公开(公告)号：US20230031447A1

公开(公告)日：2023-02-02

申请号：US17872560

申请日：2022-07-25

Applicant: Tokyo Electron Limited

Inventor： Taro IKEDA ,  Satoru KAWAKAMI ,  Kenta KATO

IPC: H01J37/32

Abstract: A plasma processing apparatus includes: a processing container including a substrate support; a shower head that supplies active species of a first gas into the processing container; a first dissociation space through which the active species is supplied to the shower head; and a resonator that supplies electromagnetic waves in a VHF band or higher to the first dissociation space. The resonator includes: a cylindrical body; a gas pipe which passes through an interior of the cylindrical body, is provided along a central axis direction of the cylindrical body, and includes gas holes through which the first gas is supplied into the first dissociation space; and a dielectric window including a central portion through which the end portion of the gas pipe passes, and configured to seal a space between the gas pipe and the cylindrical body and cause the electromagnetic waves to transmit through the first dissociation space.

公开(公告)号：US20240412949A1

公开(公告)日：2024-12-12

申请号：US18674349

申请日：2024-05-24

Applicant: Tokyo Electron Limited

Inventor： Taro IKEDA ,  Eiki KAMATA ,  Kenta KATO

IPC: H01J37/32 ,  H01J37/34

Abstract: There is a remote plasma device comprising: a housing made of a metal; a dielectric disposed to fill the housing; a gas supply port disposed at the housing, and configured to supply a gas into the housing; a gas exhaust port disposed at the housing, and configured to discharge the gas from the housing; a gas line that is formed in the dielectric and connects the gas supply port and the gas discharge port; and an electromagnetic wave supply part disposed at the housing, and configured to supply electromagnetic waves into the housing and produce plasma in the gas line.

公开(公告)号：US20230178339A1

公开(公告)日：2023-06-08

申请号：US17994711

申请日：2022-11-28

Applicant: Tokyo Electron Limited

Inventor： Kenta KATO ,  Taro IKEDA ,  Isao GUNJI

IPC: H01J37/32

CPC classification number: H01J37/32201 ,  H01J37/32238 ,  H01J2237/327

Abstract: A plasma processing apparatus includes a processing container including an opening provided in a ceiling wall of the processing container, and a microwave radiation source. The microwave radiation source includes a slot antenna including a slot and configured to radiate microwaves from the slot, and a transmission window configured to close the opening and to radiate the microwaves from the slot into the processing container. The transmission window includes a first surface including a skirt which suspends to cover a side wall of the opening, and a second surface which is an opposite surface to the first surface and faces the slot antenna with a gap between the slot antenna and the second surface.

公开(公告)号：US20250104972A1

公开(公告)日：2025-03-27

申请号：US18885134

申请日：2024-09-13

Applicant: Tokyo Electron Limited

Inventor： Eiki KAMATA ,  Kenta KATO ,  Taro IKEDA

IPC: H01J37/32

Abstract: Provided is a plasma source comprising: a housing that defines a plasma generation space; a gas inlet port disposed in the housing to introduce a gas; a supply port disposed in the housing to supply active species of plasma produced from the gas in the plasma generation space; an ignition power supply port disposed in the housing to supply a radio-frequency (RF) power for igniting the plasma in the plasma generation space; and a maintenance power supply port disposed in the housing to supply the RF power for maintaining the plasma ignited in the plasma generation space.

公开(公告)号：US20230081103A1

公开(公告)日：2023-03-16

申请号：US17902642

申请日：2022-09-02

Applicant: Tokyo Electron Limited

Inventor： Kenta KATO ,  Taro IKEDA

IPC: H01J37/32

Abstract: A plasma source comprising: a plasma generator including a first wall having an opening and a second wall facing the first wall, and forming a plasma generating space; a dielectric window disposed on the first wall to block the opening and configured to transmit electromagnetic waves to the plasma generating space; and a protruding portion disposed on the second wall, protruding from the second wall to be close to the dielectric window, and containing a conductor at least partially. The protruding portion has a gas hole that opens toward the dielectric window.