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公开(公告)号：US07335244B2
公开(公告)日：2008-02-26
申请号：US11027439
申请日：2004-12-30
IPC分类号： B01D46/00
CPC分类号： B01D53/0407 , B01D2257/80
摘要： An air-purifying device for a front-opening unified pod to purify the air in it is provided. The air in the front-opening unified pod 51 is sucked through one of its breathing holes 58a and directed into an air-purifying device (M) that includes a fan-driving means 1, a dust-filtering means 2, and a chemical-filtering means 3. The moisture, chemical gases, and dust in the air are removed by the air-purifying device (M), and then the purified air is forced into the front-opening unified pod 51 through the other breathing hole 58b. Thus the air in the front-opening unified pod 51 is purified, and its purity is maintained by circulating the air.
摘要翻译： 提供一种用于净化其中的空气的用于前开口的统一荚的空气净化装置。 前开口统一箱51中的空气通过其呼吸孔58a中的一个被吸入并引导到包括风扇驱动装置1，除尘装置2和化学品的空气净化装置（M） 过滤装置3。 通过空气净化装置（M）除去空气中的水分，化学气体和灰尘，然后净化的空气通过另一个呼吸孔58b被迫进入前开口统一的容器51中。 因此，前开口统一容器51中的空气被净化，并且通过使空气循环来维持其纯度。
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公开(公告)号：US20050268580A1
公开(公告)日：2005-12-08
申请号：US11027439
申请日：2004-12-30
CPC分类号： B01D53/0407 , B01D2257/80
摘要： An air-purifying device for a front-opening unified pod to purify the air in it is provided. The air in the front-opening unified pod 51 is sucked through one of its breathing holes 58a and directed into an air-purifying device (M) that comprises a fan-driving means 1, a dust-filtering means 2, and a chemical-filtering means 3. The moisture, chemical gases, and dust in the air are removed by the air-purifying device (M), and then the purified air is forced into the front-opening unified pod 51 through the other breathing hole 58b. Thus the air in the front-opening unified pod 51 is purified, and its purity is maintained by circulating the air.
摘要翻译： 提供一种用于净化其中的空气的用于前开口的统一荚的空气净化装置。 前开口统一箱51中的空气通过其呼吸孔58a中的一个被吸入并引导到包括风扇驱动装置1，除尘装置2和化学品的空气净化装置（M） 过滤装置3.空气净化装置（M）除去空气中的水分，化学气体和灰尘，然后净化的空气通过另一个呼吸孔58b被迫进入前开口统一的容器51 。 因此，前开口统一容器51中的空气被净化，并且通过使空气循环来维持其纯度。
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3.发明申请Apparatus for Charging Dry Air or Nitrogen Gas into a Container for Storing Semiconductor Wafers and an Apparatus for Thereby Removing Static Electricity from the Wafers 审中-公开用于将干燥空气或氮气充入用于存储半导体晶片的容器中的装置和用于从晶片中去除静电的装置公开(公告)号：US20100175781A1
公开(公告)日：2010-07-15
申请号：US12667806
申请日：2007-07-09
申请人： Toshirou Kisakibaru , Makoto Okada , Naoji Iida , Yasushi Honda
发明人： Toshirou Kisakibaru , Makoto Okada , Naoji Iida , Yasushi Honda
IPC分类号： B65B31/04
CPC分类号： H01L21/67393 , H01L21/67017 , H01L21/67396 , H01L21/68
摘要： An apparatus for charging dry air or nitrogen gas into a container for storing semiconductor wafers can remove chemical gas and moisture from the container, and then prevent acid from being generated at the surfaces of the wafers.The apparatus A for charging dry air or nitrogen gas into a container 1 for storing semiconductor wafers 9 is connected to an opening 8a, acting as an intake, and to an opening 8b, acting as an exhaust, wherein the container 1 comprises a plurality of openings 8 disposed at the bottom plate of the container 1, the apparatus comprising:PTFE filters 7 disposed at the plurality of openings 8a, 8b, a portion 11 for providing the dry air or nitrogen gas to the container 1, anda portion 12 for exhausting the used dry air or nitrogen gas from the container 1 after removing chemical gas and moisture from the container, and then preventing acid from being generated at the surfaces of the wafers 9.
