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公开(公告)号：US5160959A
公开(公告)日：1992-11-03
申请号：US809644
申请日：1991-12-09
CPC分类号： G03F7/2014 , G03B27/20 , G03F7/70691 , G03F9/00
摘要： A device for aligning a flexible mask with a substrate when the substrate is mounted on a vacuum chuck member which includes a surround member surrounding the exposed surface of the substrate. The mask is held on a mask holder and the chuck member and mask holder are movable toward and away from each other. The surround member rests on a flexible element which effectively causes the surround member to float so that when the mask is brought into contact with the substrate, the mask always lies in the same plane as the exposed surface of the substrate and the exposed surface of the surround member and no distortion of the mask occurs.
摘要翻译： 一种用于在将衬底安装在包括围绕衬底的暴露表面的围绕构件的真空吸盘构件上时将柔性掩模与衬底对准的装置。 掩模被保持在掩模保持器上，并且卡盘构件和掩模保持器能够朝向和远离彼此移动。 环绕构件放置在柔性元件上，其有效地使周围构件浮动，使得当掩模与衬底接触时，掩模总是位于与衬底的暴露表面相同的平面中， 环绕构件，并且不会发生面罩的变形。
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公开(公告)号：US5298988A
公开(公告)日：1994-03-29
申请号：US893191
申请日：1992-06-02
CPC分类号： H04N7/18
摘要： A technique for aligning features on opposite surfaces of a substrate by generating a fiducial image at an image plane and identifying the location of the image at a viewing device remote therefrom, e.g., a video display screen. The substrate is placed so that one surface thereof, on which a feature is to be placed in alignment with a corresponding feature already present on the other oppositely disposed surface, is at the image plane. The one surface has photoresist material thereon. With the fiducial image turned off, an image of the feature on the other oppositely disposed surface is presented at the viewing device and the substrate is moved in the image plane until the image of the feature at the viewing device is at the previously identified location of the fiducial image. The fiducial image is then regenerated to mark its location in the photoresist material at the one surface of the substrate, such location then being in alignment with the corresponding feature on the other oppositely disposed surface thereof.
摘要翻译： 一种用于通过在图像平面处产生基准图像并且在远离其的观看设备（例如，视频显示屏幕）处识别图像的位置来对准基板的相对表面上的特征的技术。 将基板放置成使得其特征被放置成与已经存在于另一个相对设置的表面上的对应特征对准的其一个表面在图像平面处。 一个表面上具有光致抗蚀剂材料。 在基准图像被关闭的情况下，在另一个相对设置的表面上的特征的图像呈现在观察装置处，并且基板在图像平面中移动，直到观察装置处的特征的图像处于先前识别的位置 基准图像。 然后再生基准图像以在基板的一个表面处标记其在光致抗蚀剂材料中的位置，然后这样的位置与其另一相对设置的表面上的对应特征对准。
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3.发明授权Method and system for interference lithography utilizing phase-locked scanning beams 有权利用锁相扫描光束进行干涉光刻的方法和系统公开(公告)号：US06882477B1
公开(公告)日：2005-04-19
申请号：US09711019
申请日：2000-11-09
CPC分类号： G03F7/70383 , G03F7/70408 , G03H1/0486 , G03H2001/0482 , G03H2222/36 , G03H2225/21
摘要： A method and system of interference lithography (also known as interferometric lithography or holographic lithography) which utilizes phase-locked, scanning beams (so-called scanning beam interference lithography, or SBIL). The invention utilizes a high-precision stage that moves a substrate under overlapped and interfering pairs of coherent beams. The overlapped beams interfere, generating fringes, which form a pattern “brush” for subsequent writing of periodic and quasi-periodic patterns on the substrate. The phase of the fringes in the overlapped region is phase-locked to the motion of the precision stage. The invention includes methods for forming, overlapping, and phase-locking interfering pairs of beams on a variety of substrates; methods for measuring and controlling the period, phase, and angular orientation of fringes generated by the overlapping beams; and methods for measuring and controlling the effects of stage mechanical and thermal drift and other disturbances during the writing process.
