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1.发明授权Fabricating optical elements using a photoresist formed using of a gray level mask 有权使用使用灰度掩模形成的光致抗蚀剂制造光学元件公开(公告)号：US06638667B2
公开(公告)日：2003-10-28
申请号：US10158941
申请日：2002-06-03
IPC分类号： G03F900
CPC分类号： G02B3/0056 , G02B3/0012 , G03F1/50
摘要： Gray scale masks used to create optical elements are formed. Desired gray scale patterns may be created by varying a transmission across a mask, e.g., by varying the thickness of a light absorbing layer. Such variations in thickness may be created using multiple binary masks. Desired gray scale patterns may also be created on a computer using available software and then imaged onto film or a glass film plate. Direct contact or proximity printing is then used to transfer the true gray scale pattern onto a photoresist layer. The photoresist layer is then etched, thereby forming the desired pattern therein. All portions of the desired pattern are simultaneously formed in the photoresist layer. The etched photoresist layer is then used to photolithographically fabricate either the optical element itself or a master element to be used in injection molding or other replication techniques. The gray scale mask itself may be used repeatedly to generate photoresist layers.
摘要翻译： 形成用于产生光学元件的灰度掩模。 可以通过改变穿过掩模的透射来产生期望的灰度图案，例如通过改变光吸收层的厚度。 可以使用多个二进制掩模来创建厚度的这种变化。 也可以使用可用的软件在计算机上创建所需的灰度图案，然后将其成像到薄膜或玻璃薄膜板上。 然后使用直接接触或接近印刷将真实灰度图案转印到光致抗蚀剂层上。 然后蚀刻光致抗蚀剂层，从而在其中形成所需的图案。 所需图案的所有部分同时形成在光致抗蚀剂层中。 蚀刻的光致抗蚀剂层然后用于光刻制造光学元件本身或用于注射成型或其他复制技术的主元件。 可以重复使用灰度级掩模本身以产生光致抗蚀剂层。
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2.发明授权Fabricating optical elements using a photoresist formed from contact printing of a gray level mask 失效使用由灰度级掩模的接触印刷形成的光致抗蚀剂制造光学元件
公开(公告)号：US6071652A
公开(公告)日：2000-06-06
申请号：US44864
申请日：1998-03-20
CPC分类号： G02B3/0012 , G03F1/50 , G02B3/0056
摘要： Gray scale masks used to create optical elements are formed. Desired gray scale patterns may be created by varying the thickness of a light absorbing layer. Such variations in thickness may be created using multiple binary masks. Desired gray scale patterns may also be created on a computer using available software and then imaged onto film or a glass film plate. Direct contact or proximity printing is then used to transfer the true gray scale pattern onto photoresist. The photoresist is then etched, thereby forming the desired pattern therein. All portions of the desired pattern are simultaneously formed in the photoresist. The etched photoresist is then used to photolithographically fabricate either the optical element itself or a master element to be used in injection molding or other replication techniques. The gray scale mask itself may be used repeatedly to generate photoresists. The imaging is particularly useful for forming optical elements having a plurality of arrays of refractive elements.
摘要翻译： 形成用于产生光学元件的灰度掩模。 可以通过改变光吸收层的厚度来产生期望的灰度图案。 可以使用多个二进制掩模来创建厚度的这种变化。 也可以使用可用的软件在计算机上创建所需的灰度图案，然后将其成像到薄膜或玻璃薄膜板上。 然后使用直接接触或接近印刷将真实灰度图案转印到光致抗蚀剂上。 然后蚀刻光致抗蚀剂，从而在其中形成所需的图案。 所需图案的所有部分同时形成在光致抗蚀剂中。 然后将蚀刻的光致抗蚀剂光刻地制造用于注射成型或其它复制技术的光学元件本身或主元件。 可以重复使用灰度掩模本身以产生光刻胶。 该成像对于形成具有多个折射元件阵列的光学元件特别有用。
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3.发明授权Fabricating optical elements using a photoresist formed from proximity printing of a gray level mask 有权使用由灰度级掩模的接近印刷形成的光致抗蚀剂制造光学元件公开(公告)号：US06420073B1
公开(公告)日：2002-07-16
申请号：US09584095
申请日：2000-05-31
IPC分类号： G03F900
CPC分类号： G02B3/0056 , G02B3/0012 , G03F1/50
摘要： Gray scale masks used to create optical elements are formed. Desired gray scale patterns may be created by varying the thickness of a light absorbing layer. Such variations in thickness may be created using multiple binary masks. Desired gray scale patterns may also be created on a computer using available software and then imaged onto film or a glass film plate. Direct contact or proximity printing is then used to transfer the true gray scale pattern onto a photoresist layer. The photoresist layer is then etched, thereby forming the desired pattern therein. All portions of the desired pattern are simultaneously formed in the photoresist layer. The etched photoresist layer is then used to photolithographically fabricate either the optical element itself or a master element to be used in injection molding or other replication techniques. The gray scale mask itself may be used repeatedly to generate photoresist layers. The imaging is particularly useful for forming optical elements having a plurality of arrays of refractive elements.
