-
1.
公开(公告)号:US11914298B2
公开(公告)日:2024-02-27
申请号:US17016643
申请日:2020-09-10
Applicant: Tokyo Electron Limited
Inventor: Yuichiro Kunugimoto , Takafumi Hayama , Hidehiro Suzuki
CPC classification number: G03F7/162 , B05B15/50 , H01L21/6715 , H01L21/67253
Abstract: There is provided a liquid processing apparatus comprising: a stage on which a substrate is placed; a nozzle configured to supply a processing liquid to the substrate placed on the stage and perform a processing on the substrate; a capturing part configured to capture an image of the nozzle so as to acquire image data; and a detector configured to detect a liquid level based on a plurality of the image data acquired by the capturing part at different timings within a period in which a supply of the processing liquid from the nozzle is not performed, wherein the liquid level is formed by the processing liquid or a liquid other than the processing liquid in a processing liquid flow path provided inside the nozzle.