STAGE DEVICE AND SUBSTRATE PROCESSING APPARATUS

    公开(公告)号:US20220013402A1

    公开(公告)日:2022-01-13

    申请号:US17363401

    申请日:2021-06-30

    Abstract: A stage device includes: a stage having a pin hole provided therein and a placement surface on which a substrate is placed; and at least one lift pin configured to move up and down through the pin hole; and a lifter configured to raise and lower the at least one lift pin, wherein the stage includes a first heating part provided therein and configured to heat the stage, and the at least one lift pin includes a second heating part provided therein or therearound and configured to heat the at least one lift pin.

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