公开(公告)号：US06745093B1

公开(公告)日：2004-06-01

申请号：US09526206

申请日：2000-03-15

申请人： Tomoyuki Kawano ,  Kouji Nishihata ,  Tetsuya Tahara ,  Shoji Okiguchi ,  Hideki Yamasaki

发明人： Tomoyuki Kawano ,  Kouji Nishihata ,  Tetsuya Tahara ,  Shoji Okiguchi ,  Hideki Yamasaki

IPC分类号： G06F1900

CPC分类号： G05B19/41865 ,  G05B2219/32265 ,  G05B2219/45031 ,  H01L21/67276 ,  Y02P90/20

摘要： A vacuum process apparatus has a plurality of cassettes for holding samples; a transporting means for transporting the samples; a plurality of vacuum process chambers each for processing samples one by one; an evacuation means for evacuating the vacuum process chambers; a load chamber and an unload chamber communicating with the vacuum process chambers; and an apparatus control means for controlling transporting and processing of the samples. The apparatus control means operates to measure a time period of transporting each of the samples and a time period of processing in each of the vacuum process chambers, and determines a next extracting order of extraction of the samples from the plurality of cassettes based on the measured time periods.

摘要翻译： 真空处理装置具有用于保持样品的多个盒; 用于运送样品的运送装置; 多个真空处理室，每个用于一个处理样品; 用于抽真空处理室的抽空装置; 负载室和与真空处理室连通的卸载室; 以及用于控制样品的输送和处理的装置控制装置。 装置控制装置用于测量每个样品的运送时间和每个真空处理室中的处理时间段，并且基于测量的样品确定从多个盒中提取样品的下一提取次序 时间段

公开(公告)号：US06917844B2

公开(公告)日：2005-07-12

申请号：US10851079

申请日：2004-05-24

申请人： Tomoyuki Kawano ,  Kouji Nishihata ,  Tetsuya Tahara ,  Shoji Okiguchi ,  Hideki Yamasaki

发明人： Tomoyuki Kawano ,  Kouji Nishihata ,  Tetsuya Tahara ,  Shoji Okiguchi ,  Hideki Yamasaki

IPC分类号： H01L21/02 ,  G05B19/418 ,  G06F19/00 ,  H01L21/00

CPC分类号： G05B19/41865 ,  G05B2219/32265 ,  G05B2219/45031 ,  H01L21/67276 ,  Y02P90/20

摘要： A vacuum process apparatus includes a plurality of cassettes for holding samples, a transporter which transports the samples, a plurality of vacuum process chambers each for processing samples one by one, an evacuator which evacuates the vacuum process chambers, and a load chamber and an unload chamber communicating with the vacuum process chambers. An apparatus controller is provided for controlling transporting and processing of the samples. The apparatus controller measures a time period for transporting each of the samples and a processing time period for processing a sample in each of the vacuum process chambers, and determines a next order of extraction of the samples from the plurality of cassettes based on the measured time periods.

摘要翻译： 真空处理装置包括：用于保持样品的多个盒，运送样品的运送器，各个用于一个处理样品的多个真空处理室，抽空真空处理室的抽空器，以及装载室和卸载 室与真空处理室连通。 提供了一种用于控制样品的运输和处理的设备控制器。 设备控制器测量用于运送每个样品的时间段和用于处理每个真空处理室中的样品的处理时间段，并且基于测量的时间确定来自多个盒的样品的下一次提取次数 时期。

公开(公告)号：US06941185B2

公开(公告)日：2005-09-06

申请号：US10140120

申请日：2002-05-08

申请人： Kouji Nishihata ,  Kazuhiro Joo ,  Shoji Ikuhara ,  Tetsuya Tahara ,  Shoji Okiguchi

发明人： Kouji Nishihata ,  Kazuhiro Joo ,  Shoji Ikuhara ,  Tetsuya Tahara ,  Shoji Okiguchi

IPC分类号： H01L21/00 ,  H01L21/677 ,  G06F19/00

CPC分类号： H01L21/67745 ,  H01L21/67167 ,  H01L21/67276 ,  Y10S414/135 ,  Y10S414/139 ,  Y10S414/14 ,  Y10S438/905 ,  Y10T29/41

摘要： A vacuum processing apparatus and method wherein a plurality of processing units are for conducting processing, a transfer processing unit is connected with the plurality of processing units for carrying wafers to the processing units, a transfer device is disposed in the transfer processing unit and carries the wafers and cassettes for containing the wafers, and a control unit is provided for conducting transfer control for transferring the wafers from respective cassettes to the transfer processing unit. The wafers are processed by using the plural processing units, and at least two of the cassettes are used. Parallel processing is conducted of applying same processing to the wafers contained on each of the cassettes by applying the same recipe and the wafers, after applying the parallel processing, are returned to the original cassette.

