公开(公告)号：US20230062123A1

公开(公告)日：2023-03-02

申请号：US17896904

申请日：2022-08-26

Applicant: TOKYO ELECTRON LIMITED

Inventor： Toshio TAKAGI ,  Takuya KAWAGUCHI ,  Takanobu HOTTA ,  Hideaki YAMASAKI ,  Takaya YAMAUCHI

IPC: C23C16/455 ,  C23C16/06 ,  H01L21/3205 ,  C23C16/458

Abstract: An apparatus for forming a film on a substrate includes: a processing container in which a reaction gas is supplied to a surface of the substrate; a stage installed in the processing container, configured to place the substrate and including a heater; a lifting shaft connected to an external lifting mechanism via a through port formed in the processing container; a casing installed between the processing container and the lifting mechanism and covering the lifting shaft; a lid member disposed to surround the lifting shaft with a gap interposed between the lifting shaft and the lid member, and installed in the processing container; a purge gas supplier configured to supply a purge gas into the casing; and a guide member disposed at a position facing the gap that opens toward an interior of the processing container and including a guide surface configured to guide the purge gas.

公开(公告)号：US20160177445A1

公开(公告)日：2016-06-23

申请号：US14978405

申请日：2015-12-22

Applicant: TOKYO ELECTRON LIMITED

Inventor： Tsuyoshi TAKAHASHI ,  Masaki SANO ,  Takashi KAMIO ,  Toshio TAKAGI

IPC: C23C16/455 ,  C23C16/458

CPC classification number: C23C16/45544 ,  C23C16/45565 ,  C23C16/45589

Abstract: A film forming apparatus includes a mounting table mounting a substrate thereon, a gas diffusion unit above the mounting table, gas dispersion units above the gas diffusion unit, and an evacuation unit to evacuate a processing chamber. The gas diffusion unit has gas injection holes for injecting a gas in a shower shape. Outermost gas injection holes are arranged outward of an outer circumference of the substrate when seen from the top. The gas dispersion units face the gas diffusion unit through a diffusion space therebetween. Each of the gas dispersion units has gas discharge holes formed along a circumferential direction thereof to disperse a gas horizontally into the diffusion space. The gas dispersion units include at least three first gas dispersion units along a first circle, and at least three second gas dispersion units along a second circle concentrically disposed at an outer side of the first circle.

Abstract translation: 一种成膜装置包括：安装基板的安装台，安装台上方的气体扩散单元，气体扩散单元上方的气体分散单元，以及抽出处理室的排气单元。 气体扩散单元具有用于喷射淋浴形状的气体的气体注入孔。 当从顶部观察时，最外部的气体注入孔布置在基板的外周的外侧。 气体分散单元通过其间的扩散空间面对气体扩散单元。 每个气体分散单元具有沿其圆周方向形成的气体排出孔，以将气体水平地分散到扩散空间中。 气体分散单元包括沿着第一圆的至少三个第一气体分散单元和沿着同心地设置在第一圆的外侧的第二圆的至少三个第二气体分散单元。

公开(公告)号：US20220396875A1

公开(公告)日：2022-12-15

申请号：US17805062

申请日：2022-06-02

Applicant: Tokyo Electron Limited

Inventor： Takanobu HOTTA ,  Takuya KAWAGUCHI ,  Hideaki YAMASAKI ,  Toshio TAKAGI ,  Takashi KAKEGAWA

IPC: C23C16/455 ,  C23C16/44 ,  H01L21/205

Abstract: A showerhead includes a shower plate, a base member in which a gas flow passage is provided, the base member fixing the shower plate, a plurality of gas supply members disposed in a gas diffusion space and connected to the gas flow passage, the gas diffusion space being formed between the shower plate and the base member, and a flow adjusting plate disposed in the gas diffusion space, the flow adjusting plate being disposed on an outer periphery on an outer side from the plurality of gas supply members.

公开(公告)号：US20220396876A1

公开(公告)日：2022-12-15

申请号：US17805066

申请日：2022-06-02

Applicant: Tokyo Electron Limited

Inventor： Takuya KAWAGUCHI ,  Takanobu HOTTA ,  Kensaku NARUSHIMA ,  Hideaki YAMASAKI ,  Takashi KAKEGAWA ,  Toshio TAKAGI ,  Takaya YAMAUCHI

IPC: C23C16/455 ,  C23C16/44

Abstract: A showerhead includes a shower plate and a base member including a gas flow path, the base member fixing the shower plate. The showerhead includes gas supply members disposed at a gas diffusion space, the gas diffusion space being provided between the shower plate and the base member, the gas supply members being connected to the gas flow path, each of the gas supply members including outlets via which gas is radially discharged, and the gas supply members being arranged such that the gas discharged via the outlets of the gas supply members generates a rotational flow.

公开(公告)号：US20150267298A1

公开(公告)日：2015-09-24

申请号：US14659121

申请日：2015-03-16

Applicant: Tokyo Electron Limited

Inventor： Tetsuya SAITOU ,  Tomohiro OOTA ,  Toshio TAKAGI

IPC: C23C16/455 ,  C23C16/46 ,  C23C16/52 ,  C23C16/44 ,  C23C16/458

CPC classification number: C23C16/45565 ,  C23C16/34 ,  C23C16/4412 ,  C23C16/45544 ,  C23C16/45574 ,  C23C16/458 ,  C23C16/46

Abstract: A film forming apparatus for performing a film forming process by sequentially supplying a plurality of reactant gases to a substrate and supplying a replacement gas includes a mounting table configured to mount thereon a substrate, and a shower head having a flat surface facing the mounting table and a plurality of gas supply opening. An annular protrusion is provided at the shower head to form a gap between the annular protrusion and a top surface of the mounting table. A plurality of gas supply units is provided at a ceiling portion at an upper side of the shower head. Each gas supply unit has gas discharge openings formed along a circumferential direction. The diffusion space is disposed such that an outer periphery of the diffusion space is located at an inner side of an outer periphery of the substrate mounted on the mounting table in a plan view.

Abstract translation: 一种成膜设备，用于通过将多个反应物气体依次供应到基板并供应替换气体来进行成膜过程包括：安装台，其安装在基板上;以及淋浴喷头，其具有面向安装台的平坦表面， 多个供气口。 在喷淋头处设置有环形突起，以在环形突起与安装台的顶表面之间形成间隙。 多个气体供给单元设置在淋浴喷头的上侧的顶部。 每个气体供给单元具有沿圆周方向形成的气体排出开口。 扩散空间被布置成使得扩散空间的外周在平面图中位于安装在安装台上的基板的外周的内侧。