公开(公告)号：US11749511B2

公开(公告)日：2023-09-05

申请号：US17149150

申请日：2021-01-14

Applicant: Tokyo Electron Limited

Inventor： Ryoji Yamazaki ,  Hiroyuki Miyashita ,  Mikio Sato

IPC: H01J37/32 ,  G01J3/02 ,  G01J3/28

CPC classification number: H01J37/32972 ,  G01J3/021 ,  G01J3/0218 ,  G01J3/28 ,  H01J37/32192 ,  H01J37/32449 ,  H01J37/32963 ,  H01J2237/334 ,  H01J2237/335

Abstract: A plasma observation system includes a plasma processing apparatus which includes a processing container in which a substrate is processed with plasma, and a plurality of observation windows each capable of observing an emission state of the plasma in the processing container; and a measuring device including a light receiver configured to receive a plurality of light beams intersecting in the processing container through a plurality of observation windows, and a controller configured to specify an observation point of the plasma and determine a state of the plasma at the observation point based on the plurality of light beams received by the light receiver.

公开(公告)号：US20150090708A1

公开(公告)日：2015-04-02

申请号：US14381235

申请日：2013-02-05

Applicant: Tokyo Electron Limited

Inventor： Sumi Tanaka ,  Taro Ikeda ,  Yoshiro Kabe ,  Kouji Shimomura ,  Seokhyoung Hong ,  Jun Yamashita ,  Masakazu Ban ,  Taichi Monden ,  Masayoshi Maenishi ,  Ryoji Yamazaki

IPC: H05B6/70 ,  H05B6/80 ,  H05B6/64

CPC classification number: H05B6/707 ,  H01L21/67115 ,  H01L21/6719 ,  H01L21/68792 ,  H05B6/6411 ,  H05B6/806 ,  H05B2206/044

Abstract: A microwave heating apparatus includes a processing chamber for accommodating a target, a support device for supporting the target in the processing chamber and a microwave introducing device for generating microwaves to introduce them into the processing chamber. The processing chamber further includes a top wall having a plurality of microwave introduction ports to introduce the microwaves generated in the microwave introducing device into the processing chamber. Each of the microwave introduction ports has a rectangular shape having long sides and short sides parallel to inner wall surfaces of four sidewalls of the processing chamber, and the support device includes a support member to support the target and a rotating mechanism for rotating the supported target.

Abstract translation: 微波加热装置包括用于容纳目标的处理室，用于在处理室中支撑目标的支撑装置和用于产生微波以将它们引入处理室的微波引入装置。 处理室还包括具有多个微波引入端口的顶壁，以将在微波引入装置中产生的微波引入处理室。 每个微波引入端口具有矩形形状，其长边和短边平行于处理室的四个侧壁的内壁表面，并且支撑装置包括用于支撑目标的支撑构件和用于使支撑的目标物旋转的旋转机构 。