公开(公告)号：US20230420228A1

公开(公告)日：2023-12-28

申请号：US18462258

申请日：2023-09-06

Applicant: Tokyo Electron Limited

Inventor： Akihiro YOKOTA ,  Ryo TERASHIMA ,  Tomo MURAKAMI ,  Takaharu SAINO

IPC: H01J37/32

CPC classification number: H01J37/32669 ,  H01J37/32082 ,  H01J37/32449 ,  H01J37/32935

Abstract: A disclosed plasma processing apparatus includes a chamber, a plasma generator, a plurality of annular electromagnet units, a power source, at least one optical sensor, and a controller. The plurality of annular electromagnet units are provided coaxially with respect to an axis passing through an internal space of the chamber. The at least one optical sensor detects an emission intensity distribution of plasma along a radial direction in the chamber. The controller controls a power source to adjust currents respectively supplied to the plurality annular electromagnet units according to the emission intensity distribution.