摘要翻译： 使用相位锁定扫描光束（所谓的扫描光束干涉光刻术或SBIL）的干涉光刻（也称为干涉光刻或全息光刻）的方法和系统。 本发明利用了在重叠和干扰的相干光束对之下移动衬底的高精度级。 重叠的光束干涉，产生条纹，其形成图案“刷”，用于随后在衬底上写入周期性和准周期性图案。 重叠区域中条纹的相位与精密级的运动相位锁定。 本发明包括用于在各种基板上形成，重叠和相位锁定干涉波束对的方法; 用于测量和控制由重叠梁产生的条纹的周期，相位和角度取向的方法; 以及在写入过程中测量和控制舞台机械和热漂移及其他干扰的影响的方法。
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4.发明授权Optical gap measuring apparatus and method having two-dimensional grating mark with chirp in one direction 失效具有在一个方向上具有啁啾的二维光栅标记的光学间隙测量装置和方法公开(公告)号：US06522411B1
公开(公告)日：2003-02-18
申请号：US09578578
申请日：2000-05-25
IPC分类号： G01B902
CPC分类号： G03F9/7076 , G03F7/7035 , G03F9/703 , G03F9/7038 , G03F9/7049
摘要： An apparatus and method of measuring the gap between one substantially planar object, such as a mask, and a second planar object, such as a substrate. The invention achieves a high degree of sensitivity, accuracy, capture range, and reliability, through a novel design of a mark located only on the mask-plate. The light is inclined to the surfaces so associated optical components do not interrupt the exposing beam used in lithography. The same optics are used as for aligning overlay. Each gapping mark on the mask-plate includes one or more two-dimensional gratings, each with period constant in the incident plane, but varying in the transverse plane. When illuminated, two images are formed of each of the two-dimensional gratings, with fringes resulting from interference between paths having traveled different distances through the gap and the mask-plate as a result of successive diffractions and reflections. Phase and geometric measurements from these images yield accurate measurement of the gap between the plates. Direct calibration, referenced to the light-wavelength, is obtained from a diffractive Michelson technique that uses a linear grating also included within the gapping mark.
摘要翻译： 测量诸如掩模的一个基本上平面的物体与诸如基板的第二平面物体之间的间隙的装置和方法。 本发明通过仅位于掩模板上的标记的新颖设计实现了高度的灵敏度，精度，捕获范围和可靠性。 光线倾斜于表面，因此相关联的光学部件不会中断光刻中使用的曝光光束。 使用相同的光学元件用于对齐覆盖层。 掩模板上的每个间隙标记包括一个或多个二维光栅，每个二维光栅在入射平面中具有周期常数，但在横向平面中变化。 当被照亮时，由每个二维光栅形成两个图像，其中由作为连续的衍射和反射的结果的通过间隙行进了不同距离的路径和掩模板之间的干涉导致的条纹。 这些图像的相位和几何测量可以准确测量板之间的间隙。 参考光波长的直接校准是从采用迈克尔逊衍射技术获得的，该技术使用也包含在间隙标记内的线性光栅。
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公开(公告)号：US4314210A
公开(公告)日：1982-02-02
申请号：US96747
申请日：1979-11-23
申请人： Patrick N. Everett
发明人： Patrick N. Everett
CPC分类号： H01S3/1109 , H01S3/083 , H01S3/10092 , H01S3/107 , H01S3/235
摘要： A single electro-optic device is provided for simultaneously mode-locking and chirping the output of a laser by simultaneously applying to the electrodes of the electro-optic device a periodic signal superimposed on a voltage ramp. The electro-optic device in general utilizes a crystal of the type which changes refractive index in accordance with an applied voltage. As a result, FM mode-locking is achieved through the use of the periodic signal, whereas mode lines are displaced or shifted in frequency during the generation of the laser output by virtue of the changing bias supplied by the voltage ramp.
摘要翻译： 提供单个电光装置，通过同时向电光装置的电极施加叠加在电压斜坡上的周期信号，同时锁定和啁啾激光器的输出。 电光器件通常利用根据施加的电压改变折射率的类型的晶体。 结果，通过使用周期信号来实现FM模式锁定，而在由电压斜坡提供的变化的偏压产生激光输出期间，模式线在频率上移位或偏移。
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公开(公告)号：US6088103A
公开(公告)日：2000-07-11
申请号：US150426
申请日：1998-09-09
CPC分类号： G03F9/70 , G01B9/02043 , G01B9/02072 , G01B9/02078 , G01B9/0209 , G01B2290/30
摘要： Alignment marks on first and second plates include a plurality of periodic gratings. A grating on a first plate has a period or pitch p.sub.1 paired up with a grating on the second plate that has a slightly different period p.sub.2. A grating on the first plate having a period p.sub.3 is paired up with a grating on the second plate having a slightly different period p.sub.4. Illuminating the gratings produces a first interference pattern characterized by a first interference phase where beams diffracted from the first and second gratings overlap and a second interference pattern characterized by a second interference phase where beams diffracted from the third and fourth gratings overlap. The plates are moved until the difference between the first and second interference phases correspond to a predetermined interference phase difference. Further invention uses an interrupted-grating pattern on the second plate with certain advantages. Further advantages are obtained using a checkerboard pattern on the second plate. In addition two inventions are made for measuring gap. One method uses the same marks on the second plate as used in aligning, and the second uses no marks on the second plate, which is an advantage in some cases.
