High frequency power source and its control method, and plasma processing apparatus
    1.
    发明授权
    High frequency power source and its control method, and plasma processing apparatus 有权
    高频电源及其控制方法及等离子体处理装置

    公开(公告)号:US08286581B2

    公开(公告)日:2012-10-16

    申请号:US10864538

    申请日:2004-06-10

    IPC分类号: H01L21/00 C23C16/00

    CPC分类号: H01J37/32082 H01J37/32183

    摘要: In a high-frequency power source, a malfunction is prevented by precisely removing harmonic components or a modulated wave component which develops while producing a plasma, and a proper high frequency power can be impressed on a plasma processing apparatus. The high-frequency power source includes a power monitor constituted of a directional coupler, a mixer, a 100 kHz low-pass filter, a low-frequency detector, and an oscillator. A 100 MHz high-frequency wave including modulated wave components and the like extracted by the directional coupler and 99.9 MHz high-frequency wave oscillated by the oscillator are added by the mixer. An output of the addition is converted by the low-frequency detector into 100 kHz, resulting in detection.

    摘要翻译: 在高频电源中,通过精确地除去在产生等离子体时产生的谐波分量或调制波分量来防止故障,并且可以对等离子体处理装置施加适当的高频功率。 高频电源包括由定向耦合器,混频器,100kHz低通滤波器,低频检测器和振荡器构成的功率监视器。 包括由定向耦合器提取的调制波分量等的100MHz高频波和由振荡器振荡的99.9MHz的高频波被混合器加入。 加法的输出由低频检测器转换成100kHz,从而进行检测。