摘要翻译： 用于将干燥空气或氮气充入用于存储半导体晶片的容器中的装置可以从容器中除去化学气体和水分，然后防止在晶片表面产生酸。 用于将干燥空气或氮气充入到用于存储半导体晶片9的容器1中的装置A连接到用作吸入口的开口8a和用作排气口的开口8b，其中容器1包括多个 设置在容器1的底板上的开口8，该装置包括：设置在多个开口8a，8b上的PTFE过滤器7，用于向容器1提供干燥空气或氮气的部分11，以及用于 在从容器中除去化学气体和水分后，从容器1排出所使用的干燥空气或氮气，然后防止在晶片9的表面产生酸。
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4.发明申请公开(公告)号：US20080278880A1
公开(公告)日：2008-11-13
申请号：US12090316
申请日：2005-10-21
申请人： Toshirou Kisakibaru , Makoto Okada , Yasushi Honda , Naoji Iida
发明人： Toshirou Kisakibaru , Makoto Okada , Yasushi Honda , Naoji Iida
IPC分类号： H05F3/00
CPC分类号： H05F3/06 , G02F1/1303
摘要： A remover that removes the static charges on surfaces of substrates of semiconductors and liquid crystals in the processes for manufacturing them is provided. A cylindrical filter in the remover cannot be affected by soft X-rays, and the X-rays cannot leak outside the guiding vessel.A portion 1 for generating purified air that comprises a cylindrical filter 5, a portion 2 for irradiation of soft X-rays 19, and a portion 3 for blowing out the ionized purified air, are arranged in the direction of the air flow in a guiding vessel 4. Also, a shield 23 prevents the portion 1 for generating purified air from being exposed to the irradiation. Further, the portion 3 has a construction wherein the ionized purified air 35 is blown at an equal rate of flow along the longitudinal direction of the remover and prevents the soft X-rays 19 from leaking outside the guiding vessel 4.
摘要翻译： 提供了一种在其制造方法中除去半导体和液晶的衬底的表面上的静电荷的去除剂。 去除剂中的圆柱形过滤器不会受到软X射线的影响，X射线不能在引导管外部泄漏。 用于产生净化空气的部分1包括圆柱形过滤器5，用于照射软X射线19的部分2和用于吹出电离净化空气的部分3沿空气流动方向布置在引导 而且，屏蔽23防止产生净化空气的部分1暴露于照射。 此外，部分3具有这样的结构，其中离子化净化空气35沿着除去器的纵向以相同的流速吹送，并且防止软X射线19泄漏到引导容器4的外部。
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5.发明授权Air-curtain forming apparatus for wafer hermetic container in semiconductor-fabrication equipment of minienvironment system 失效微型环境系统半导体制造设备中的晶片密封容器的气幕成型装置公开(公告)号：US07416998B2
公开(公告)日：2008-08-26
申请号：US10537133
申请日：2003-02-27
CPC分类号： H01L21/67017 , H01L21/67772
摘要： In a semiconductor-fabrication equipment of a minienvironment system, ambient air is prevented from entering a gap between an opening of the semiconductor-fabrication equipment and a wafer gateway of a hermetic container to prevent dust entrained in the ambient air from adhering to wafers in the hermetic container. Clean air is injected from a clean-air injection device (1), which is connected to an air-supply device (2) through an air-supply tube (3), and which is provided with filter means (6a) in the from of rectangular frame formed with cylindrically-shaped filters connected to each other, to form an air curtain at the gap (96) between the gateway (74) of the hermetic container (71) through which wafers (73) are taken out of or put in the hermetic container (71) and the opening (98) of a loading part (78) attached to a front panel (77) of the semiconductor-fabrication equipment (76), thereby shutting off the ambient air that would otherwise enter the hermetic container (71) through the gap (96) between the gateway (74) of the hermetic container (71) and the opening (98) of the loading part (78) attached to the semiconductor-fabrication equipment (76) when a lid (75) of the hermetic container (71) is opened into the semiconductor-fabrication equipment (76).
