公开(公告)号：US20210260612A1

公开(公告)日：2021-08-26

申请号：US17179551

申请日：2021-02-19

Applicant: Tokyo Electron Limited

Inventor： Terufumi Wakiyama ,  Yuichi Douki ,  Akinori Tanaka ,  Minoru Tashiro ,  Reo Kitayama ,  Shu Yamamoto

IPC: B05B12/12 ,  B05B12/10 ,  B05B3/16 ,  B05D1/02

Abstract: A controller is configured to control a liquid supply to change a landing position of a liquid on a surface of a substrate continuously by discharging the liquid toward the surface of the substrate from a first liquid discharge nozzle while moving the first liquid discharge nozzle. The controller is also configured to derive discharge position deviation information of the liquid supply by comparing first temperature information based on a spot temperature measured by a temperature measurement device when the first liquid discharge nozzle is moved along a first nozzle path and second temperature information based on the spot temperature measured by the temperature measurement device when the first liquid discharge nozzle is moved along a second nozzle path which is different from the first nozzle path.

公开(公告)号：US12269052B2

公开(公告)日：2025-04-08

申请号：US17179551

申请日：2021-02-19

Applicant: Tokyo Electron Limited

Inventor： Terufumi Wakiyama ,  Yuichi Douki ,  Akinori Tanaka ,  Minoru Tashiro ,  Reo Kitayama ,  Shu Yamamoto

IPC: B05B12/12 ,  B05B3/16 ,  B05B12/10 ,  B05D1/02

Abstract: A controller is configured to control a liquid supply to change a landing position of a liquid on a surface of a substrate continuously by discharging the liquid toward the surface of the substrate from a first liquid discharge nozzle while moving the first liquid discharge nozzle. The controller is also configured to derive discharge position deviation information of the liquid supply by comparing first temperature information based on a spot temperature measured by a temperature measurement device when the first liquid discharge nozzle is moved along a first nozzle path and second temperature information based on the spot temperature measured by the temperature measurement device when the first liquid discharge nozzle is moved along a second nozzle path which is different from the first nozzle path.

公开(公告)号：US12276455B2

公开(公告)日：2025-04-15

申请号：US17464367

申请日：2021-09-01

Applicant: TOKYO ELECTRON LIMITED

Inventor： Masataka Gosho ,  Shu Yamamoto ,  Tomohito Ura ,  Satoshi Okamura

IPC: F26B5/00 ,  F26B21/06 ,  G01M3/04

Abstract: A substrate processing apparatus for drying a substrate by substituting a liquid film of a drying liquid formed on the substrate with a supercritical fluid incudes: a pressure container configured to accommodate the substrate on which the liquid film is formed; a discharge line configured to discharge a fluid inside the pressure container; a depressurizing valve provided in a middle of the discharge line; and a concentration measurement part configured to measure a concentration of vapor of the drying liquid in the fluid flowing through the discharge line, wherein the concentration measurement part is provided on a downstream side of the depressurizing valve of the discharge line and measures the concentration of the drying liquid in the fluid depressurized by the depressurizing valve.