摘要翻译： 一种真空处理装置和方法，其中多个处理单元用于进行处理，转移处理单元与用于将晶片运送到处理单元的多个处理单元连接，转移装置设置在转移处理单元中，并携带 用于容纳晶片的晶片和盒，以及控制单元，用于进行用于将晶片从相应的盒传送到传送处理单元的传送控制。 通过使用多个处理单元处理晶片，并且使用至少两个盒。 通过施加相同的配方，对包含在每个盒中的晶片进行相同的处理，并行处理，并且在施加并行处理之后，晶片返回到原始盒。

公开(公告)号：US06853872B2

公开(公告)日：2005-02-08

申请号：US10140182

申请日：2002-05-08

申请人： Kouji Nishihata ,  Kazuhiro Joo ,  Shoji Ikuhara ,  Tetsuya Tahara ,  Shoji Okiguchi

发明人： Kouji Nishihata ,  Kazuhiro Joo ,  Shoji Ikuhara ,  Tetsuya Tahara ,  Shoji Okiguchi

IPC分类号： H01L21/00 ,  H01L21/677 ,  G06F19/00

CPC分类号： H01L21/67745 ,  H01L21/67167 ,  H01L21/67276 ,  Y10S414/135 ,  Y10S414/139 ,  Y10S414/14 ,  Y10S438/905 ,  Y10T29/41

摘要： A vacuum processing method and apparatus processing units for conducting processing, a transfer processing unit connected with the plurality of processing units for carrying wafers, and a control unit for controlling the processing units. A processing order information storing device stores a processing order of the wafers for the processing units, an operational information signal generating device generates an operational information signal indicating an operable or inoperable state of each of the processing units, an operational information signal storing device stores the operational information signal indicating the state of each of the processing units, and a control device matches and processes the processing order information and the operational information signal, and continues operation without using an inoperable processing unit while using other operable processing units.

摘要翻译： 用于进行处理的真空处理方法和装置处理单元，与多个用于承载晶片的处理单元连接的转移处理单元，以及用于控制处理单元的控制单元。 处理订单信息存储装置存储用于处理单元的晶片的处理顺序，操作信息信号生成装置生成指示每个处理单元的可操作或不可操作状态的操作信息信号，操作信息信号存储装置将 指示每个处理单元的状态的操作信息信号，并且控制设备匹配并处理处理顺序信息和操作信息信号，并且在使用其他可操作的处理单元的同时不使用不可操作的处理单元继续操作。

公开(公告)号：US06714832B1

公开(公告)日：2004-03-30

申请号：US09535753

申请日：2000-03-27

申请人： Kouji Nishihata ,  Kazuhiro Joo ,  Shoji Ikuhara ,  Tetsuya Tahara ,  Shoji Okiguchi

发明人： Kouji Nishihata ,  Kazuhiro Joo ,  Shoji Ikuhara ,  Tetsuya Tahara ,  Shoji Okiguchi

IPC分类号： G06F1900

CPC分类号： H01L21/67745 ,  H01L21/67167 ,  H01L21/67276 ,  Y10S414/135 ,  Y10S414/139 ,  Y10S414/14 ,  Y10S438/905 ,  Y10T29/41

摘要： A method of operating a vacuum processing system including a plurality of processing units for processing wafers, a transferring unit for carrying the wafers and a control unit for controlling the processing units and the transferring unit. At least two of the plurality of processing units are connected to the transferring unit and wafers are processed using the processing units. The method includes the steps of judging whether each of the processing units is operable or inoperable, isolating inoperable ones of the processing units judged in the judging step from wafer processing, carrying wafers to operable ones of the processing units using the transferring unit and processing the wafers using only the operable processing units.

