公开(公告)号：US20210087684A1

公开(公告)日：2021-03-25

申请号：US17016590

申请日：2020-09-10

Applicant: Tokyo Electron Limited

Inventor： Yu SASAKI ,  Toshihiko JO ,  Hitoshi KATO ,  Kosuke TAKAHASHI

IPC: C23C16/455 ,  C23C16/458

Abstract: A deposition apparatus according to one aspect of the present disclosure includes a processing chamber and a rotary table provided in the processing chamber. Above the rotary table, a raw material gas supply section, auxiliary gas supply sections, and a gas exhaust section are provided. The raw material gas supply section extends in a radial direction of the rotary table. The auxiliary gas supply sections are provided on a downstream side of a rotational direction of the rotary table with respect to the raw material gas supply section, and are arranged in the radial direction of the rotary table. The gas exhaust section is provided on the downstream side of the rotational direction of the rotary table with respect to the auxiliary gas supply sections, and extends in the radial direction of the rotary table.