公开(公告)号：US20210280395A1

公开(公告)日：2021-09-09

申请号：US17190447

申请日：2021-03-03

Applicant: Tokyo Electron Limited

Inventor： Shin MATSUURA ,  Kenichi KATO

IPC: H01J37/32 ,  H01L21/687

Abstract: A plasma processing system includes a control device. The control device executes raising a lifter to deliver a cover ring supporting an edge ring to the lifter; moving a jig supported by a holder to a space between the cover ring and a substrate support surface/an annular support surface; raising a different lifter to deliver the jig to the different lifter; extracting the holder, and then moving the lifter and the different lifter relatively to deliver the edge ring to the jig; lowering only the lifter to deliver the cover ring to the annular member support surface; moving the holder to a space between the cover ring and the jig, and then lowering the different lifter to deliver the jig to the holder; and extracting the holder from the processing chamber to transfer the jig supporting the edge ring from the processing chamber.

公开(公告)号：US20240234102A9

公开(公告)日：2024-07-11

申请号：US18398162

申请日：2023-12-28

Applicant: Tokyo Electron Limited

Inventor： Shin MATSUURA ,  Kenichi KATO

IPC: H01J37/32 ,  H01L21/687

CPC classification number: H01J37/32642 ,  H01J37/32715 ,  H01L21/68742

Abstract: A plasma processing system includes a control device. The control device executes raising a lifter to deliver a cover ring supporting an edge ring to the lifter; moving a jig supported by a holder to a space between the cover ring and a substrate support surface/an annular support surface; raising a different lifter to deliver the jig to the different lifter; extracting the holder, and then moving the lifter and the different lifter relatively to deliver the edge ring to the jig; lowering only the lifter to deliver the cover ring to the annular member support surface; moving the holder to a space between the cover ring and the jig, and then lowering the different lifter to deliver the jig to the holder; and extracting the holder from the processing chamber to transfer the jig supporting the edge ring from the processing chamber.

公开(公告)号：US20240136158A1

公开(公告)日：2024-04-25

申请号：US18398162

申请日：2023-12-28

Applicant: Tokyo Electron Limited

Inventor： Shin MATSUURA ,  Kenichi KATO

IPC: H01J37/32 ,  H01L21/687

CPC classification number: H01J37/32642 ,  H01J37/32715 ,  H01L21/68742

Abstract: A plasma processing system includes a control device. The control device executes raising a lifter to deliver a cover ring supporting an edge ring to the lifter; moving a jig supported by a holder to a space between the cover ring and a substrate support surface/an annular support surface; raising a different lifter to deliver the jig to the different lifter; extracting the holder, and then moving the lifter and the different lifter relatively to deliver the edge ring to the jig; lowering only the lifter to deliver the cover ring to the annular member support surface; moving the holder to a space between the cover ring and the jig, and then lowering the different lifter to deliver the jig to the holder; and extracting the holder from the processing chamber to transfer the jig supporting the edge ring from the processing chamber.

公开(公告)号：US20210280396A1

公开(公告)日：2021-09-09

申请号：US17190451

申请日：2021-03-03

Applicant: Tokyo Electron Limited

Inventor： Shin MATSUURA ,  Kenichi KATO

IPC: H01J37/32 ,  H01L21/683 ,  C23C16/50 ,  C23C16/458

Abstract: A substrate support includes a substrate support surface, an annular member support surface, three or more lifters configured to protrude from the annular member support surface and vertically moved to adjust an amount of protrusion, and an elevating mechanism for raising or lowering each lifter. A recess having an upwardly recessed concave surface is provided at a position corresponding to each lifter on a bottom surface of the annular member. In a plan view, the recess is larger in size than a transfer error of the annular member above the annular member support surface and larger in size than an upper end portion of the lifter. The upper end portion of each lifter is formed in a hemispherical shape that gradually tapers upward, and a curvature of the concave surface is smaller than a curvature of a convex surface.