摘要翻译： 形成用于产生光学元件的灰度掩模。 可以通过改变光吸收层的厚度来产生期望的灰度图案。 可以使用多个二进制掩模来创建厚度的这种变化。 也可以使用可用的软件在计算机上创建所需的灰度图案，然后将其成像到薄膜或玻璃薄膜板上。 然后使用直接接触或接近印刷将真实灰度图案转印到光致抗蚀剂层上。 然后蚀刻光致抗蚀剂层，从而在其中形成所需的图案。 所需图案的所有部分同时形成在光致抗蚀剂层中。 蚀刻的光致抗蚀剂层然后用于光刻制造光学元件本身或用于注射成型或其他复制技术的主元件。 可以重复使用灰度级掩模本身以产生光致抗蚀剂层。 该成像对于形成具有多个折射元件阵列的光学元件特别有用。
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公开(公告)号：US06952507B2
公开(公告)日：2005-10-04
申请号：US10291805
申请日：2002-11-12
CPC分类号： G02B6/4204 , G02B6/29311 , G02B6/4203 , G02B6/4206 , G02B6/4214
摘要： An optical coupler reduces differential mode delay in a fiber by reducing an amount of light incident on the fiber in a region in which the refractive index is not well controlled. This region of the fiber is typically in the center of the fiber The optical coupler directs light away from the this region and/or provides a high angle of incidence to any light on this region. A diffuser may be used to reduce sensitivity of the coupler to any fluctutations in the output of the light source. The optical coupler does not need to be offset from the center of the multi-mode coupler. A phase function of an azimuthal mode of the fiber may be imposed on the light beam so that a substantial null on axis is maintained even after propogation of the light beam beyond the depth of focus of the coupler. A diffractive element generating a beam which propogates in a spiral fashion along an axis allows the shape of the beam to be maintained for longer than a depth of focus of the diffractive element.
摘要翻译： 光耦合器通过减少入射在光纤上的光的折射率不能很好地控制的区域中的光纤中的差模延迟。 光纤的该区域通常在光纤的中心。光耦合器将光远离该区域并且/或提供与该区域上的任何光的高角度入射。 可以使用扩散器来降低耦合器对光源的输出中的任何波动的灵敏度。 光耦合器不需要偏离多模耦合器的中心。 光纤的方位角模式的相位函数可以施加在光束上，使得即使在光束传播超过耦合器的焦深之后，也保持基本上的零轴。 产生沿着轴以螺旋方式传播的光束的衍射元件允许光束的形状保持长于衍射元件的焦深。
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5.发明申请Transfer of optical element patterns on a same side of a substrate already having a feature thereon 审中-公开在已经具有其特征的基板的同一侧上转移光学元件图案公开(公告)号：US20090225422A1
公开(公告)日：2009-09-10
申请号：US12453650
申请日：2009-05-18
申请人： Thomas J. Suleski , Robert Russell Boye , William Delaney , Harris Miller , James Morris , Hongtao Han , Jay Mathews
发明人： Thomas J. Suleski , Robert Russell Boye , William Delaney , Harris Miller , James Morris , Hongtao Han , Jay Mathews
IPC分类号： G02B27/44
CPC分类号： G02B5/1857 , G02B5/1814 , G03F7/0005 , G03F7/0035
摘要： A passive optical element is transferred into a substrate already having features with a vertical dimension thereon. The features may be another passive optical element, an active optical element, a dichroic layer, a dielectric layer, alignment features, metal portions. A protective layer is provided over the feature during the transfer of the optical element. One or more of these processes may be performed on a wafer level.
摘要翻译： 无源光学元件被转移到已经具有垂直尺寸的特征的衬底中。 特征可以是另一个无源光学元件，有源光学元件，二向色层，介电层，对准特征，金属部分。 在光学元件的传送期间，在特征上提供保护层。 这些处理中的一个或多个可以在晶片级上执行。
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公开(公告)号：US09238577B2
公开(公告)日：2016-01-19
申请号：US14141919
申请日：2013-12-27
CPC分类号： B81B5/00 , G02B27/0927 , G02B27/0933 , G02B27/095
摘要： Dynamic radiation beam shaping methods and systems, comprising: providing a radiation source for delivering an input radiation beam; disposing a first optical element substantially adjacent to the radiation source; disposing a second optical element substantially adjacent to the first optical element; and moving one or more of the first optical element and the second optical element relative to one another such that either an output radiation beam has a variable predetermined shape or the output radiation beam maintains a predetermined shape when the input radiation beam is varied. Optionally, the first optical element and the second optical element each comprise a freeform shape and predetermined diffractive characteristics, refractive characteristics, reflective characteristics, hybrid characteristics, gradient index materials, metamaterials, metasurfaces, subwavelength structures, and/or plasmonics. The one or more of the first optical element and the second optical element are one or more of translated laterally with respect to an optic axis, rotated about the optic axis, tilted with respect to the optic axis, and separated along the optic axis.
