公开(公告)号：US20150052702A1

公开(公告)日：2015-02-26

申请号：US14463670

申请日：2014-08-20

Applicant: Tokyo Electron Limited

Inventor： Kazuya DOBASHI ,  Kensuke INAI

IPC: H01L21/67

CPC classification number: H01L21/67028 ,  A47L5/38 ,  H01L21/02057

Abstract: A substrate cleaning apparatus for removing particles adhered to a substrate includes a cleaning chamber for cleaning a substrate under a vacuum atmosphere, a mounting unit, provided in the cleaning chamber, for mounting the substrate thereon. The substrate cleaning apparatus further includes a nozzle unit for injecting a cleaning gas from an area of a higher pressure than an atmosphere in which the substrate is mounted toward the substrate in the cleaning chamber, generating a gas cluster as an aggregate of atoms or molecules of the cleaning gas by adiabatic expansion and irradiating the gas cluster to the substrate in a direction perpendicular thereto, a gas exhaust port for evacuating the cleaning chamber, and a moving unit for relatively moving the mounting unit and the nozzle unit.

Abstract translation: 用于去除附着在基板上的颗粒的基板清洁装置包括：用于在真空气氛下清洁基板的清洁室，设置在清洁室中的安装单元，用于在其上安装基板。 基板清洗装置还包括喷嘴单元，用于从清洁室中的基板安装的气氛的高压区域喷射清洗气体，产生气体簇作为原子或分子的聚集体 通过绝热膨胀的清洁气体和与其垂直的方向将气体簇照射到基板，用于抽空清洗室的排气口和用于相对移动安装单元和喷嘴单元的移动单元。