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    MICROWAVE PROCESSING METHOD AND MICROWAVE PROCESSING APPARATUS
    1.
    发明申请
    MICROWAVE PROCESSING METHOD AND MICROWAVE PROCESSING APPARATUS 审中-公开
    微波处理方法和微波加工设备

    公开(公告)号：US20140042153A1

    公开(公告)日：2014-02-13

    申请号：US13957643

    申请日：2013-08-02

    Applicant: TOKYO ELECTRON LIMITED

    Inventor： Kouji Shimomura ,  Yoshiro Kabe ,  Taichi Monden ,  Jun Yamashita ,  Kunio Takano ,  Satoshi Gomi

    IPC: H05B6/80

    CPC classification number: H05B6/80 ,  H01L21/67115 ,  H05B6/806

    Abstract: A microwave processing method for processing an object in a processing chamber is probided by using microwaves. The method includes loading the object into the processing chamber in a state where a pressure in the processing chamber is higher than that of an outside environment; discharging O2 gas from the processing chamber by introducing N2 gas into the processing chamber; performing heat treatment on the object by introducing microwaves into the processing chamber from which the O2 gas has been discharged; and cooling the object in a state where the pressure in the chamber is higher than that of the outside environment.

    Abstract translation: 通过使用微波来概述用于处理处理室中的物体的微波处理方法。 该方法包括在处理室中的压力高于外部环境的压力的状态下将物体装载到处理室中; 通过将N2气引入处理室，从处理室排出O 2气体; 通过将微波引入到已经从其中排出O 2气体的处理室中来对物体进行热处理; 并且在室内的压力高于外部环境的压力的状态下冷却物体。

    MICROWAVE HEATING APPARATUS AND PROCESSING METHOD
    2.
    发明申请
    MICROWAVE HEATING APPARATUS AND PROCESSING METHOD 审中-公开
    微波加热装置和加工方法

    公开(公告)号：US20150090708A1

    公开(公告)日：2015-04-02

    申请号：US14381235

    申请日：2013-02-05

    Applicant: Tokyo Electron Limited

    Inventor： Sumi Tanaka ,  Taro Ikeda ,  Yoshiro Kabe ,  Kouji Shimomura ,  Seokhyoung Hong ,  Jun Yamashita ,  Masakazu Ban ,  Taichi Monden ,  Masayoshi Maenishi ,  Ryoji Yamazaki

    IPC: H05B6/70 ,  H05B6/80 ,  H05B6/64

    CPC classification number: H05B6/707 ,  H01L21/67115 ,  H01L21/6719 ,  H01L21/68792 ,  H05B6/6411 ,  H05B6/806 ,  H05B2206/044

    Abstract: A microwave heating apparatus includes a processing chamber for accommodating a target, a support device for supporting the target in the processing chamber and a microwave introducing device for generating microwaves to introduce them into the processing chamber. The processing chamber further includes a top wall having a plurality of microwave introduction ports to introduce the microwaves generated in the microwave introducing device into the processing chamber. Each of the microwave introduction ports has a rectangular shape having long sides and short sides parallel to inner wall surfaces of four sidewalls of the processing chamber, and the support device includes a support member to support the target and a rotating mechanism for rotating the supported target.

    Abstract translation: 微波加热装置包括用于容纳目标的处理室，用于在处理室中支撑目标的支撑装置和用于产生微波以将它们引入处理室的微波引入装置。 处理室还包括具有多个微波引入端口的顶壁，以将在微波引入装置中产生的微波引入处理室。 每个微波引入端口具有矩形形状，其长边和短边平行于处理室的四个侧壁的内壁表面，并且支撑装置包括用于支撑目标的支撑构件和用于使支撑的目标物旋转的旋转机构 。

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