摘要翻译： 一种操作真空处理系统的方法，该真空处理系统包括用于处理晶片的多个处理单元，用于承载晶片的转印单元和用于控制处理单元和转印单元的控制单元。 多个处理单元中的至少两个连接到传送单元，并且使用处理单元处理晶片。 该方法包括以下步骤：判断每个处理单元是否可操作或不可操作，将在判断步骤中判断的不可操作的处理单元与晶片处理隔离，使用转移单元将晶片运送到可操作的处理单元，并处理 晶片仅使用可操作的处理单元。

公开(公告)号：US6069096A

公开(公告)日：2000-05-30

申请号：US925190

申请日：1997-09-08

申请人： Kouji Nishihata ,  Kazuhiro Joo ,  Shoji Ikuhara ,  Tetsuya Tahara ,  Shoji Okiguchi

发明人： Kouji Nishihata ,  Kazuhiro Joo ,  Shoji Ikuhara ,  Tetsuya Tahara ,  Shoji Okiguchi

IPC分类号： H01L21/68 ,  H01L21/00 ,  H01L21/677 ,  H01L21/50

CPC分类号： H01L21/67167 ,  H01L21/67745 ,  Y10S414/135 ,  Y10S414/139 ,  Y10T29/41

摘要： A vacuum processing system including two or more processing units for processing wafers and a transferring unit for carrying the wafers. In this system, even when any one of the processing units becomes inoperable because of a failure, the operation of the system can be continued, and even when a processing unit in the system requires repair or maintenance at the time of the start of operation, the system can be operated using other operable processing units without subjecting the operator to danger due to improper operation. As a result, the working efficiency of the system can be increased and the safety of the operator can be secured. In this system, the cleaning of the interior of each processing unit is performed by carrying a cleaning dummy wafer into each processing unit using the transferring unit, followed by recovery of the dummy wafer after cleaning, so that processing of wafers in the processing unit can be carried out once again.

摘要翻译： 包括用于处理晶片的两个或多个处理单元和用于承载晶片的转印单元的真空处理系统。 在该系统中，即使任何一个处理单元由于故障而变得不可操作，系统的操作可以继续，并且即使当系统中的处理单元在开始操作时需要修理或维护时， 该系统可以使用其他可操作的处理单元操作，而不会由于操作不当而导致操作者的危险。 结果，可以提高系统的工作效率，并确保操作者的安全。 在该系统中，通过使用转印单元将清洁虚设晶片装载到各个处理单元中，然后在清洁之后恢复虚设晶片来进行每个处理单元的内部的清洁，从而处理单元中的晶片的处理可以 再次进行。

公开(公告)号：US06885906B2

公开(公告)日：2005-04-26

申请号：US10140184

申请日：2002-05-08

申请人： Kouji Nishihata ,  Kazuhiro Joo ,  Shoji Ikuhara ,  Tetsuya Tahara ,  Shoji Okiguchi

发明人： Kouji Nishihata ,  Kazuhiro Joo ,  Shoji Ikuhara ,  Tetsuya Tahara ,  Shoji Okiguchi

IPC分类号： H01L21/00 ,  H01L21/677 ,  G06F19/00

CPC分类号： H01L21/67745 ,  H01L21/67167 ,  H01L21/67276 ,  Y10S414/135 ,  Y10S414/139 ,  Y10S414/14 ,  Y10S438/905 ,  Y10T29/41

摘要： A vacuum processing method and apparatus having one cassette containing wafers which are to be transferred in a preset transferring order to a processing unit via a transfer unit, and another cassette containing wafers to be processed on an emergency basis. Automatic control of processing a wafer from the one cassette is effected, and in response to a request for emergency processing of a water of the another cassette, the automatic processing control of the one wafer from the one cassette is temporarily stopped while completing processing of the wafer of the one cassette returning the same to the one cassette. Emergency processing is initiated by transferring a wafer from the another cassette to the vacuum processing unit via the transfer unit. The processing of the emergency wafer is completed and the processed emergency wafer is returned to the another cassette.

摘要翻译： 一种具有一个盒子的真空处理方法和装置，其中一个盒子包含将以预定的转印顺序经由转印单元传送到处理单元的晶片，以及另一个盒子，其容纳在紧急的基础上处理的晶片。 自动控制从一个盒子处理晶片，并且响应于对另一盒的水的紧急处理的请求，一个晶片从一个盒的自动处理控制暂时停止，同时完成 一个盒的晶片将其返回到一个盒。 通过传送单元将晶片从另一个盒传送到真空处理单元来启动紧急处理。 完成紧急晶片的处理，将处理过的应急晶片返回到另一个盒。

公开(公告)号：US06920369B2

公开(公告)日：2005-07-19

申请号：US10911659

申请日：2004-08-05

申请人： Tooru Ueno ,  Shigeru Nakamoto ,  Shoji Okiguchi ,  Hideki Yamasaki ,  Kouji Nishihata

发明人： Tooru Ueno ,  Shigeru Nakamoto ,  Shoji Okiguchi ,  Hideki Yamasaki ,  Kouji Nishihata

