公开(公告)号：US20210305029A1

公开(公告)日：2021-09-30

申请号：US17208445

申请日：2021-03-22

Applicant: Tokyo Electron Limited

Inventor： Koichi MIYASHITA ,  Makoto HORIKAWA ,  Satoshi GOMI

IPC: H01J37/32 ,  C23C16/458 ,  C23C16/52 ,  C23C16/455 ,  C23C16/50 ,  C23C16/08 ,  C23C16/34

Abstract: According to one embodiment of the present disclosure, there is provided a substrate processing system for processing a plurality of substrates including: a processor configured to perform a process on the substrate; a transport device configured to repeatedly transport the plurality of substrates with respect to the processor; and a controller configured to control the process of the substrate in the processor, wherein the controller is configured to: execute the process based on a process recipe, which is a control program for executing the process; and set an offset time, which is a function corresponding to a number of the substrates processed by the processor or a function corresponding to a parameter equivalent to the number of the processed substrates, with respect to a step time for a step of the process recipe.