摘要翻译： 在微环境系统的半导体制造设备中，防止环境空气进入半导体制造设备的开口和密封容器的晶片网关之间的间隙，以防止夹带在周围空气中的灰尘粘附到 密封容器。 清洁空气从通过供气管（3）连接到供气装置（2）的清洁空气注入装置（1）注入，并在其中设置有过滤装置（6a） 从形成有彼此连接的圆柱形过滤器的矩形框架形成在密封容器（71）的网关（74）之间的间隙（96）处形成空气幕，晶片（73）通过该间隙被取出或 放入安装在半导体制造设备（76）的前面板（77）上的装载部分（78）的密封容器（71）和开口（98）中，从而切断否则将进入 通过密封容器（71）的网关（74）之间的间隙（96）与安装在半导体制造设备（76）上的装载部件（78）的开口（98）之间的密封容器（71） 密封容器（71）的开口（75）打开到半导体制造设备中 t（76）。
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公开(公告)号：US20060060136A1
公开(公告)日：2006-03-23
申请号：US10537133
申请日：2003-02-27
CPC分类号： H01L21/67017 , H01L21/67772
摘要： In a semiconductor-fabrication equipment of a minienvironment system, ambient air is prevented from entering a gap between an opening of the semiconductor-fabrication equipment and a wafer gateway of a hermetic container to prevent dust entrained in the ambient air from adhering to wafers in the hermetic container. Clean air is injected from a clean-air injection device (1), which is connected to an air-supply device (2) through an air-supply tube (3), and which is provided with filter means (6a) in the from of rectangular frame formed with cylindrically-shaped filters connected to each other, to form an air curtain at the gap (96) between the gateway (74) of the hermetic container (71) through which wafers (73) are taken out of or put in the hermetic container (71) and the opening (98) of a loading part (78) attached to a front panel (77) of the semiconductor-fabrication equipment (76), thereby shutting off the ambient air that would otherwise enter the hermetic container (71) through the gap (96) between the gateway (74) of the hermetic container (71) and the opening (98) of the loading part (78) attached to the semiconductor-fabrication equipment (76) when a lid (75) of the hermetic container (71) is opened into the semiconductor-fabrication equipment (76).
摘要翻译： 在微环境系统的半导体制造设备中，防止环境空气进入半导体制造设备的开口和密封容器的晶片网关之间的间隙，以防止夹在周围空气中的灰尘粘附到 密封容器。 清洁空气从通过供气管（3）连接到供气装置（2）的清洁空气注入装置（1）注入，并在其中设置有过滤装置（6a） 从形成有彼此连接的圆柱形过滤器的矩形框架形成在密封容器（71）的网关（74）之间的间隙（96）处形成空气幕，晶片（73）通过该间隙被取出或 放入安装在半导体制造设备（76）的前面板（77）上的装载部分（78）的密封容器（71）和开口（98）中，从而切断否则将进入 通过密封容器（71）的网关（74）之间的间隙（96）与安装在半导体制造设备（76）上的装载部件（78）的开口（98）之间的密封容器（71） 密封容器（71）的开口（75）打开到半导体制造设备中 t（76）。
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7.发明申请Sheet for Shielding Soft X-Rays in a Remover Using Soft X-Rays that Removes Static Charges and a Method of Manufacturing It 有权使用消除静电费用的软X射线屏蔽软X射线的表格及其制造方法公开(公告)号：US20100176315A1
公开(公告)日：2010-07-15
申请号：US12438263
申请日：2007-08-22
申请人： Toshirou Kisakibaru
发明人： Toshirou Kisakibaru
CPC分类号： H05F3/06 , Y10T156/10
摘要： A sheet 1 for shielding soft X-rays comprises a first outer sheet, an interlayer sheet, and a second outer sheet. In the first outer sheet a port for supplying ionized air is formed. In the interlayer sheet a passage for the ionized air, which passage communicates with the port for supplying the ionized air, is formed. In the second outer sheet a port for discharging the ionized air, which port communicates with the passage for the ionized air, is formed. The sheets 2, 3, and 4 are stacked and adhered so that the sheet 1 has one or more portions 9 for transmitting the ionized air, which portions connect the port for supplying the ionized air, the passage for the ionized air, and the port for discharging the ionized air.
