公开(公告)号：US09799540B2

公开(公告)日：2017-10-24

申请号：US13755304

申请日：2013-01-31

Applicant: Tokyo Electron Limited

Inventor： Shigemi Oono

IPC: H01L21/67

CPC classification number: H01L21/6708 ,  H01L21/67253 ,  H01L21/67259

Abstract: A substrate holding unit of a liquid processing apparatus holds a circular substrate horizontally and rotates the substrate about a vertical axis, and a chemical liquid nozzle supplies a chemical liquid to the peripheral edge of the substrate while the substrate is being rotated in order to remove a film of the peripheral edge. An image capture unit captures an image of the peripheral edge, and a determination unit calculates an actually removed value for a removed width of the film based on a result of the image capturing and determines whether the removed width is suitable or not.

公开(公告)号：US12243758B2

公开(公告)日：2025-03-04

申请号：US17084934

申请日：2020-10-30

Applicant: Tokyo Electron Limited

Inventor： Shota Kaneko ,  Shigemi Oono ,  Norihide Sagara

IPC: G05B19/406 ,  H01L21/67 ,  H04N7/18

Abstract: A monitoring system is for a sealing apparatus that seals a substrate treatment apparatus by a housing and fills a space sealed by the housing with a predetermined gas atmosphere. The monitoring system includes: a laser sensor for a region, which a person can enter in a space between the housing and the substrate treatment apparatus, as a detection region; and a controller that outputs a control signal to the substrate treatment apparatus or the sealing apparatus based on a detection result by the laser sensor or outputs a notification signal based on the detection result.

公开(公告)号：US20130206726A1

公开(公告)日：2013-08-15

申请号：US13755304

申请日：2013-01-31

Applicant: Tokyo Electron Limited

Inventor： Shigemi Oono

IPC: H01L21/67

CPC classification number: H01L21/6708 ,  H01L21/67253 ,  H01L21/67259

Abstract: A substrate holding unit of a liquid processing apparatus holds a circular substrate horizontally and rotates the substrate about a vertical axis, and a chemical liquid nozzle supplies a chemical liquid to the peripheral edge of the substrate while the substrate is being rotated in order to remove a film of the peripheral edge. An image capture unit captures an image of the peripheral edge, and a determination unit calculates an actually removed value for a removed width of the film based on a result of the image capturing and determines whether the removed width is suitable or not.

Abstract translation: 液体处理装置的基板保持单元水平地保持圆形基板并使基板围绕垂直轴线旋转，并且化学液体喷嘴在基板旋转的同时向基板的周边边缘供应化学液体，以便去除 外围边缘的电影。 图像捕获单元捕获外围边缘的图像，并且确定单元基于图像捕获的结果来计算去除的胶片宽度的实际去除值，并确定去除的宽度是否合适。