摘要翻译： 第一和第二板上的对准标记包括多个周期性光栅。 第一板上的光栅具有与第二板上的光栅成对的周期或间距p1，其具有稍微不同的周期p2。 具有周期p3的第一板上的光栅与第二板上的光栅配对，具有稍微不同的周期p4。 照亮光栅产生第一干涉图案，其特征在于第一干涉相位，其中从第一和第二光栅衍射的光束重叠，以及第二干涉图案，其特征在于第二干涉相位，其中从第三和第四光栅衍射的光束重叠。 板移动直到第一和第二干涉相位之间的差对应于预定的干涉相位差。 另外，本发明使用了具有某些优点的第二板上的中断光栅图案。 使用第二板上的棋盘图案获得更多的优点。 另外还有两个发明用于测量差距。 一种方法在对准中使用与第二板相同的标记，而第二板在第二板上不使用标记，这在某些情况下是有利的。
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公开(公告)号：US5808742A
公开(公告)日：1998-09-15
申请号：US654287
申请日：1996-05-28
CPC分类号： G03F9/70 , G01B9/02043 , G01B9/02072 , G01B9/02078 , G01B9/0209 , G01B2290/30
摘要： Alignment marks on first and second plates include a plurality of periodic gratings. A grating on a first plate has a period or pitch p.sub.1 paired up with a grating on the second plate that has a slightly different period p.sub.2. A grating on the first plate having a period p.sub.3 is paired up with a grating on the second plate having a slightly different period p.sub.4. Illuminating the gratings produces a first interference pattern characterized by a first interference phase where beams diffracted from the first and second gratings overlap and a second interference pattern characterized by a second interference phase where beams diffracted from the third and fourth gratings overlap. The plates are moved until the difference between the first and second interference phases correspond to a predetermined interference phase difference. Further invention uses an interrupted-grating pattern on the second plate with certain advantages. Further advantages are obtained using a checkerboard pattern on the second plate. In addition two inventions are made for measuring gap. One method uses the same marks on the second plate as used in aligning, and the second uses no marks on the second plate, which is an advantage in some cases.
摘要翻译： 第一和第二板上的对准标记包括多个周期性光栅。 第一板上的光栅具有与第二板上的光栅成对的周期或间距p1，其具有稍微不同的周期p2。 具有周期p3的第一板上的光栅与第二板上的光栅配对，具有稍微不同的周期p4。 照亮光栅产生第一干涉图案，其特征在于第一干涉相位，其中从第一和第二光栅衍射的光束重叠，以及第二干涉图案，其特征在于第二干涉相位，其中从第三和第四光栅衍射的光束重叠。 板移动直到第一和第二干涉相位之间的差对应于预定的干涉相位差。 另外，本发明使用了具有某些优点的第二板上的中断光栅图案。 使用第二板上的棋盘图案获得更多的优点。 另外还有两个发明用于测量差距。 一种方法在对准中使用与第二板相同的标记，而第二板在第二板上不使用标记，这在某些情况下是有利的。
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公开(公告)号：US5260558A
公开(公告)日：1993-11-09
申请号：US886129
申请日：1992-05-20
CPC分类号： G01B11/02
摘要： A technique for measuring the distance between the edges of a feature positioned on a substrate wherein the feature is illuminated with light on either side of the edges and the light intensities at either side of each of the edges are detected and are balanced at the detected light intensities regions sufficiently removed from the edges to prevent an adverse diffractive effect thereon so as to produce regions of minimum light intensity at the edges, the positions of which can be determined and the distance between said regions of minimum intensity can be measured.
摘要翻译： 用于测量位于基板上的特征的边缘之间的距离的技术，其中特征被边缘的任一侧上的光照射并且在每个边缘的任一侧的光强度被检测并且在检测到的光 强度区域从边缘充分去除以防止其上的不利衍射效应，以便在边缘产生最小光强度的区域，其位置可以被确定，并且可以测量所述最小强度区域之间的距离。
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公开(公告)号：US4375684A
公开(公告)日：1983-03-01
申请号：US172967
申请日：1980-07-28
申请人： Patrick N. Everett
发明人： Patrick N. Everett
CPC分类号： H01S3/1109 , H01S3/115 , H01S3/107 , H01S3/1103 , H01S3/1127
摘要： A single element interposed in a laser resonator cavity provides for AM mode-locking, Q-switching and dumping in a sequential operation in which a Pockels cell or like polarization rotation device is first energized to prevent build-up of radiation in a laser cavity, is then switched to provide for mode-locking by energization with a periodically varying signal, and is finally energized to dump a single mode-locked pulse. The sequential operation permits the use of a single electro-optic element and a single pair of electrodes. Q-switching, mode-locking and dumping are accomplished utilizing the same physical effect in the crystal, e.g., polarization rotation.
摘要翻译： 插入在激光谐振腔中的单个元件在顺序操作中提供AM模式锁定，Q开关和倾倒，其中首先通电Pockels电池或类似偏振旋转装置以防止激光腔中辐射的积聚， 然后被切换以通过周期性变化的信号的通电来提供模式锁定，并且最后被通电以转储单个锁模脉冲。 顺序操作允许使用单个电光元件和单对电极。 利用在晶体中相同的物理效应，例如偏振旋转来实现Q切换，锁模和倾倒。
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