公开(公告)号：US20220396876A1

公开(公告)日：2022-12-15

申请号：US17805066

申请日：2022-06-02

Applicant: Tokyo Electron Limited

Inventor： Takuya KAWAGUCHI ,  Takanobu HOTTA ,  Kensaku NARUSHIMA ,  Hideaki YAMASAKI ,  Takashi KAKEGAWA ,  Toshio TAKAGI ,  Takaya YAMAUCHI

IPC: C23C16/455 ,  C23C16/44

Abstract: A showerhead includes a shower plate and a base member including a gas flow path, the base member fixing the shower plate. The showerhead includes gas supply members disposed at a gas diffusion space, the gas diffusion space being provided between the shower plate and the base member, the gas supply members being connected to the gas flow path, each of the gas supply members including outlets via which gas is radially discharged, and the gas supply members being arranged such that the gas discharged via the outlets of the gas supply members generates a rotational flow.

公开(公告)号：US20230062123A1

公开(公告)日：2023-03-02

申请号：US17896904

申请日：2022-08-26

Applicant: TOKYO ELECTRON LIMITED

Inventor： Toshio TAKAGI ,  Takuya KAWAGUCHI ,  Takanobu HOTTA ,  Hideaki YAMASAKI ,  Takaya YAMAUCHI

IPC: C23C16/455 ,  C23C16/06 ,  H01L21/3205 ,  C23C16/458

Abstract: An apparatus for forming a film on a substrate includes: a processing container in which a reaction gas is supplied to a surface of the substrate; a stage installed in the processing container, configured to place the substrate and including a heater; a lifting shaft connected to an external lifting mechanism via a through port formed in the processing container; a casing installed between the processing container and the lifting mechanism and covering the lifting shaft; a lid member disposed to surround the lifting shaft with a gap interposed between the lifting shaft and the lid member, and installed in the processing container; a purge gas supplier configured to supply a purge gas into the casing; and a guide member disposed at a position facing the gap that opens toward an interior of the processing container and including a guide surface configured to guide the purge gas.