申请日：2000-05-31
IPC分类号： G03F900
CPC分类号： G02B3/0056 , G02B3/0012 , G03F1/50
摘要： Gray scale masks used to create optical elements are formed. Desired gray scale patterns may be created by varying the thickness of a light absorbing layer. Such variations in thickness may be created using multiple binary masks. Desired gray scale patterns may also be created on a computer using available software and then imaged onto film or a glass film plate. Direct contact or proximity printing is then used to transfer the true gray scale pattern onto a photoresist layer. The photoresist layer is then etched, thereby forming the desired pattern therein. All portions of the desired pattern are simultaneously formed in the photoresist layer. The etched photoresist layer is then used to photolithographically fabricate either the optical element itself or a master element to be used in injection molding or other replication techniques. The gray scale mask itself may be used repeatedly to generate photoresist layers. The imaging is particularly useful for forming optical elements having a plurality of arrays of refractive elements.
摘要翻译： 形成用于产生光学元件的灰度掩模。 可以通过改变光吸收层的厚度来产生期望的灰度图案。 可以使用多个二进制掩模来创建厚度的这种变化。 也可以使用可用的软件在计算机上创建所需的灰度图案，然后将其成像到薄膜或玻璃薄膜板上。 然后使用直接接触或接近印刷将真实灰度图案转印到光致抗蚀剂层上。 然后蚀刻光致抗蚀剂层，从而在其中形成所需的图案。 所需图案的所有部分同时形成在光致抗蚀剂层中。 蚀刻的光致抗蚀剂层然后用于光刻制造光学元件本身或用于注射成型或其他复制技术的主元件。 可以重复使用灰度级掩模本身以产生光致抗蚀剂层。 该成像对于形成具有多个折射元件阵列的光学元件特别有用。
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公开(公告)号：US5298988A
公开(公告)日：1994-03-29
申请号：US893191
申请日：1992-06-02
CPC分类号： H04N7/18
摘要： A technique for aligning features on opposite surfaces of a substrate by generating a fiducial image at an image plane and identifying the location of the image at a viewing device remote therefrom, e.g., a video display screen. The substrate is placed so that one surface thereof, on which a feature is to be placed in alignment with a corresponding feature already present on the other oppositely disposed surface, is at the image plane. The one surface has photoresist material thereon. With the fiducial image turned off, an image of the feature on the other oppositely disposed surface is presented at the viewing device and the substrate is moved in the image plane until the image of the feature at the viewing device is at the previously identified location of the fiducial image. The fiducial image is then regenerated to mark its location in the photoresist material at the one surface of the substrate, such location then being in alignment with the corresponding feature on the other oppositely disposed surface thereof.
摘要翻译： 一种用于通过在图像平面处产生基准图像并且在远离其的观看设备（例如，视频显示屏幕）处识别图像的位置来对准基板的相对表面上的特征的技术。 将基板放置成使得其特征被放置成与已经存在于另一个相对设置的表面上的对应特征对准的其一个表面在图像平面处。 一个表面上具有光致抗蚀剂材料。 在基准图像被关闭的情况下，在另一个相对设置的表面上的特征的图像呈现在观察装置处，并且基板在图像平面中移动，直到观察装置处的特征的图像处于先前识别的位置 基准图像。 然后再生基准图像以在基板的一个表面处标记其在光致抗蚀剂材料中的位置，然后这样的位置与其另一相对设置的表面上的对应特征对准。
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公开(公告)号：US5160959A
公开(公告)日：1992-11-03
申请号：US809644
申请日：1991-12-09
CPC分类号： G03F7/2014 , G03B27/20 , G03F7/70691 , G03F9/00
摘要： A device for aligning a flexible mask with a substrate when the substrate is mounted on a vacuum chuck member which includes a surround member surrounding the exposed surface of the substrate. The mask is held on a mask holder and the chuck member and mask holder are movable toward and away from each other. The surround member rests on a flexible element which effectively causes the surround member to float so that when the mask is brought into contact with the substrate, the mask always lies in the same plane as the exposed surface of the substrate and the exposed surface of the surround member and no distortion of the mask occurs.
摘要翻译： 一种用于在将衬底安装在包括围绕衬底的暴露表面的围绕构件的真空吸盘构件上时将柔性掩模与衬底对准的装置。 掩模被保持在掩模保持器上，并且卡盘构件和掩模保持器能够朝向和远离彼此移动。 环绕构件放置在柔性元件上，其有效地使周围构件浮动，使得当掩模与衬底接触时，掩模总是位于与衬底的暴露表面相同的平面中， 环绕构件，并且不会发生面罩的变形。
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