摘要翻译： 用于屏蔽软X射线的片材1包括第一外片，中间片片和第二外片。 在第一外片中形成用于供给电离空气的端口。 在夹层片材中形成有用于电离空气的通道，该通道与用于供应电离空气的端口连通。 在第二外部片材中，形成用于排出与用于电离空气的通道连通的离子化空气的端口。 片材2,3和4被堆叠并粘合，使得片材1具有用于传送电离空气的一个或多个部分9，这些部分连接用于供应电离空气的端口，用于电离空气的通道和端口 用于排出电离空气。
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公开(公告)号：US20060032201A1
公开(公告)日：2006-02-16
申请号：US10519961
申请日：2003-12-19
申请人： Toshirou Kisakibaru
发明人： Toshirou Kisakibaru
IPC分类号： B01D46/00
CPC分类号： B01D46/2407 , B01D46/0013 , B01D46/002 , F24F3/1603 , F24F9/00
摘要： An air-purifying device whose space for installation has an elongated shape, air to which is supplied through a duct or a tube, and which can uniformly cause the air to exit the surrounding space. It comprises a hollow cylindrical filter (3) made by forming a filter media (1) in a cylindrical shape having an air passage (2) in the central hollow portion, and a pair of air intake members (6) made of a hollow cylindrical body that has a closed bottom (4) having an air intake hole (5) tightly fixed with sealing material on both ends of the hollow cylindrical filter so that the hole communicates with the air passage.
摘要翻译： 一种空气净化装置，其安装空间具有细长形状，通过管道或管道供给的空气，并且能够均匀地使空气离开周围空间。 它包括一个中空的圆柱形过滤器（3），它通过在中心空心部分中形成一个具有空气通道（2）的圆筒形状的过滤介质（1）和一个由中空圆柱形构成的进气件 具有封闭的底部（4），其具有在中空圆柱形过滤器的两端上用密封材料紧密地固定的进气孔（5），使得孔与空气通道连通。
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9.发明授权Sheet for shielding soft X-rays in a remover using soft X-rays that removes static charges and a method of manufacturing it 有权用于使用去除静电荷的软X射线去除去除剂中的软X射线的片材及其制造方法公开(公告)号：US07850366B2
公开(公告)日：2010-12-14
申请号：US12438263
申请日：2007-08-22
申请人： Toshirou Kisakibaru
发明人： Toshirou Kisakibaru
IPC分类号： H01J35/16
CPC分类号： H05F3/06 , Y10T156/10
摘要： A sheet 1 for shielding soft X-rays comprises a first outer sheet, an interlayer sheet, and a second outer sheet. In the first outer sheet a port for supplying ionized air is formed. In the interlayer sheet a passage for the ionized air, which passage communicates with the port for supplying the ionized air, is formed. In the second outer sheet a port for discharging the ionized air, which port communicates with the passage for the ionized air, is formed. The sheets 2, 3, and 4 are stacked and adhered so that the sheet 1 has one or more portions 9 for transmitting the ionized air, which portions connect the port for supplying the ionized air, the passage for the ionized air, and the port for discharging the ionized air.
摘要翻译： 用于屏蔽软X射线的片材1包括第一外片，中间层片和第二外片。 在第一外片中形成用于供给电离空气的端口。 在夹层片材中形成有用于电离空气的通道，该通道与用于供应电离空气的端口连通。 在第二外部片材中，形成用于排出与用于电离空气的通道连通的离子化空气的端口。 片材2,3和4被堆叠并粘合，使得片材1具有用于传送电离空气的一个或多个部分9，这些部分连接用于供应电离空气的端口，用于电离空气的通道和端口 用于排出电离空气。
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公开(公告)号：US20050201854A1
公开(公告)日：2005-09-15
申请号：US10513899
申请日：2002-10-11
申请人： Toshirou Kisakibaru
发明人： Toshirou Kisakibaru
IPC分类号： B65G49/00 , H01L21/00 , H01L21/02 , H01L21/677 , B65G49/07
CPC分类号： H01L21/67017 , H01L21/67772
摘要： A semiconductor manufacturing device (76) of a minienvironment system, in which system a wafer (73) is conveyed by a wafer hermetic container (71) to the semiconductor manufacturing device equipped with a wafer carrying-in opening (98), comprising a clean-air injection semiconductor manufacturing device (1) for forming a clean-air curtain between an opened opening (74) of the hermetic container and the wafer carrying-in opening to prevent ambient air from entering the opened opening (74) of the hermetic container when the hermetic container (71), which is located in front of the wafer carrying-in opening of the semiconductor manufacturing, is opened.
摘要翻译： 一种微型环境系统的半导体制造装置（76），其中晶片（73）由晶片密封容器（71）输送到装备有晶片承载开口（98）的半导体制造装置的系统中，包括清洁 一种用于在密闭容器的打开的开口（74）和晶片承载开口之间形成清洁空气幕的外部注射半导体制造装置（1），以防止环境空气进入密封容器的打开的开口（74） 当位于半导体制造的晶片承载开口前面的密封容器（71）被打开时。
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