公开(公告)号：US20240047234A1

公开(公告)日：2024-02-08

申请号：US18227156

申请日：2023-07-27

Applicant: Tokyo Electron Limited

Inventor： Yosuke HACHIYA ,  Itaru KANNO ,  Mitsunori NAKAMORI ,  Hirofumi TAKEGUCHI

IPC: H01L21/67 ,  B08B3/14 ,  H01L21/02

CPC classification number: H01L21/67023 ,  B08B3/14 ,  H01L21/02057

Abstract: A substrate processing apparatus includes: a holding unit, a processing cup, a first supply unit, a second supply unit, a drain unit, and a first measurement unit. The holding unit holds a substrate. The processing cup is provided around the holding unit. The first supply unit supplies a chemical liquid to the substrate held by the holding unit. The second supply unit supplies a rinse liquid or a drying liquid to the substrate held by the holding unit. The drain unit is provided at the bottom of the processing cup, and is connected to a drain line and a recovery line via a line switch. The first measurement unit is provided in the drain unit, and measures the purity of the rinse liquid or the drying liquid.

公开(公告)号：US20240307821A1

公开(公告)日：2024-09-19

申请号：US18576898

申请日：2022-06-22

Applicant: Tokyo Electron Limited

Inventor： Yosuke HACHIYA ,  Mitsunori NAKAMORI ,  Koji KAGAWA

IPC: B01D53/90 ,  B08B3/04 ,  F26B5/00

CPC classification number: B01D53/90 ,  B08B3/048 ,  F26B5/005

Abstract: A substrate processing system includes a batch processor, a single-substrate processor, and a transferrer. The batch processor collectively processes a plurality of substrates by immersing the plurality of substrates in ozonated water stored in a processing tank. The single-substrate processor processes the plurality of substrates one by one with a chemical liquid. The transferrer transfers the plurality of substrates in a wet state from the batch processor to the single-substrate processor.