摘要翻译： 动态辐射束成形方法和系统，包括：提供用于传送输入辐射束的辐射源; 设置基本上邻近辐射源的第一光学元件; 设置基本上邻近所述第一光学元件的第二光学元件; 并且相对于彼此移动第一光学元件和第二光学元件中的一个或多个，使得输出辐射束具有可变的预定形状，或者当输入辐射束变化时输出辐射束保持预定形状。 可选地，第一光学元件和第二光学元件各自包括自由形状和预定的衍射特性，折射特性，反射特性，混合特性，梯度折射率材料，超材料，元表面，亚波长结构和/或等离子体激元。 第一光学元件和第二光学元件中的一个或多个是相对于光轴横向平移的一个或多个，围绕光轴旋转，相对于光轴倾斜并沿着光轴分离。
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7.发明授权公开(公告)号：US06869754B2
公开(公告)日：2005-03-22
申请号：US09994867
申请日：2001-11-28
申请人： Thomas J. Suleski , Robert Russell Boye , William Delaney , Harris Miller , James Morris , Hongtao Han , Jay Mathews
发明人： Thomas J. Suleski , Robert Russell Boye , William Delaney , Harris Miller , James Morris , Hongtao Han , Jay Mathews
CPC分类号： G02B5/1857 , G02B5/1814 , G03F7/0005 , G03F7/0035
摘要： A passive optical element is transferred into a substrate already having features with a vertical dimension thereon. The features may be another passive optical element, an active optical element, a dichroic layer, a dielectric layer, alignment features, metal portions. A protective layer is provided over the feature during the transfer of the optical element. One or more of these processes may be performed on a wafer level.
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8.发明授权Method and apparatus for fabricating shaped structures and shaped structures including one- , two- or three-dimensional patterns incorporated therein 有权用于制造成形结构和成形结构的方法和装置，包括其中结合的一维，二维或三维图案公开(公告)号：US07855046B2
公开(公告)日：2010-12-21
申请号：US11400684
申请日：2006-04-07
申请人： Thomas J. Suleski
发明人： Thomas J. Suleski
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G02B6/02138 , G02B6/124 , G02B6/138
摘要： The invention includes a template useful for the fabrication of devices having one, two, or three dimensional geometries. The template can include at least a first patterned surface and a mask integrated into the template for creating an interference pattern when radiation is passed through the mask. The template can be useful in the production of shaped structures including one-, two-, or three-dimensionally shaped patterns, and further including at least one shaped surface.
摘要翻译： 本发明包括可用于制造具有一维，二维或三维几何形状的装置的模板。 模板可以包括至少第一图案化表面和集成到模板中的掩模，用于当辐射通过掩模时产生干涉图案。 该模板可用于生产包括一维，二维或三维形状图案的成形结构，并且还包括至少一个成形表面。
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公开(公告)号：US06788423B2
公开(公告)日：2004-09-07
申请号：US10138522
申请日：2002-05-06
IPC分类号： G01B902
CPC分类号： G01M11/025 , G01M11/0271
摘要： An aspheric microlens, particularly a conic constant of the microlens, may be evaluated and this evaluation may be used to determine an optimal process for creating the aspheric microlens. Such evaluation may include a curve fitting or a numerical expression of the wavefront.
摘要翻译： 可以评估非球面微透镜，特别是微透镜的二次曲线常数，并且可以使用该评估来确定用于产生非球面微透镜的最佳工艺。 这种评估可以包括波形拟合或波前的数值表达式。
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公开(公告)号：US06683295B2
公开(公告)日：2004-01-27
申请号：US09994869
申请日：2001-11-28
IPC分类号： G01B902
CPC分类号： G02B27/4244 , G02B27/42 , H01S5/005 , H01S5/0687
摘要： Numerous features may be incorporated into a wavelength locker to reduce the noise inherent therein. These features may be used in any combination thereof. These features include avoiding the use of reflectors, using a diffractive splitter which outputs evanescent beams for diffractive orders greater than one, using anti-reflective coatings, using an opaque material with through holes for the light, and designing the wavelength locker to be used at a tilt.
摘要翻译： 可以将多种特征结合到波长锁定器中以减少其中固有的噪声。 这些特征可以以其任何组合使用。 这些特征包括避免使用反射器，使用衍射分离器，其使用抗反射涂层，使用具有用于光的通孔的不透明材料输出用于衍射级大于1的衍射级的渐逝光束，并设计将要使用的波长锁存器 一个倾斜。
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