THREE-DIMENSIONAL SEMICONDUCTOR MEMORY DEVICE AND METHOD FOR MANUFACTURING THE SAME
    1.
    发明申请
    THREE-DIMENSIONAL SEMICONDUCTOR MEMORY DEVICE AND METHOD FOR MANUFACTURING THE SAME 有权
    三维半导体存储器件及其制造方法

    公开(公告)号:US20110294290A1

    公开(公告)日:2011-12-01

    申请号:US13117489

    申请日:2011-05-27

    IPC分类号: H01L21/283

    摘要: A three-dimensional semiconductor memory device includes a stacked structure including a plurality of conductive patterns, an active pillar penetrating the stacked structure, and a data storage pattern between the active pillar and the conductive patterns, wherein the active pillar includes a vertical semiconductor pattern penetrating the stacked structure and protruding semiconductor patterns between the vertical semiconductor pattern and the data storage pattern, the protruding semiconductor patterns having a different crystalline structure from that of the vertical semiconductor pattern.

    摘要翻译: 一种三维半导体存储器件包括:堆叠结构,包括多个导电图案,穿透层叠结构的有源柱,以及有源柱和导电图案之间的数据存储图案,其中有源柱包括垂直半导体图案, 垂直半导体图案和数据存储图案之间的堆叠结构和突出的半导体图案,突出的半导体图案具有与垂直半导体图案不同的晶体结构。

    Three-dimensional semiconductor memory device and method for manufacturing the same
    2.
    发明授权
    Three-dimensional semiconductor memory device and method for manufacturing the same 有权
    三维半导体存储器件及其制造方法

    公开(公告)号:US08673721B2

    公开(公告)日:2014-03-18

    申请号:US13117489

    申请日:2011-05-27

    IPC分类号: H01L21/336

    摘要: A three-dimensional semiconductor memory device includes a stacked structure including a plurality of conductive patterns, an active pillar penetrating the stacked structure, and a data storage pattern between the active pillar and the conductive patterns, wherein the active pillar includes a vertical semiconductor pattern penetrating the stacked structure and protruding semiconductor patterns between the vertical semiconductor pattern and the data storage pattern, the protruding semiconductor patterns having a different crystalline structure from that of the vertical semiconductor pattern.

    摘要翻译: 一种三维半导体存储器件包括:堆叠结构,包括多个导电图案,穿透层叠结构的有源柱,以及有源柱和导电图案之间的数据存储图案,其中有源柱包括垂直半导体图案, 垂直半导体图案和数据存储图案之间的堆叠结构和突出的半导体图案,突出的半导体图案具有与垂直半导体图案不同的晶体结构。