IPC分类号： G05B23/02 ,  B01J3/00 ,  H01L21/00 ,  H01L21/02 ,  H01L21/677 ,  G06F19/00

CPC分类号： H01L21/67276 ,  H01L21/67167 ,  H01L21/67745 ,  H01L21/67769

摘要： A method of operating vacuum processing equipment that includes multiple sets of apparatus for performing a succession of different processes on individual wafers, an apparatus for transporting said wafers, and an apparatus for controlling said processing apparatus sets and said transport apparatus, and has at least two sets of wafer processing routes including multiple sets of said processing apparatus; wherein it is possible to judge whether each set of said processing apparatus for performing various processes is in a valid or invalid status for operation, to electrically disconnect only the processing apparatus whose operational status has been judged to be invalid, to reconstruct said processing routes by using the processing apparatus whose operational status has been judged to be valid, and to process said wafers by using only said processing apparatus which is valid for operation.

摘要翻译： 一种操作真空处理设备的方法，其包括用于在单个晶片上执行不同处理的多组设备，用于传输所述晶片的设备以及用于控制所述处理设备组和所述传送设备的设备，并且具有至少两个 一组晶片处理路线，包括多组所述处理装置; 其中可以判断用于执行各种处理的所述处理装置的每一组是否处于用于操作的有效或无效状态，仅电连接仅操作状态被判断为无效的处理装置，以便重新构建所述处理路线 使用其操作状态已被判断为有效的处理装置，并且仅使用对于操作有效的所述处理装置来处理所述晶片。

公开(公告)号：US20050010320A1

公开(公告)日：2005-01-13

申请号：US10911659

申请日：2004-08-05

申请人： Tooru Ueno ,  Shigeru Nakamoto ,  Shoji Okiguchi ,  Hideki Yamasaki ,  Kouji Nishihata

发明人： Tooru Ueno ,  Shigeru Nakamoto ,  Shoji Okiguchi ,  Hideki Yamasaki ,  Kouji Nishihata

IPC分类号： G05B23/02 ,  B01J3/00 ,  H01L21/00 ,  H01L21/02 ,  H01L21/677 ,  G06F19/00

CPC分类号： H01L21/67276 ,  H01L21/67167 ,  H01L21/67745 ,  H01L21/67769

摘要： A method of operating vacuum processing equipment that includes multiple sets of apparatus for performing a succession of different processes on individual wafers, an apparatus for transporting said wafers, and an apparatus for controlling said processing apparatus sets and said transport apparatus, and has at least two sets of wafer processing routes including multiple sets of said processing apparatus; wherein it is possible to judge whether each set of said processing apparatus for performing various processes is in a valid or invalid status for operation, to electrically disconnect only the processing apparatus whose operational status has been judged to be invalid, to reconstruct said processing routes by using the processing apparatus whose operational status has been judged to be valid, and to process said wafers by using only said processing apparatus which is valid for operation.

公开(公告)号：US06795745B1

公开(公告)日：2004-09-21

申请号：US09666596

申请日：2000-09-20

申请人： Tooru Ueno ,  Shigeru Nakamoto ,  Shoji Okiguchi ,  Hideki Yamasaki ,  Kouji Nishihata

发明人： Tooru Ueno ,  Shigeru Nakamoto ,  Shoji Okiguchi ,  Hideki Yamasaki ,  Kouji Nishihata

IPC分类号： G06F1900

CPC分类号： H01L21/67276 ,  H01L21/67167 ,  H01L21/67745 ,  H01L21/67769

摘要： A method of operating vacuum processing equipment that includes multiple sets of apparatus for performing a succession of different processes on individual wafers, an apparatus for transporting said wafers, and an apparatus for controlling said processing apparatus sets and said transport apparatus, and has at least two sets of wafer processing routes including multiple sets of said processing apparatus; wherein it is possible to judge whether each set of said processing apparatus for performing various processes is in a valid or invalid status for operation, to electrically disconnect only the processing apparatus whose operational status has been judged to be invalid, to reconstruct said processing routes by using the processing apparatus whose operational status has been judged to be valid, and to process said wafers by using only said processing apparatus which is valid for operation.

摘要翻译： 一种操作真空处理设备的方法，其包括用于在单个晶片上执行不同处理的多组设备，用于传输所述晶片的设备以及用于控制所述处理设备组和所述传送设备的设备，并且具有至少两个 一组晶片处理路线，包括多组所述处理装置; 其中可以判断用于执行各种处理的所述处理装置的每一组是否处于用于操作的有效或无效状态，仅电连接仅操作状态被判断为无效的处理装置，以便重新构建所述处理路线 使用其操作状态已被判断为有效的处理装置，并且仅使用对于操作有效的所述处理装置来处理所述晶片。